The invention discloses a corn high-yield and lodging-resistant cultivation method which includes the following steps that on the basis of
soil preparation and land formation, a rectangular piece of land is mechanically made, the width of the face of the rectangular piece of land is 110 cm, the width of a
ridge of the rectangular piece of land is 30 cm, seeding strips are seeded on the positions, away from the two sides of the
ridge of the rectangular piece of land by 2.5 cm, each seeding strip is composed of two rows of seeds, the distance of the two rows of seeds is 15 cm, the two rows of seeds are distributed in a staggered mode, and the
vertical distance of every two adjacent holes of seeds is a planned planting distance; corn
seedling cultivation is performed, a
seedling is grown with three leaves and one core, when a newly-grown
root system of the bottom of the corn
seedling penetrates out of a
water leakage hole in the bottom of a hole plate again by 0.5-2 cm, and the seedling is transplanted into a field; in the early stage of jointing of corns, composite modifiers of 30 kilograms are evenly sprayed on corn
plant leaves by utilizing a conventional
sprayer,
moisture serves as the degree, and the composite modifier of each
kilogram comprises 301-400 mg / kg of
succinic acid, 0.000031-0.00005 mg / kg of CPPU, 20-60 mg / kg of
uniconazole and 50000-100000 mg / kg of
monopotassium phosphate.