The invention relates to the field of film and
coating preparation, and relates to an
electric arc ion plating apparatus which is used for depositing a film or a
coating on the inner surface of a long
pipe or on the inner wall of a deep-hole device. The
electric arc ion plating apparatus comprises three sets of
magnetic field generation apparatuses. A first
magnetic field generation apparatus used for beaming a
metal ion flow emitted by a
cathode target is arranged outside a
vacuum chamber at a position corresponding to the back of the
cathode target. A second
magnetic field generation apparatus used for beaming the
metal ion flow is arranged between the
cathode target and a workpiece in the
vacuum chamber. A third magnetic field generation apparatus used for diffusing the beamed
metal ion flow and for making the metal ions move with a high speed towards the inner surface of the long
pipe or the inner wall of the deep-hole device is arranged on the periphery of the workpiece in the
vacuum chamber. The
electric arc ion plating apparatus also comprises a pulse bias power supply used for further accelerating the metal ions moving towards the inner surface of the long
pipe or the inner wall of the deep-hole device. With the apparatus provided by the invention, a technical problem for depositing a film or a
coating on the inner surface of the long pipe or the inner wall of the deep-hole device is solved. Film or coating uniformity and quality are ensured, and the content of large particles in the deposited film or coating is reduced.