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30results about How to "Improve treatment uniformity" patented technology

Airflow balancing plate, chamber device and substrate processing device

The invention discloses an airflow balancing assembly, a chamber device and a substrate processing device. The airflow balancing assembly comprises a first annular plate and a second annular plate, wherein the first annular plate is provided with a first opening; a plurality of through holes are formed in the first annular plate; the second annular plate is provided with a second opening and is arranged on the first annular plate in an adjustable manner for partially shielding the plurality of the through holes in the first annular plate; the radial width of the second annular plate is changed along the circumferential direction of the second annular plate, so that the areas of the plurality of the through holes shielded by the second annular plate are changed along the circumferential direction of the first annular plate. The air balancing assembly provided by the embodiment of the invention is beneficial to improving the air distribution uniformity, and can improve the processing uniformity of the substrate. Besides, the airflow balancing assembly with the structure has a simple structure, is easy to manufacture, and low in cost. Besides, the adjustment can be flexibly implemented for different chamber structures, processes or chamber pressures.
Owner:BEIJING NAURA MICROELECTRONICS EQUIP CO LTD

Substrate processing method and substrate processing apparatus

Disclosed is a substrate processing method wherein the infrared absorptance or infrared transmittance of a substrate to be processed is measured in advance, and the substrate is processed according to the measured value while independently controlling temperatures at least in a first region located in the central part of the substrate and in a second region around the first region using temperature control means which are respectively provided for the first region and the second region and can be controlled independently from each other.
Owner:TOKYO ELECTRON LTD

Preparation method for coating of nano-silica through miniemulsion polymerization

The invention relates to a preparation method for coating of nano-silica through miniemulsion polymerization, which relates to the technical field of atom transfer radical polymerization and miniemulsion polymerization. The preparation method comprises the following steps: preparing a macroinitiator to modify the surface of a monomer, removing a solvent and a catalyst and then preparing a graft copolymer from the brominated monomer and a silane coupling agent through the ATRP method; and individually using the copolymer prepared above as a co-stablizer or a silane coupling agent for miniemulsion polymerization so as to finally prepare a stable emulsion particle with narrow particle size distribution and to meet requirements for coating of nano-silica. The preparation method provided by the invention has the advantages of safe process, simple operation and improvement of the characteristic of great possibility of agglomeration of nano-silica caused by a great specific surface area and high surface energy of nano-silica; and with the preparation method, the nano-silica particle with uniform particle size distribution and uniform dispersion is obtained, and the nano-silica particle is better compatible with a polymer.
Owner:CHANGZHOU UNIV

Laser crystal plasma modified etching assisted polishing processing method

The invention relates to a laser crystal plasma modified etching assisted polishing processing method. The method comprises a preprocessing step, a plasma processing step, an acid etching step and a polishing processing step which are carried out sequentially. The method avoids processing defects and surface / sub-surface damages possibly introduced by machining, grinding and polishing processes using conventional machines, and significantly improves the processing efficiency of sesquioxide laser crystals. Super-smooth, low / non-damage and high-precision laser crystal surfaces can be quickly obtained.
Owner:TIANJIN UNIV

Processing device and processing system for flat-panel display glass

A processing device and a processing system for the flat-panel display glass based on the invention are characterized in that injection nozzles are arranged in plurality of parallel lines without overlap in a moving direction of the flat-panel display glass; in each line, an equal quantity of nozzles and the nozzles of neighboring lines are separated with an identical distance in the moving direction of the flat-panel display glass and its vertical direction separately; thus, even there are non material vibrations of the injection nozzles, an effect that the injection nozzles vibrate at an even speed along the movement of the flat-panel display glass will be obtained, such that it is capable of processing the flat-panel display glass uniformly.
Owner:SUBARU TECNICA INTERNATIONAL

Water treatment device based on mechanism of photocatalysis reaction of nano-crystalline titanium dioxide fiber

