54 results about "CADA compound" patented technology

The invention discloses a decorative coating prepared on an aluminum substrate based on a magnetron common sputtering technology. A film system of the decorative coating comprises one or more compound coatings; each compound coating is prepared from a silicon-titanium alloy which carries out reaction with nitrogen N partially and totally. The film system of the decorative coating is suitable for carrying out large-area film plating on the decorative coating on stainless steel strip materials or stainless steel sheets; the film-plating material is suitable for being combined with the aluminum substrate material, a lower electrochemical potential difference exist between the film-plating material elements and between the film-plating material elements and alloy elements of the aluminum substrate material, so that electrochemical corrosion can be prevented; the higher surface hardness and the excellent adhesion to the substrate material are achieved, and a variety of different colors can be obtained.

The invention discloses a second-order metabolic mass spectrometry compound detection method based on visual networks. According to the method, an existing second-order metabolic mass spectrometry database is taken as the basis, a visual network establishment operation is carried out on each piece of compound second-order mass spectrometry data, network global characteristics are extracted as input characteristics of compounds, the input characteristics are trained through an SVM, a compound detection model is obtained, cross validation is carried out on the detection model by establishing a Decoy test set, the reliability and accuracy of the detection model are ensured, and the detection model is enabled to be used for detecting an actual second-order metabolic mass spectrometry compound. According to the second-order metabolic mass spectrometry compound detection method provided by the invention, the realization is simple, and the detection speed and precision of the compound are clearly improved.

There is provided a photoresist composition capable of forming a resist pattern with minimal LER, and a method of forming a resist pattern. This method is a method of producing a (meth)acrylic acid derivative polymer for use as a resist by radical polymerization of a monomer mixture comprising (a1) a (meth)acrylate ester with an acid dissociable, dissolution inhibiting group, and (a2) a (meth)acrylate ester with a lactone unit, wherein (a1) and (a2) utilize compounds such that when each compound (a1) and (a2) is individually subjected to homopolymerization, under identical conditions to the radical polymerization, and a residual monomer ratio is determined 10 minutes after the start of the homopolymerization, the difference between the minimum residual monomer ratio and the maximum residual monomer ratio is no more than 15 mol %.

Library of compounds or their pharmaceutically acceptable salts, each compound being associated with information on its chemical identity and structure, wherein at least two of the compounds is labelled with radioisotope characterised in that the radioisotope is an AMS active radioisotope; a solid support having a compound or its pharmaceutically acceptable salt as hereindefined bound thereto, the compound being associated with information on its chemical identity and structure and comprising a radioisotope, characterised in that the radioisotope is an AMS active radioisotope as hereinbefore defined; process for the preparation of a library of compounds as claimed in any of Claims 1 to 19 comprising radioisotope labelling a plurality of compounds, each compound being associated with information on its chemical identity and structure characterised in that labelling is with an AMS active radioisotope; a kit therefor; Method for selecting one or more candidate compounds comprising screening a library of the invention comprising AMS active radioisotope labelled compounds as hereinbefore defined and obtaining a sample from the screen or submitting a compound identified for metabolic studies and obtaining a sample therefrom, and performing, AMS detection of the sample; and use of the library, a solid support comprising radioisotope labelled compound or a method as hereinbefore defined in (bio)medical, agrochemical, environmental and like screening for further study by AMS detection.

Disclosed are accelerator / curing agent compositions for epoxy resins, comprising (a) at least one aromatic or alicyclic compound containing at least two amine moieties, such amine-containing aromatic or alicyclic compound(s) preferably having from 3 to 5 amine hydrogens per compound and preferably two primary amines per compound, (b) at least one aliphatic compound containing at least two amine moieties, such compound(s) preferably having from 2 to 4 amine hydrogens per compound and one primary and one secondary amine per compound, and (c) at least one non-reactive catalytic compound, preferably having no amine hydrogens. The compositions are useful as drop-in replacements for N-aminoethylpiperazine.