The invention provides measurement structure and method of a base resistance of a bipolar
transistor. The measurement method comprises the steps of: designing a plurality of bipolar
transistor measurement structures with different emitter region widths b; in measurement, zero-offsetting an emitter
electrode and a collector
electrode of each measurement structure, connecting four
metal leading outterminals of a base by using a testing
Kelvin resistance mode, applying an
excitation current I and measuring a
voltage drop Vbb; fitting a curve by using
Delta Vbb / I as ordinates and Delat b / L as abscissas according to the formula of
Delta Vbb / I=Rsh*
Delta b / L+Rlink, wherein L is the
effective length of an emitter region, slope of the curve is an intrinsic square resistance Rsh of a base and intercept is a connecting resistance Rlink of the base; zero-offsetting the emitter region and a collector region of each measurement structure, respectively applying voltages of Vbe+
Delta V and Vbe-DeltaV to the two
metal leading out terminals closest to the emitter region, measuring the current I flowing through the base; and fitting a curve according to the formula of 2
Delta V / Delta I=Rsh*Delta b / L+Rx, wherein the intercept is a non-
intrinsic resistance Rx of the base. The base
contact resistance is Rx-Rlink.