1488results about How to "High surface energy" patented technology

Embodiments of the invention generally provide a method for depositing films or layers using a UV source during a photoexcitation process. The films are deposited on a substrate and usually contain a material, such as silicon (e.g., epitaxy, crystalline, microcrystalline, polysilicon, or amorphous), silicon oxide, silicon nitride, silicon oxynitride, or other silicon-containing materials. The photoexcitation process may expose the substrate and / or gases to an energy beam or flux prior to, during, or subsequent a deposition process. Therefore, the photoexcitation process may be used to pre-treat or post-treat the substrate or material, to deposit the silicon-containing material, and to enhance chamber cleaning processes. Attributes of the method that are enhanced by the UV photoexcitation process include removing native oxides prior to deposition, removing volatiles from deposited films, increasing surface energy of the deposited films, increasing the excitation energy of precursors, reducing deposition time, and reducing deposition temperature.

Embodiments of the invention generally provide a method for depositing films or layers using a UV source during a photoexcitation process. The films are deposited on a substrate and usually contain a material, such as silicon (e.g., epitaxy, crystalline, microcrystalline, polysilicon, or amorphous), silicon oxide, silicon nitride, silicon oxynitride, or other silicon-containing materials. The photoexcitation process may expose the substrate and / or gases to an energy beam or flux prior to, during, or subsequent a deposition process. Therefore, the photoexcitation process may be used to pre-treat or post-treat the substrate or material, to deposit the silicon-containing material, and to enhance chamber cleaning processes. Attributes of the method that are enhanced by the UV photoexcitation process include removing native oxides prior to deposition, removing volatiles from deposited films, increasing surface energy of the deposited films, increasing the excitation energy of precursors, reducing deposition time, and reducing deposition temperature.

Embodiments of the invention generally provide a method for depositing films using photoexcitation. The photoexcitation may be utilized for at least one of treating the substrate prior to deposition, treating substrate and / or gases during deposition, treating a deposited film, or for enhancing chamber cleaning. In one embodiment, a method for depositing silicon and nitrogen-containing film on a substrate includes heating a substrate disposed in a processing chamber, generating a beam of energy of between about 1 to about 10 eV, transferring the energy to a surface of the substrate; flowing a nitrogen-containing chemical into the processing chamber, flowing a silicon-containing chemical with silicon-nitrogen bonds into the processing chamber, and depositing a silicon and nitrogen-containing film on the substrate.

An ink composition comprises silver nanoparticles, hydrocarbon solvent, and an alcohol co-solvent. The ink composition is suitable for printing conductive lines that are uniform, smooth, and narrow on various substrate surfaces.

In order to treat a biological material (1) containing living cells with a plasma (4) generated by a gas discharge at atmospheric pressure (9) an electrode (3) is arranged at a distance to the biological material (1). Further, a solid body dielectric (2) is arranged between the electrode (3) and the biological material (1), directly in front of the electrode (3) and at a distance to the biological material (1). Then a high alternating voltage consisting of separated high voltage pulses of alternating polarity is applied to the electrode (3) for igniting and maintaining a dielectric barrier gas discharge within a region between the dielectric (2) and the biological material (1).

De novo synthesized large libraries of nucleic acids are provided herein with low error rates. Further, devices for the manufacturing of high-quality building blocks, such as oligonucleotides, are described herein. Longer nucleic acids can be synthesized in parallel using microfluidic assemblies. Further, methods herein allow for the fast construction of large libraries of long, high-quality genes. Devices for the manufacturing of large libraries of long and high-quality nucleic acids are further described herein.

The invention belongs to the field of electromagnetic wave absorbing material preparation and relates to a polyaniline / oxidized graphene / ferriferrous oxide composite material and its preparation method. The preparation method comprises the following steps: (1) preparing graphite oxide; (2) preparing ferriferrous oxide nanoparticles; (3) preparing a polyaniline / oxidized graphene / ferriferrous oxide ternary complex; and (4) weighing the polyaniline / oxidized graphene / ferriferrous oxide ternary complex and paraffin, and uniformly mixing to obtain the polyaniline / oxidized graphene / ferriferrous oxide absorbing material. The material provided by the invention has characteristics of low cost, simple preparation technology, strong electromagnetic wave absorbing capability, wide absorption band, low density and the like, has good electromagnetic property, and has important application value in the field of microwave absorption and electromagnetic shielding.

A plasma aided high-energy ball grinding method includes such steps as installing the front cover plate and rod electrode of ball grinder, respectively connecting the ball grinder and rod electrode to the poles of plasma power supply, loading the powder to be ground in the ball grinder, pumping negative pressure, filling discharging gas medium, turning on the plasma power supply, regulating discharge parameters for corona discharge or glow discharge, and turning on the motor to drive the vibration exciting block for ball grinding.

The invention discloses a method for preparing the nanometer ink through ceramics, metal, semiconductors, glass and other high-melting-point materials, carrying out 3D printing and utilizing the laser heating sintering in the process of printing to obtain 3D devices formed by combining the ceramics, the metal, the semiconductors and other composite. The method comprises the first step of processing raw materials needed to prepare the device into nanometer particles of 1-500nm, the second step of preparing the particles into ink jet printing ink, the third step of carrying out 3D printing by utilizing an improved ordinary ink printer and adopting the laser heating sintering in the process of printing, and the fourth step of achieving the melting and sintering molding of the nanometer particles. According to the method, micron-level precision devices with any complex shape can be directly prepared, the high surface energy of the nanometer particles is utilized, the sintering temperature is lowered, high density is achieved, and a superior property is obtained. The method can be used for manufacturing automobile metal ceramic composite pistons, aviation engine tail pipes, and ceramic bearings and ceramal composite precise components of watches and other precision instruments and for directly printing a circuit board.

The invention discloses a marine anticorrosive coating. The marine anticorrosive coating consists of the following components in percentage by mass: 30-40 percent of film forming matter, 21.5-33.8 percent of pigment filler, 6.2-15.4 percent of aids and 30-42.3 percent of solvent, wherein the film forming matter consists of 16-23 mass percent of water-based phenolic epoxy resin and 14-16 mass percent of waterborne polyurethane; the pigment filler comprises graphene; the solvent is deionized water. The marine anticorrosive coating has high corrosion resistance, high flexibility, high wear resistance, high oil and aging resistance and good antirust performance. The film forming matter integrates high adhesion force, high strength, low shrinkage rate and high corrosion resistance of the water-based phenolic epoxy resin as well as high flexibility, wear resistance, oil and aging resistance and good film-forming performance of the waterborne polyurethane.

De novo synthesized large libraries of nucleic acids are provided herein with low error rates. Further, devices for the manufacturing of high-quality building blocks, such as oligonucleotides, are described herein. Longer nucleic acids can be synthesized in parallel using microfluidic assemblies. Further, methods herein allow for the fast construction of large libraries of long, high-quality genes. Devices for the manufacturing of large libraries of long and high-quality nucleic acids are further described herein.