InactiveCN102583638AReduce light absorption barrierImprove catalytic effect and efficiencyWater/sewage treatment by irradiationWater/sewage treatment by oxidationBody typeWater pipe
The invention discloses a water treatment device based on a mechanism of a photocatalysis reaction of nano-crystalline titanium dioxide fiber. The water treatment device comprises photocatalysis reactors of the nanocrystalline titanium dioxide fiber, a water storage tank, a water pump, a first valve, a second valve, a flow meter, a spraying and aerating head, a water outlet pipe and a connecting pipe. The water treatment device has the advantages that multiple stages of square body type reactors are stacked together to realize equal-path parallel circulating water treatment, the number of thereactors can be conveniently increased and reduced, the efficiency of a photocatalysis circulating water treatment is high due to the adoption of a parallel mechanism, and the continuity is strong; ultraviolet lamps are horizontally placed above the reactors and parabola-shaped lampshades are adopted, so that light can be vertically incident into liquid levels to the maximal extent; as parallel clapboards are arranged, the flow rates of water flows in the reactions are obviously reduced, breakage and loss of the fiber, which are caused by overlarge impact of the water flows, are effectively avoided, and the strokes of the water flows in different time segments are uniform; and the water treatment device can be applied to large-flow dynamic continuous water treatment, makes large-scale treatment of industrial wastewater containing organic pollutants possible, has a simple structure, requires a low cost and has a broad prospect.
Owner:NANJING UNIV OF SCI & TECH

Method for manufacturing semiconductor device and substrate processing apparatus

The invention provides a method for manufacturing a semiconductor device and a substrate processing apparatus. The invention provides a technique capable of improving the uniformity of substrate processing. The technique comprises the steps of a film forming process of supplying at least a film-forming gas and a first inert gas onto a substrate within a process chamber to form a film on the substrate; and a deposited film removing process of supplying a second inert gas having a temperature higher than that of the first inert gas directly into the process chamber, in a state where there is no substrate in the process chamber, to remove a deposited film deposited within the process chamber by the film forming process.
Owner:KOKUSA ELECTRIC CO LTD

Substrate processing apparatus

A substrate processing apparatus includes a cavity having a substrate processing space and a coil portion having a plurality of inductance coils each of which has a shape winding the outer circumference of the cavity and is arranged at the extending direction of the cavity. The plurality of inductance coils include margin type inductance coils forming plasma in the cavity, with the density of theplasma in a zone corresponding to a margin zone of the substrate being higher than the density of the plasma in a zone corresponding to the central zone of the substrate; and central type inductance coils forming plasma in the cavity, with the density of the plasma in the zone corresponding to a central zone of the substrate being higher than the density of the plasma in a zone corresponding to the margin zone of the substrate. Effects of increasing plasma spatial uniformity and increasing substrate processing uniformity are achieved in embodiments. Through stacking and mounting the pluralityof inductance coils at the vertical direction, a capacity of plasma formed corresponding to a substrate processing surface is increased, and the plasma density changing along with processing zones isincreased.
Owner:AP SYST INC

Industrial plant for drying and/or conditioning flexible laminar surfaces

An industrial plant for drying and / or conditioning (1) flexible laminar surfaces comprising an operating tunnel (2) mainly developing according to a linear direction (Z) and provided with air conditioning devices (3) and / or traction organs suitable to act on the flexible laminar surfaces so as to dry them and / or spread them according to predetermined treatment and / or tensioning cycles, a plurality of support frames (4), each of which suitable to receive at least one of the flexible laminar surfaces so as to keep it in a spread and vertical position, moving means (5), operatively connected with the support frames (4) in order to convey them along the linear direction (Z) according to a predefined speed within the operative tunnel (2), to allow drying and / or tensioning of the flexible laminar surfaces, and outside the operative tunnel (2) to allow discharging of the flexible laminar surfaces dried and / or tensioned in a working cycle and loading of the flexible laminar surfaces to be dried and / or tensioned in the following processing cycle. In particular, the industrial drying plant comprises a buffer loading station (6), arranged upstream the operative tunnel (2) with which it communicates, suitable to integrally receive a pre-established group (7) of the support frames (4) before the pre-established group (7) itself of support frames (4) is transferred in bulk within the operative tunnel (2) by the moving means (5), in such a way that the support frames (4) of the pre-established group (7) simultaneously reach the inside of the operating tunnel (2) and the flexible laminar surfaces supported by the support frames (4) of the pre-established group (7) are simultaneously subjected to the processing of the air conditioning devices.
Owner:ERRETRE

