The invention discloses a method for improving performance of an AlTiSiN
coating through low-
negative bias high-energy Ar <+>
etching cleaning. The method comprises the steps that a multi-arc
ion plated
vacuum furnace is vacuumized, then, Ar gas is introduced and is heated to 450 DEG C, a cleaning Ti target is started, then, an
anode target material is started, the cleaning Ti target and the anodetarget material perform positive-negative traction
electron motion, Ar <+> is generated through collision of electrons and the Ar gas,
negative bias is controlled to be minus 180 V, and Ar <+> is attracted to perform
ion bombardment on the surface of a substrate for 30 min; and the AlTiSiN
composite coating is deposited on the treated substrate. According to the method, the substrate is subjectedto
etching cleaning through only high-energy Ar ions in the low-
negative bias condition, the film-substrate
binding force of the AlTiSiN
coating can be remarkably improved through the
etching cleaning technology, wear and friction resistance and
cutting performance of the
coating are improved, and the coating is applicable to a harsh high-
hardness material high-speed
cutting environment, and hasgreat application prospects in the field of cutter and surface protection.