41 results about "Atmospheric exposure" patented technology

A method is for hydrophobization of a surface of a silicon-containing film by atomic layer deposition (ALD), wherein the surface is subjected to atmospheric exposure. The method includes: (i) providing a substrate with a silicon-containing film formed thereon; and (ii) forming on a surface of the silicon-containing film a hydrophobic atomic layer as a protective layer subjected to atmospheric exposure, by exposing the surface to a silicon-containing treating gas without exciting the gas. The treating gas is capable of being chemisorbed on the surface to form a hydrophobic atomic layer thereon.

A method is for hydrophobization of a surface of a silicon-containing film by atomic layer deposition (ALD), wherein the surface is subjected to atmospheric exposure. The method includes: (i) providing a substrate with a silicon-containing film formed thereon; and (ii) forming on a surface of the silicon-containing film a hydrophobic atomic layer as a protective layer subjected to atmospheric exposure, by exposing the surface to a silicon-containing treating gas without exciting the gas. The treating gas is capable of being chemisorbed on the surface to form a hydrophobic atomic layer thereon.

The invention anhydrous antiperspirant cream composition which comprises:a) a particulate aluminum / zirconium astringent salt in an amount of from 5 to 30% by weight;b) a wax in an amount of from 4 to 20% by weight, said wax comprising an aliphatic ester or monohydric alcohol wax; andc) a water-immiscible carrier having a refractive index that is less than 0.1 below the refractive index of the aluminum / zirconium astringent salt and comprising an aromatic ester having a melting point of below 25° C. and / or a non-volatile silicone oil having a refractive index of at least 1.5 in an amount of from 45 to 80% by weight,has excellent avoidance of visible deposits on topical application, both initially and also after leave-on, i.e. after prolonged atmospheric exposure.

A composite quantum-dot photodetector comprising a substrate with a colloidally deposited thin film structure forming a photosensitive region, the thin film containing at least one type of a nanocrystal quantum-dot, whereby the nanocrystal quantum dots are spaced by ligands to form a lattice, and the lattice of the quantum dots has an infill material that forms an inorganic matrix that isolates the nanocrystal quantum dots from atmospheric exposure.

The invention discloses an acceleration test and equivalence estimation method of a simulation coating under marine atmospheric environment. The method comprises the following steps: sequentially performing multi-factor synergy test and salt spray test, and performing combined circulation. One test circulation cycle is 6 days, wherein one cycle of the multi-factor synergy test is 5 days and one cycle of the salt spray test is 1 day. The method is characterized in that conversion coefficients of the coating color difference or the light loss rate between the combined acceleration test in a laboratory and the marine atmospheric environment test are established, when the coating ageing mechanisms are essentially consistent under acceleration test and marine atmospheric environment, the color difference or the light loss rate during the marine atmospheric test is equivalently estimated by the acceleration test data in the laboratory under the same coating and the solar radiation, and the acceleration ratio can reach more than 8 times; the estimation result of the coating performance change is compared with the atmospheric exposure test result, and the error is less than 15%.

A composite quantum-dot photodetector comprising a substrate with a colloidally deposited thin film structure forming a photosensitive region, the thin film containing at least one type of a nanocrystal quantum-dot, whereby the nanocrystal quantum dots are spaced by ligands to form a lattice, and the lattice of the quantum dots has an infill material that forms an inorganic matrix that isolates the nanocrystal quantum dots from atmospheric exposure.

The invention relates to aluminum and aluminum alloy atmospheric corrosion simulation technique, in particular to a test method for simulating the corrosion process of aluminum and aluminum alloy in an industrially polluted atmospheric environment. In the method, aluminum or aluminum alloy is used as a tested material; aqueous solution containing NaHSO3 at a concentration of 0.02mol / L and NaCl at a concentration of 0 to 0.006mol / L is used as corrosive liquid; and soaking, drying and wetting are carried out in turn and are circulated every 10 to 20 minutes, wherein soaking is performed at 45 to 50 DEG C for 1 to 2 minutes, drying is performed at 50 to 60 DEG C for 8 to 15 minutes, wetting is performed at 40 to 50 DEG C for 1 to 3 minutes, and the test time is 48 to 240 hours. The method has simulating performance, accelerating performance and repeatability, can be used in study on the corrosion behaviors of the aluminum and aluminum alloy in the industrially polluted atmospheric environment to evaluate and predict the atmospheric corrosion of the aluminum and aluminum alloy quickly, and can solve the problems of long test period, high cost, difficult environmental factor control and the like of the conventional atmospheric exposure test.

