Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for constructing anti-reflection microstructure using single layer nanometer particle as etching blocking layer

A technology for etching barrier layers and nanoparticles, which is applied in the field of surface patterned microstructure construction, can solve problems such as complex processes, and achieve the effects of good repeatability, simple method and strong applicability

Inactive Publication Date: 2008-11-19
JILIN UNIV
View PDF2 Cites 82 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Subsequently, Peng Jiang et al. used spin-coating technology to form a silicon dioxide nanosphere array on a silicon substrate, and then etched the silicon substrate by RIE to form a columnar surface with anti-reflective properties (Appl.Phys.Lett.2008.92.061112 ), but these methods of building anti-reflection structures are relatively complicated

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for constructing anti-reflection microstructure using single layer nanometer particle as etching blocking layer
  • Method for constructing anti-reflection microstructure using single layer nanometer particle as etching blocking layer
  • Method for constructing anti-reflection microstructure using single layer nanometer particle as etching blocking layer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0067] The aqueous solution of PS spheres can use 2% sodium lauryl sulfate solution to form a monolayer ordered structure on the water surface, and this monolayer structure can be transferred to a single crystal silicon [n type, (100)] substrate. (Kluwer Academic Publishers, Dordeecht. 2003, p. 163-172).

[0068] Technical parameters of self-assembled monolayer spheres: PS solution with a mass fraction of 10% was purchased from Microparticles GmbH (Germany), mixed with ethanol in an equal volume, and supercharged for 15 minutes before use. Add 150 mL of high-purity water (treated by a French MILLI~Q ultrapure water instrument, with a resistivity of 18.2 MΩcm) into a glass petri dish with a diameter of 15 cm, and drop 5 μL of the prepared solution onto a silicon wafer with a clean surface and a hydrophilic treatment. At this time, the PS microspheres disperse on the water surface to form a disordered structure, such as figure 1 a, After waiting for 50 minutes, add 5 μL of 2% ...

Embodiment 2

[0070] Assemble the silylating agent of one deck amino on silicon chip, utilize amino group to adsorb silver nanoparticle, so just obtained a monolayer film (S.Wang, X. Z. Yu, H. T. Fan, Appl. Phys. Lett. 2007, 91, 061105(1-3)).

[0071] Put the treated clean and dry monocrystalline silicon (or quartz, glass) substrate into a vacuum desiccator that has been dripped with an aminosilane reagent (trimethoxypropylaminosilane) in advance, and keep the vacuum degree of the vacuum desiccator at 0.012Pa After standing for 40 minutes, take it out and clean it sequentially with toluene, chloroform, and ethanol solvents, 3 minutes each time, and then use deionized water to clean it twice, 3 minutes each time, and then dry it with nitrogen, and then the modified aminosilane reagent monomolecular film The silicon wafer was soaked in the solution of metallic silver nanoparticles prepared by literature method (S.D.Stahaye, K.R.Patil, S.R.Padalkar, Materials research bulletin, 2001, 36, 1149-...

Embodiment 3

[0073] Take 600mL of high-purity water (treated by a French MILLI~Q ultrapure water instrument, with a resistivity of 18.2MΩcm) into a glass container with a diameter of 12cm, and place a ring of polytetrafluoroethylene with a diameter of 10cm on the water surface. The water surface in the ring is magnetically stirred, and its rotation speed is 120rpm, and the water surface forms a meniscus under the stirring of the magnetic force. At this time, in the meniscus, 5% PS ball aqueous solution (Feng Pan, Junying Zhang, Chao Cai) is added dropwise. , and Tianmin Wang, Langmuir, 2006, 22, 7101-71014). Under the action of centrifugal force, the PS spheres on the water surface self-organize to form an ordered monolayer PS sphere structure, and the microstructure of the ordered monolayer PS spheres is transferred to the substrate (such as silicon, glass, polymer, etc.) by vertical pulling method. and other cleaned and hydrophilic treated substrates). Then the obtained sample was etche...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention belongs to the surface patterning microstructure construction technique, which relates to a method for constructing a microstructure with anti-reflection performance on a foundation base by combining the self-assembly technique with the reactive ion beam etching technique. The method is to take monolayer polymeric micro-spheres, silicon dioxide micro-spheres and nano-particles of metal or metal oxides as a barrier layer and implement the RIE etching to the foundation base, then an approximate cone-shaped microstructure is constructed on the foundation base, and the structure has extreme high anti-reflection performance, thereby effectively improving the light energy utilization rate, reducing the interference of veiling glare in an optical system, increasing the optical transmittance, and further improving the sensitivity and stability of the optical system, and the method can be used for constructing large-area anti-reflection structures. The method of the invention has advantages of simple operation, changeable foundation base, strong applicability, good repeatability, low cost, high efficiency, adjustable anti-reflective applied wavelength and conformity to industrialized standards, and can be used for making photoelectric devices such as solar batteries and white light sensors.

Description

technical field [0001] The invention belongs to the surface patterned microstructure construction technology, specifically relates to the combination of self-assembled polymer microspheres, silicon dioxide microspheres or inorganic nanoparticles and reactive ion beam etching technology to construct a structure with strong anti-reflection performance on the substrate method of microstructure. Background technique [0002] Due to the high reflectivity of ordinary planar substrates, the optical system is disturbed by stray light, which seriously affects the transmittance and image resolution capabilities of the optical components in the optical system, resulting in a decrease in the resolution and sensitivity of the optical system, which seriously affects the Performance of optical and optoelectronic devices, such as solar cells, displays, optical sensors, polarizers, optical lenses, etc. In order to improve the performance of these devices, it is necessary to reduce the refle...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G02B1/11G03F7/00B81B1/00
Inventor 吕男徐洪波齐殿鹏高立国迟力峰
Owner JILIN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com