Method of manufacturing semiconductor device and substrate processing apparatus

The invention provides a method of manufacturing semiconductor device and a substrate processing apparatus. The uniformity of processing each substrate is improved. The method of manufacturing a semiconductor device includes: processing a substrate by operating a processing apparatus included in a substrate processing apparatus, based on a first process setting; acquiring apparatus data of the processing apparatus when processing the substrate; generating first evaluation data of the processing apparatus based on an evaluation factor corresponding to the first process setting and the apparatusdata; determining one or more recipe items executable in the processing apparatus based on the first evaluation data; and notifying the one or more recipe items.
Owner:KOKUSA ELECTRIC CO LTD

Surface treatment device and method

The invention provides a surface treatment device and a method. The surface treatment device comprises conveying devices and fountain bases. The conveying devices are used for conveying substrates, the fountain bases are assembled with the corresponding conveying devices respectively to form first liquid accumulation space, each fountain base is provided with a liquid injection port, the liquid injection ports are communicated with the corresponding first liquid accumulation space, the first liquid accumulation space can be used for accumulating a treating liquid injected by the liquid injection ports, the lower surfaces of the substrates conveyed by the conveying devices can be in contact with the treating liquid, and thereby the surface treatment process of the substrates can be performed.
Owner:GALLANT PRECISION MACHINING CO LTD

Wind supply mechanism and air treatment device

The invention relates to a wind supply mechanism and an air treatment device. The wind supply mechanism comprises at least three sequentially connected wind supply assemblies; the wind supply direction of the wind supply assemblies is the axial of the wind supply assemblies; all wind outlets of the wind supply assemblies are formed in the same side of the wind supply mechanism and are all in the same plane; the wind supply assemblies incline towards the reverse directions of the winding supply directions of the wind supply assemblies with respect to the extension lines of the axes of the neighboring wind supply assemblies and in the directions away from the neighboring wind supply assemblies. The wind supply mechanism is applied on the air treatment device such as an air conditioner, windcan be supplied from sides, wind supply scope is expanded, the wind is supplied uniformly, and treatment uniformity of the air treatment device to environment is improved; besides, various wind supplyassemblies are further capable of supplying the wind separately, the subarea treatment on the environment is achieved, and the adaptability of different requirements is improved.
Owner:GREE ELECTRIC APPLIANCES INC

Heat-resisting anti-creep ultra-high molecular weight polyethylene fiber ultraviolet radiation crosslinking device

The invention discloses a heat-resisting anti-creep ultra-high molecular weight polyethylene fiber ultraviolet radiation crosslinking device which comprises a plurality of groups of transmission rollers and ultraviolet radiation devices, wherein the ultraviolet radiation devices are arranged on two optional adjacent groups of transmission rollers. The ultraviolet radiation devices comprise radiation shields with 'U'-shaped structures and ultraviolet light sources arranged inside the radiation shields. The heat-resisting anti-creep ultra-high molecular weight polyethylene fiber ultraviolet radiation crosslinking device can radiate ultra-high molecular weight polyethylene fibers by the ultraviolet radiation devices in the preparation process to finish the crosslinking process of the ultra-high molecular weight polyethylene fibers, and bonding tightness of molecular chains of the fibers is further improved, so that the operational performance of the formed ultra-high molecular weight polyethylene fibers in any environments can be guaranteed.
Owner:JIANGSU SHENTAI SCI & TECH DEV

Heat treatment method and heat treatment apparatus

A heating processing method and a heat processing device capable guaranteeing the evenness and increasing the carrying block number of a substrate keeping component compared with the current are provided. The substrate holder (10) holds a plurality of substrates (w) at predetermined vertical intervals. The substrate holder (10) is carried into a heat treating furnace (3). A predetermined heat treatment is performed on the substrates. The substrate holder (10) has two holder constituting bodies (10a, 10b). Each of the holder (10a, 10b) constituting bodies has a plurality of columns (28) and substrate holding sections (30). The columns (28) are arranged on the circumference of the same imaginary circle. The substrate holding sections (30) hold circumferential portions of the respective substrates (w) and are mounted on each column (28). One of the holder constituting bodies (10) holds the substrates under the condition that front surfaces of the substrates face upward, while the other of the holder constituting bodies (10b) holds the substrates under the condition that back surfaces of the substrates face upward. The substrate (w) with the front surface facing upward and the substrate with the back surface facing upward are alternately arranged in a vertical direction.
Owner:TOKYO ELECTRON LTD