The invention relates to a replacement device and replacement method of an excimer laser window. The device comprises a replacement main cavity with an opening at one end. A cavity wall of the replacement main cavity is provided with multiple observation windows for observing the internal part of the replacement main cavity, a barometer for detecting the internal air pressure in the replacement main cavity, a vacuuming passage, an inflation passage, a plurality of finger sleeve holes and a window chamber. Both the vacuuming passage and the inflation passage communicate with the internal part of the replacement main cavity, and the finger sleeve holes are equipped with operation finger sleeves which facilitate the window replacement in the replacement main cavity. According to the replacement device and the replacement method, a diffusion phenomenon of a halogen medium in the process of replacing an excimer laser window can be significantly reduced, the contamination of parts in atmospheric exposure can be effectively avoided, the number of times of cleaning a discharge chamber and the harm to an operator can be effectively reduced, the passivation process is avoided or the passivation time is significantly reduced, and the use efficiency of a laser and the utilization rate of energy sources are improved.

The invention discloses a climate environment simulating design method for an accelerated aging test of a xenon lamp made from a high molecular material. The method comprises the following steps: (1)monitoring and analyzing climate environment conditions of some region where a high molecular material aging test is to be carried out; (2) designing at least three groups of accelerated aging test parameters of an xenon lamp based on a principle that the parameters are similer to the climate environment condition data of the region; (3) selecting a material, the structural property of which is similar to the to-be-tested high molecular material, as a reference material, and obtaining the accelerated aging test data of the xenon lamp of the reference material; (4) acquiring data of a natural atmospheric exposure test of the reference material; and (5) comparing the natural atmospheric exposure test of the reference material with the accelerated aging test data of the xenon lamp and determining the accelerated aging test condition, the relevance of which to the natural atmospheric exposure test is the best. The method is suitable for a high molecular material aging test.

The invention provides an atmospheric exposure environment test corrosion coupon clamp and belongs to the technical field of natural environment test devices. The clamp structurally comprises a base,an upright post on the base, a connecting part and a top cover, wherein the base is insulated from the upright post, the upright post is cylindrical and is positioned in the center of an upper surfaceof the base, the top cover is insulated, the bottom of the top cover is hollow corresponding to the upright post, a screw rod is fixedly connected in the base, extends out of the center of a lower surface of the base, and is matched with a nut to be fixed on an exposure rack sample fixing batten, the base and the top cover are connected through an elastic contraction part or are in threaded connection through an outer extension end of the screw rod in the base in the other direction, and protrusions with uniform sizes are distributed on a contact surface of the base and the top cover in a staggered mode. The clamp is advantaged in that the clamp is simple in structure, convenient to operate and capable of stably clamping corrosion hanging pieces with different thicknesses, meanwhile, thedesign of the convex points effectively reduces the contact area of the clamp and the corrosion hanging piece and avoids crevice corrosion.

The invention discloses a rapid evaluation method for stress corrosion of low-alloy structural steel in an atmospheric environment. The rapid evaluation method is a stress corrosion sensitivity evaluation method constructed based on electrochemical tests and based on atmospheric environment stress corrosion indoor and outdoor simulation and acceleration research data and a stress corrosion electrochemical mechanism thereof. Compared with a traditional outdoor atmospheric exposure test method, the rapid evaluation method has high operability in indoor tests and short test time, the evaluation of stress corrosion performance of the low-alloy steel can be realized, and the rapid evaluation method can be further used for the research and development, production and relevant evaluation and testing in the material selection process of the low-alloy structural steel. The rapid evaluation method has the characteristics of simulation, acceleration and effectiveness, a new method is provided forthe evaluation study of the stress corrosion sensitivity of the low-alloy structural steel in the atmospheric environment, and thus an advantageous basis is provided for the use and protection of materials.

Disclosed is a mold release film which has such a peel force as to permit light peeling and exerts excellent holding power in storage and which has excellent atmospheric exposure resistance and excellent migration resistance. A mold release film produced by coating at least one side of a polyester film with a curable silicone-based coating material, wherein the vinyl-containing polysiloxane chain of the curable silicone constituting the coating material has a vinyl content of 3% or above in terms of siloxane unit and the SiH / Vi ratio of the coating material is 2.5 to 7.

