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1115 results about "Surface pattern" patented technology

A designer who specialises in creating patterns & repeats, surface pattern. Pattern has the ability to decorate a surface with the use of repetition. It creates rhythm energy & movement.

Method for forming spacers using silicon nitride film for spacer-defined multiple patterning

A method of forming spacers for spacer-defined multiple pattering (SDMP), includes: depositing a pattern transfer film by PEALD on the entire patterned surface of a template using halogenated silane as a precursor and nitrogen as a reactant at a temperature of 200° C. or less, which pattern transfer film is a silicon nitride film; dry-etching the template using a fluorocarbon as an etchant, and thereby selectively removing a portion of the pattern transfer film formed on a top of a core material and a horizontal portion of the pattern transfer film while leaving the core material and a vertical portion of the pattern transfer film as a vertical spacer, wherein a top of the vertical spacer is substantially flat; and dry-etching the core material, whereby the template has a surface patterned by the vertical spacer on a underlying layer.
Owner:ASM IP HLDG BV

Method and Systems for Illuminating

InactiveUS20080055931A1Illumination system is relatively slimIncrease brightnessMechanical apparatusHollow light guidesSurface patternLight guide
Methods and systems are described for illumination in different applications. Real thin illumination systems ( 200 ) with good luminance uniformity, good efficiency and good colour mixing uniformity are obtained, even if different light sources emitting different colours are used. A plurality of light sources ( 102 ), emitting light from different colours, couple their light sideways, i.e. substantially parallel to the plane of light out-coupling, into a light guide ( 104 ) through recesses ( 108 ) distributed over the light guide ( 104 ). Providing a specially structured surface pattern ( 106 ), in combination with light in-coupling parallel to the plane of light out-coupling of the light guide ( 104 ) allows to obtain a good colour mixing of the differently coloured light originating from the plurality of light sources ( 102 ). The light then is only coupled out after it has been in the light guide ( 104 ) for a significant long time such that the light emanating from different light sources ( 102 ) is significantly mixed. The illumination system ( 200 ) has an important application in non-emissive displays.
Owner:BARCO NV

Atomic Layer Deposition For Controlling Vertical Film Growth

A method for forming a film by atomic layer deposition wherein vertical growth of a film is controlled, includes: (i) adsorbing a metal-containing precursor for film formation on a concave or convex surface pattern of a substrate; (ii) oxidizing the adsorbed precursor to form a metal oxide sub-layer; (iii) adsorbing a metal-free inhibitor on the metal oxide sub-layer more on a top / bottom portion than on side walls of the concave or convex surface pattern; and (iv) repeating steps (i) to (iii) to form a film constituted by multiple metal oxide sub-layers while controlling vertical growth of the film by step (iii). The adsorption of the inhibitor is antagonistic to next adsorption of the precursor on the metal oxide sub-layer
Owner:ASM JAPAN

Surgical implant for promotion of osseo-integration

An implant for surgical insertion into tissue of a patient includes a microgeometric, repetitive pattern, in the form of a multiplicity of alternating ridges and grooves, each having an established width in a range of about 2 to about 25 microns, and an established depth in a range of about 2 to about 25 microns, each groove having a base and a wall; and a microgeometric random surface pattern, applied over the repetitive surface pattern, defining a multiplicity of micro-pits having dimensions in a range of about 0.1 to about 4 microns.
Owner:BIO LOK INT INC

Polishing pad, method of manufacturing the polishing pad, and cushion layer for polishing pad

The polishing pad of this invention is a polishing pad effecting stable planarizing processing, at high polishing rate, materials requiring surface flatness at high level, such as a silicon wafer for semiconductor devices, a magnetic disk, an optical lens etc. This invention provides a polishing pad which can be subjected to surface processing to form a sheet or grooves, is excellent in thickness accuracy, attains a high polishing rate, achieves a uniform polishing rate, and also provides a polishing pad which is free of quality variations resulting from an individual variation, easily enables a change the surface patterns, enables fine surface pattern, is compatible with various materials to be polished, is free of burrs upon forming the pattern. This invention provides a polishing pad which can have abrasive grains mixed at very high density without using slurry, and generates few scratches by preventing aggregation of abrasive grains dispersed therein. The polishing pad of this invention has a polishing layer formed from a curing composition to be cured with energy rays, the polishing layer being formed surface pattern thereon by photolithography. The polishing pad of this invention comprises a polishing layer resin having abrasive grains dispersed therein, the resin containing ionic groups in the range of 20 to 1500 eq / ton.
Owner:ROHM & HAAS ELECTRONICS MATERIALS CMP HLDG INC

Method for constructing anti-reflection microstructure using single layer nanometer particle as etching blocking layer