Industrial equipment for drying and/or conditioning flexible laminated surfaces

An industrial plant for drying and / or conditioning (1) flexible laminar surfaces comprising an operating tunnel (2) mainly developing according to a linear direction (Z) and provided with air conditioning devices (3) and / or traction organs suitable to act on the flexible laminar surfaces so as to dry them and / or spread them according to predetermined treatment and / or tensioning cycles, a plurality of support frames (4), each of which suitable to receive at least one of the flexible laminar surfaces so as to keep it in a spread and vertical position, moving means (5), operatively connected with the support frames (4) in order to convey them along the linear direction (Z) according to a predefined speed within the operative tunnel (2), to allow drying and / or tensioning of the flexible laminar surfaces, and outside the operative tunnel (2) to allow discharging of the flexible laminar surfaces dried and / or tensioned in a working cycle and loading of the flexible laminar surfaces to be dried and / or tensioned in the following processing cycle. In particular, the industrial drying plant comprises a buffer loading station (6), arranged upstream the operative tunnel (2) with which it communicates, suitable to integrally receive a pre-established group (7) of the support frames (4) before the pre-established group (7) itself of support frames (4) is transferred in bulk within the operative tunnel (2) by the moving means (5), in such a way that the support frames (4) of the pre-established group (7) simultaneously reach the inside of the operating tunnel (2) and the flexible laminar surfaces supported by the support frames (4) of the pre-established group (7) are simultaneously subjected to the processing of the air conditioning devices.
Owner:ERRETRE

Efficient nitrogen and phosphorus removal aeration biological filter integrated equipment

The invention provides efficient nitrogen and phosphorus removalaeration biological filter integrated equipment which comprises a sewage inlet pipe and a machine room; the end, away from a water collecting pipe network, of the sewage inlet pipe is communicated with an integrated grating pool, a water outlet of the integrated grating pool is communicated with an overflow pipe, and the right side ofthe bottom of an inner cavity of the integrated grating pool is in bolted connection with a first submersible sewage pump; a water outlet of the first submersible sewage pump is communicated with a water inlet pipe, and the end, away from the integrated grating pool, of the water inlet pipe is communicated with an integrated sewage treatment pool. A driving source is provided through an air blower, and then sewage in the integrated sewage treatment tank can be subjected to aeration treatment through cooperation of an aeration pipe, a backwashing main pipe, an aeration main pipe, aeration branch pipes and single-hole membrane aerators, so that the contact area between sewage particles and microorganism molecules is increased, so that the reaction rate between sewage and microorganisms is enhanced; a stainless steel filter screen, bamboo charcoal activated carbon and ceramsite are matched with one another, and accordingly, the sewage can be subjected to graded filtration and adsorption.
Owner:广西金妙松环保工程有限公司

Substrate support assembly and substrate processing device including same

A substrate support assembly arranged in a chamber includes a support plate including a first surface on which a substrate is seated; a driver configured to tilt the support plate such that the firstsurface is inclined with respect to a reference surface by a lower inclination angle; and a controller configured to control the driver such that the lower inclination angle is adjusted based on an upper inclination angle formed by the inclination of the gas supplier coupled to the upper surface of the chamber with respect to the reference surface.
Owner:エーエスエムアイピーホールディングベーフェー

A method of controlling rock slope collapse by using microbial film and micp technology

The invention discloses a method for controlling rock slope collapse by utilizing microbial film and MICP technology, and belongs to the technical field of collapse prevention and control. In the present invention, a number of grouting pipes and grouting pipes are first inserted along the extension direction of rock mass fissures, and then grouting is carried out with the bacterial solution containing flocculent biofilm, and the grouting pipes and grouting pipes are removed after the grouting is completed. And seal the grouting port and the grouting port with cement mortar. The invention greatly reduces the construction cost by introducing microbial film and circulating grouting, and improves the uniformity of crack surface treatment by introducing dredging liquid.
Owner:NANJING UNIV +1