Provided is Sb—Te alloy powder for sintering in which the maximum grain size of the powder obtained by subjecting gas atomized powder of an Sb—Te alloy to mechanical pulverization is 90 μm or less, and a sintered compact sputtering target obtained by sintering this powder. Further provided is a manufacturing method of Sb—Te alloy powder for a sintered compact sputtering target including the steps of dissolving an Sb—Te alloy, thereafter subjecting this to gas atomization to obtain atomized powder, and further subjecting this to mechanical pulverization in an inert atmosphere without any atmospheric exposure so as to manufacture powder having a maximum grain size of 90 μm or less and reduced oxygen content. Thus, the Sb—Te alloy sputtering target structure can be uniformalized and refined, generation of cracks in the sintered target can be inhibited, and generation of arcing during sputtering can be inhibited. Further, surface ruggedness caused by sputter erosion can be reduced in order to obtain a high quality Sb—Te alloy sputtering target.

A method for removing a mask in a selective area epitaxy process is provided. The method includes forming a first layer on a substrate and oxidizing the first layer. A patterned photoresist can be formed on the oxidized first layer. A portion of the oxidized first layer can then be removed using a wet chemical etch to form a mask. After removing the patterned photoresist a second layer can be epitaxially grown in a metal organic chemical vapor deposition (MOCVD) chamber or a chemical beam epitaxy (CBE) chamber on a portion of the first layer exposed by the mask. The mask can then be removed the mask in the MOCVD / MBE chamber. The disclosed in-situ mask removal method minimizes both the atmospheric exposure of a growth surface and the number of sample transfers.

Endoscope connection portions, a fluid feeding duct, a liquid supply duct, a pump, a first atmospheric exposure duct including one end connected to the fluid feeding duct and the other end exposed to atmosphere, a relief valve disposed at an intermediate position of the first atmospheric exposure duct, a first stop section disposed at an intermediate position of the first atmospheric exposure duct, and a control section that performs control to supply a liquid to ducts of endoscopes and controls at least opening / closing operation of the first stop section are included.

Sample transferring can be securely and easily performed between an FIB device, an electron microscope, and an atom probe device, and atom probe analysis can be performed to a material that easily alters due to atmospheric exposure. A sample holder that holds a sample (12) is provided with an atmosphere-isolation mechanism that prevents the sample from altering due to the atmospheric exposure upon the sample transferring between the devices. There is provided a structure enabling of attaching and detaching a housing (21) of a sample holder leading end of a part of the atmosphere-isolation mechanism in an analytical vacuum device, such as the atom probe device.

The invention adds to the art of replacement source-drain CMOS transistors. Processes may involve etching a recess in the substrate material using one equipment set, then performing deposition in another. Disclosed is a method to perform the etch and subsequent deposition in the same reactor without atmospheric exposure. In-situ etching of the source-drain recess for replacement source-drain applications provides several advantages over state of the art ex-situ etching. Transistor drive current is improved by: (1) Eliminating contamination of the silicon-epilayer interface when the as-etched surface is exposed to atmosphere and (2) Precise control over the shape of the etch recess. Deposition may be done by a variety of techniques including selective and non-selective methods. In the case of blanket deposition, a measure to avoid amorphous deposition in performance critical regions is also presented.

Endoscope connection portions, a fluid feeding duct, a liquid supply duct, a pump, a first atmospheric exposure duct including one end connected to the fluid feeding duct and the other end exposed to atmosphere, a relief valve disposed at an intermediate position of the first atmospheric exposure duct, a first stop section disposed at an intermediate position of the first atmospheric exposure duct, and a control section that performs control to supply a liquid to ducts of endoscopes and controls at least opening / closing operation of the first stop section are included.

The invention discloses an artificial climate environment exposure system and an application method. The system includes aerosol collection and concentration, harmful gas mixing, temperature and humidity adjustment, exposure box and control box and various auxiliary equipment, providing an efficient and cumulative animal experiment suitable for aerosol particles and harmful gas exposure The environmental control system combines the collection of aerosol particles with multi-factor control of the warehouse-style artificial climate environment. The system is designed with a combination of various environmental factors, and has a variety of experimental functions to achieve the effect of one machine with multiple functions. It can be used not only to study the exposure of atmospheric suspended particles to animals, but also to study harmful gases and environmental climate factors. For the exposure effect of animals, the synergistic exposure effect of the three can also be studied.