The invention belongs to the surface patterning microstructure construction technique, which relates to a method for constructing a microstructure with anti-reflection performance on a foundation base by combining the self-assembly technique with the reactive ion beam etching technique. The method is to take monolayer polymeric micro-spheres, silicon dioxide micro-spheres and nano-particles of metal or metal oxides as a barrier layer and implement the RIE etching to the foundation base, then an approximate cone-shaped microstructure is constructed on the foundation base, and the structure has extreme high anti-reflection performance, thereby effectively improving the light energy utilization rate, reducing the interference of veiling glare in an optical system, increasing the optical transmittance, and further improving the sensitivity and stability of the optical system, and the method can be used for constructing large-area anti-reflection structures. The method of the invention has advantages of simple operation, changeable foundation base, strong applicability, good repeatability, low cost, high efficiency, adjustable anti-reflective applied wavelength and conformity to industrialized standards, and can be used for making photoelectric devices such as solar batteries and white light sensors.
Owner:JILIN UNIV

Patterning of surfaces utilizing microfluidic stamps including three-dimensionally arrayed channel networks

The present invention describes improved microfluidic systems and procedures for fabricating improved microfluidic systems, which contain one or more levels of microfluidic channels. The methods for fabrication the systems disclosed can provide a convenient route to topologically complex and improved microfluidic systems. The microfluidic systems can include three-dimensionally arrayed networks of fluid flow paths therein including channels that cross over or under other channels of the network without physical intersection at the points of cross over. The microfluidic networks can be fabricated via replica molding processes utilizing mold masters including surfaces having topological features formed by photolithography. The present invention also involves microfluidic systems and methods for fabricating complex patterns of materials, such as biological materials and cells, on surfaces utilizing the microfluidic systems. Specifically, the invention provides microfluidic surface patterning systems and methods for fabricating complex, discontinuous patterns on surfaces that can incorporate or deposit multiple materials onto the surfaces. The present invention also provides improved microfluidic stamps or applicators for microcontact surface patterning, which are able to pattern onto a surface arbitrary two-dimensional patterns, and which are able to pattern multiple substances onto a surface without the need for multiple steps of registration or stamping during patterning and without the need to selectively “ink” different regions of the stamp with different materials.
Owner:PRESIDENT & FELLOWS OF HARVARD COLLEGE

Materials and methods for creating imaging layers

The present invention provides patterned features of dimensions of less than 50 nm on a substrate. According to various embodiments, the features may be “Manhattan” style structures, have high aspect ratios, and / or have atomically smooth surfaces. The patterned features are made from polymer brushes grafted to a substrate. In some embodiments, the dimensions of the features may be determined by adjusting the grafting density and / or the molecular weight of the brushes. Once the brushes are patterned, the features can be shaped and reshaped with thermal or solvent treatments to achieve the desired profiles. The chemical nature of the polymer brush is thus independent of the patterning process, which allows for optimization of the polymer brush used for specific applications. Applications include masks for pattern transfer techniques such as reactive ion etching.
Owner:WISCONSIN ALUMNI RES FOUND

Implants with integration surfaces having regular repeating surface patterns

An interbody spinal implant, such as a solid-body or composite implant. The implant has at least one integration surface with a roughened surface topography including a repeating pattern, without sharp teeth that risk damage to bone structures, adapted to grip bone through friction generated when the implant is placed between two vertebral endplates and to inhibit migration of the implant. The repeating pattern is formed of at least three at least partially overlapping repeating patterns. The repeating patterns may radiate at a fixed distance from at least one point and may include recesses having a slope of thirty degrees or less relative to the integration surface. Also disclosed are processes of fabricating the integration surfaces.
Owner:TITAN SPINE

Silicon-Based Light Emitting Diode for Enhancing Light Extraction Efficiency and Method of Fabricating the Same

Due to the indirect transition characteristic of silicon semiconductors, the light extraction efficiency of a silicon-based light emitting diode is lower than that of a compound semiconductor-based light emitting diode. For this reason, there are difficulties in practically using and commercializing silicon-based light emitting diodes developed so far. Provided is a silicon-based light emitting including: a substrate with a lower electrode layer on a lower surface thereof; a lower doped layer that is formed on an upper surface of the substrate and supplies carriers to an emitting layer; the emitting layer that is a silicon semiconductor layer including silicon quantum dots or nanodots formed on the lower doped layer and has a light-emitting characteristic; an upper doped layer that is formed on the emitting layer and supplies carriers to the emitting layer; an upper electrode layer formed on the upper doped layer; and a surface structure including a surface pattern formed on the upper electrode layer, a surface structure including an upper electrode pattern and an upper doped pattern formed by patterning the upper electrode layer and the upper doped layer, or a surface structure including the surface pattern, the upper electrode pattern, and upper doped pattern, wherein the surface structure enhances the light extraction efficiency of light emitted from the emitting layer according to geometric optics.
Owner:ELECTRONICS & TELECOMM RES INST

Planar plasmonic device for light reflection, diffusion and guiding

A planar plasmonic device includes a first material layer having a surface configured to receive at least one photon of incident light. A patterned plasmonic nanostructured layer is disposed adjacent and optically coupled to the first material layer. The patterned plasmonic nanostructured layer includes a selected one of: a) at least a portion of a surface of the patterned plasmonic nanostructured layer includes a textured surface, and b) at least one compound nanofeature including a first material disposed adjacent to a second material within the compound nanofeature.
Owner:LIGHTWAVE POWER
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