The invention relates to an organic light emitting display (
OLED) panel and a fabrication method thereof. The
OLED panel comprises a glass substrate, a
thin film transistor (TFT) shading layer, a buffer layer, a
semiconductor layer, a grid
insulation layer, a first
metal layer, an inter-layer
insulation layer, a second
metal layer, a
passivation layer, a color filter, a flat layer, a positive
electrode, a pixel limiting layer, a light emitting layer and a negative
electrode, wherein the grid
insulation layer and the first
metal layer are deposited on the
semiconductor layer and are processed by patterning, the interlayer insulation layer is deposited on the first metal layer, the second metal layer is deposited on the interlayer insulation layer and is processed by patterning, the
passivation layer is deposited on the second metal layer in an
atomic layer deposition mode and is a thin film of a high-
dielectric constant material, via holes are formed in the
passivation layer, the colorfilter, the flat layer, the positive
electrode and the pixel limiting layer are fabricated on the passivation layer, an opening structure is arranged at a position, corresponding to a storage
capacitance region, of the flat layer, the light emitting layer is fabricated on the positive electrode, and the negative electrode is fabricated on the light emitting layer. The invention also provides the corresponding fabrication method of the
OLED panel. By the OLED panel and the fabrication method thereof, the storage
capacitance of the OLED panel can be effectively improved, the storage capacitancedesign area can be reduced, and the
aperture ratio of the panel is favorably improved.