The invention relates to an optical polishing material, belongs to the technical field of polishing materials and solves the technical problem that a polyurethane polishing pad is hard and brittle andis lack of toughness and elasticity in the prior art. The optical polishing material is prepared from components in parts by weight as follows: 100 parts of polyether polyol, 100 parts of diisocyanate, 1-2 parts of bisphenol A epoxy resin, 3-5 parts of chopped nylon fiber, 4-6 parts of chitin, 2-3 parts of silicone oil, -3 parts of chlorinated paraffin, 1-2 parts of ethylene glycol, 10-15 parts of maleic anhydride grafted polypropylene, 0.5-1 part of dimethylcyclohexylamine, 2-4 parts of acetone, 2-3 parts of shell powder, 2-3 parts of zinc stearate, 1-2 parts of tris(2,4-ditert-butylphenyl)phosphite, 1-2 parts of antioxidant 1010, 0.5-1 part of carbodiimide and 4-8 parts of cerium oxide. The optical polishing material has high tensile strength and good rebound resilience, wear resistance and die assembly performance, and is not prone to passivation.