Yarn hanging device

The invention relates to a yarn hanging device, which is characterized in that the device comprises a hollow column, more than one layer of hollow beams communicated with the hollow column are correspondingly arranged on the two sides of the hollow column, a plurality of extension bars communicated with the hollow beam are arranged on each hollow beam at intervals and a plurality of holes are arranged on each extension bar; and the external ends of the hollow beams on each side are connected into a whole body through one same support column, the bottom part of the support column and the bottom part of the hollow column are connected with a yarn frame chassis with meshes, and a pipeline connector is arranged at the end of the hollow column. The invention has the advantages that the labor intensity in process of yarn hanging is low, the fiber treatment evenness is high, the treated fiber is smooth and straight, and the device can be widely used in the processing field of all kinds of phloem fiber and can also be used for yarn treatment such as yarn dyeing, bleaching, softening, washing and the like.
Owner:WUHAN HEMP BIOLOGICAL TECH CO LTD +3

Plasma processing system with airflow limiting mechanism and method using same

The invention discloses a plasma processing system with an airflow limiting mechanism, and belongs to the technical field of plasma processing. The plasma processing system comprises an outer frame, electrode plates, gas transmission pipelines, a vacuumizing system and material placement fixtures. The electrode plates, the material placement fixtures and vent holes in the gas transmission pipelines are positioned in a vacuum cavity body formed by the outer frame. Each material placement fixture has a frame-shaped structure, and is positioned between two opposite electrode plates. The gas transmission pipelines are positioned between the material placement fixtures and the electrode plates, and the vent holes of the gas transmission pipelines are opposite to frames of the material placement fixtures. The invention also discloses a plasma processing method. By the plasma processing system with the airflow limiting mechanism, a gas is uniformly distributed between the electrode plates, and is completely ionized to generate uniform a plasma gas, and a processed sample is subjected to plasma processing. The processed sample can be subjected to uniform plasma processing, so that the problem of non-uniformity of the plasma processing is solved, and plasma processing efficiency also can be improved.
Owner:BOFFOTTO ELECTRONICS TECH

Gas flow equalization plates, chamber assemblies and substrate handling equipment

The invention discloses an airflow balancing assembly, a chamber device and a substrate processing device. The airflow balancing assembly comprises a first annular plate and a second annular plate, wherein the first annular plate is provided with a first opening; a plurality of through holes are formed in the first annular plate; the second annular plate is provided with a second opening and is arranged on the first annular plate in an adjustable manner for partially shielding the plurality of the through holes in the first annular plate; the radial width of the second annular plate is changed along the circumferential direction of the second annular plate, so that the areas of the plurality of the through holes shielded by the second annular plate are changed along the circumferential direction of the first annular plate. The air balancing assembly provided by the embodiment of the invention is beneficial to improving the air distribution uniformity, and can improve the processing uniformity of the substrate. Besides, the airflow balancing assembly with the structure has a simple structure, is easy to manufacture, and low in cost. Besides, the adjustment can be flexibly implemented for different chamber structures, processes or chamber pressures.
Owner:BEIJING NAURA MICROELECTRONICS EQUIP CO LTD

Device for upsetting and crimping

An absorbent article including a topsheet, a backsheet, and an absorbent core sandwiched between the topsheet and the backsheet, a back waist portion having an inner surface, an outer surface, a first lateral end and a second lateral end, and a front waist portion having an inner surface, an outer surface, a first lateral end and a second lateral end. At least one hook-type fastener is disposed at each of the first and second lateral ends of the back waist portion. A crotch portion longitudinally connects the back and front waist portions. At least a portion of the outer surface of the front waist portion is made of a bonded nonwoven subjected to at least one of a water jet treatment and aperturing, and the at least one hook-type fastener is releasably attachable to the outer surface of the front waist portion.
Owner:SAURER GMBH & CO KG

Semiconductor device manufacturing method and substrate processing apparatus

The present invention provides a method of manufacturing a semiconductor device and a substrate processing apparatus, and its technical subject is to improve the uniformity of processing for each substrate. The manufacturing method of a semiconductor device has: a step of operating a processing device based on a first processing setting to process a substrate; a step of acquiring device data of the processing device during processing; a step of generating first evaluation data of the processing device; a step of determining a recipe item executable in the processing device based on the first evaluation data; and a step of reporting the recipe item.
Owner:KOKUSA ELECTRIC CO LTD

