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Plasma processing apparatus

A plasma processing apparatus includes a chamber for containing a substrate to be processed, a gas supply unit for supplying a processing gas into the chamber, and a microwave introducing unit for introducing plasma generating microwaves into the chamber. The microwave introducing unit includes a microwave oscillator for outputting a plurality of microwaves having specified outputs, and an antenna section having a plurality of antennas to which the microwaves outputted from the microwave oscillator are respectively transmitted.
Owner:COMMSCOPE TECH LLC +1

Low energy wireless proximity pairing

ActiveUS20140378056A1Power be lowerDegree of security and/or privacyPower managementTransmission systemsReal-time computingBluetooth
A method of pairing devices includes causing a Bluetooth-enabled host device and a Bluetooth-enabled peripheral device to be located proximate to each other, the Bluetooth-enabled host device comprising at least a processor, a memory and an antenna, in the Bluetooth-enabled host device, detecting advertising packets broadcast by the Bluetooth-enabled peripheral device on one or more of a plurality of advertising channels, saving a numeric indicator of each of multiple detected advertising packets, determining an average numeric indicator from the saved numeric indicators of each of the separately detected advertising packets, if the average numeric indicator exceeds a proximity threshold, determining whether a set of conditions are met, and initiating a Bluetooth device pairing sequence between the Bluetooth-enabled host device and the Bluetooth-enabled peripheral device if the set of conditions are met.
Owner:BOSE CORP
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