The invention relates to an
electron diffractometer, and provides a double-module layer-by-layer measuring
system. The double-module layer-by-layer measuring
system comprises a vacuum
sample chamber, wherein the vacuum
sample chamber is internally provided with a sample platform; and further comprises an electronic
impulse control unit, a defect regulating and controlling light path and a
processing unit, wherein the defect regulating and controlling light path is provided with a
laser pulse energy regulating device and a
laser pulse scanning device, and the
processing unit comprises a first receiving component for receiving an electronic back scattering pattern, a second receiving component for receiving a
diffraction image and a control center for analyzing the received
diffraction image and the electronic back scattering pattern so as to control the
laser pulse energy regulating device and the laser pulse scanning device. The measuring
system is capable of realizing the in-situ real-time
nondestructive measurement for the micro-
nano manufacturing process, simultaneously realizing the growth and detection, receiving sample surface defect information through
processing the
diffraction image and the back scattering pattern, and regulating the
femtosecond laser
pulse energy and scanning position according to the
information feedback. The defect is repaired, and the purpose of simultaneously detecting and regulating can be realized.