The present invention provides a thin film write head having an improved laminated flux carrying structure and method of fabrication. The preferred embodiment provides laminated
layers of: high moment magnetic material, and easily aligned
high resistivity magnetic material. In the preferred embodiment, the easily aligned laminating layer induces uniaxial
anisotropy, by exchange
coupling, to improve uniaxial
anisotropy in the high moment material. This allows deposition induced uniaxial
anisotropy by DC magnetron
sputtering and also provides improved post deposition annealing, if desired. It is preferred to laminate FeXN, such as FeRhN, or other crystalline structure material, with an amorphous
alloy material, preferably Co based, such as CoZrCr. In the preferred embodiment, upper and
lower pole structures may both be laminated as discussed above. Such laminated structures have higher Bs than structures with insulative laminates, and yokes and pole tips and may be integrally formed, if desired, because flux may travel along or across the laminating
layers. The preferred embodiment of the present invention improves soft magnetic properties, reduces eddy currents, improves hard axis alignment while not deleteriously affecting the
coercivity, permeability, and
magnetostriction of the structure, thus allowing for improved
high frequency operation.