Fabric sand washing device for garment production

The invention relates to the technical field of fabric processing auxiliary devices, in particular to a fabric sand washing device for garment production. A fabric can be conveyed conveniently, the fabric processing uniformity is improved, and the using reliability is improved; alkali water brought by the fabric obtained after processing is preliminarily cleaned, the influence on follow-up processing is reduced, and practicability is improved; the device comprises a working box and a set of supporting columns, further comprises a set of fixing plates, a set of transmission rollers, a set of fixing shafts, a set of limiting plates, a set of left limiting rollers, a set of right limiting rollers, a set of limiting shafts, a set of supporting plates, a set of driving rollers, a set of upper connecting shafts, a set of lower connecting shafts, a set of driving gears, a set of driven gears and a set of rotating handles, and further comprises a cleaning box, a fixing plate, a set of supporting shafts, an upper flow division box, a lower flow division box, a set of supporting pipes, a set of nozzles, a set of liquid inlet pipes, a set of conveying pumps, a liquid outlet pipe and a set ofbristles.
Owner:YANCHENG DIJIANI CLOTHING

Ekg electroosmotic method combined in-line vacuum preloading combined method test device and method

The invention discloses a test device and a test method compounding an EKG (electrokinetic geosynthetics) electro-osmosis method with a direct-discharge type vacuum pre-loading combination method. The device comprises an organic glass model slot, wherein holes are formed in the side wall of the model slot, and the holes are sealed by use of rubber plugs; micro pH meters are connected to a conductive plastic water draining board through guide wires and then are connected to a power supply through the rubber plugs; the water draining board is fixed to the inner surface of the bottom of the model slot; the water draining board is connected to a water draining main tube through a plate tube connector; the water draining main tube is sequentially connected to a vacuum tube and a suction flask; the suction flask is arranged on an electronic scale; the suction flask is connected to the vacuum pump; and a water pump controller is connected to the vacuum pump. According to the test device, a soil body is treated by combining an electrode transition cathode direct-discharge vacuum-electro-osmosis method with a no-transition electrode two-sided water-discharge vacuum-electro-osmosis method, so that the pH value changes, the voltage changes and the sedimentation changes in the soil body can be accurately monitored, and therefore, the condition that vacuum pre-loading and electro-osmosis are restrained with each other at an anode according to the conventional vacuum-electro-osmosis method is relieved, the test efficiency is improved, the soil body reinforcing effect is improved, and the reinforced soft soil foundation has relatively high bearing capacity.
Owner:HOHAI UNIV

Water treatment device based on mechanism of photocatalysis reaction of nano-crystalline titanium dioxide fiber

The invention discloses a water treatment device based on a mechanism of a photocatalysis reaction of nano-crystalline titanium dioxide fiber. The water treatment device comprises photocatalysis reactors of the nanocrystalline titanium dioxide fiber, a water storage tank, a water pump, a first valve, a second valve, a flow meter, a spraying and aerating head, a water outlet pipe and a connecting pipe. The water treatment device has the advantages that multiple stages of square body type reactors are stacked together to realize equal-path parallel circulating water treatment, the number of thereactors can be conveniently increased and reduced, the efficiency of a photocatalysis circulating water treatment is high due to the adoption of a parallel mechanism, and the continuity is strong; ultraviolet lamps are horizontally placed above the reactors and parabola-shaped lampshades are adopted, so that light can be vertically incident into liquid levels to the maximal extent; as parallel clapboards are arranged, the flow rates of water flows in the reactions are obviously reduced, breakage and loss of the fiber, which are caused by overlarge impact of the water flows, are effectively avoided, and the strokes of the water flows in different time segments are uniform; and the water treatment device can be applied to large-flow dynamic continuous water treatment, makes large-scale treatment of industrial wastewater containing organic pollutants possible, has a simple structure, requires a low cost and has a broad prospect.
Owner:NANJING UNIV OF SCI & TECH

System and method for achieving uniformity of substrate processing using transformer

Systems and methods for using a transformer to achieve uniformity in substrate processing are described. One of the systems includes a primary winding having a first end and a second end. The first end is coupled to an output of an impedance matching circuit, and the second end is coupled to a capacitor. The system also includes a secondary winding associated with the primary winding, and the secondary winding is coupled to a first end and a second end of a transformer coupled plasma (TCP) coil of the plasma chamber. The primary winding receives a modified radio frequency (RF) signal from the impedance matching circuit to generate a magnetic flux to induce a voltage in the secondary winding. An RF signal generated by the voltage is transmitted from the secondary winding to the TCP coil.
Owner:LAM RES CORP
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