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561results about "Anti-reflective coatings" patented technology

Spin-on anti-reflective coatings for photolithography

Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. Suitable pH tuning agents not only adjust the pH of the final spin-on composition, but also influence the chemical performance and characteristics, mechanical performance and structural makeup of the final spin-on composition that is part of the layered material, electronic component or semiconductor component, such that the final spin-on composition is more compatible with the resist material that is coupled to it. More specifically, the pH tuning agent strong influences the polymeric characteristics, the structural makeup and the spatial orientation that results in increasing the surface properties of the anti-reflective coating for optimal resist performance. In other words, a pH tuning agent that merely adjusts the pH of the spin-on material without influencing the mechanical properties and structural makeup of the spin-on composition or the coupled resist material is not contemplated herein. A method of making absorbing and pH tuned spin-on materials includes combining at least one organic absorbing compound and at least one pH tuning agent with at least one silane reactant during synthesis of the spin-on materials and compositions.
Owner:HONEYWELL INT INC

Film having low refractive index film and method for producing the same, Anti-relection film and method for producing the same, coating liquid set for low refractive index film, substrate having microparticle-laminated thin film and method for producing the same, and optical member

Provided is a film having a low refractive index, which can be formed under normal temperature and pressure while obtaining a lower refractive index, has excellent adhesion with a solid substrate, and does not lose geometric optical properties, such as the diffusibility or light-harvesting capability attributed to the microstructure. Also disclosed is a method for producing the same. The film having a low refractive index is obtained by causing an electrolyte polymer and microparticles to be alternately adsorbed on the surface of a solid substrate and bringing the resulting microparticle-laminated film into contact with a silicon compound solution in order to bond the solid substrate with microparticles and microparticles with microparticles. The silicon compound solution is selected from (1) the hydrolysis product of alkoxysilane (I) wherein the functional groups are formed from hydrolyzable groups and non-hydrolyzable organic groups, and the condensation reaction product thereof, (2) the hydrolysis product of a mixture of alkoxysilane (I) and alkoxysilane (II) wherein the functional groups are formed from hydrolyzable groups alone, and the condensation reaction product thereof; and (3) a mixture of hydrolysis product and condensation product thereof according to (1) and alkoxysilane (II).
Owner:RESONAC CORP

Film having low refractive index and method for producing the same, anti-reflection film and method for producing the same, coating liquid set for film having low refractive index, substrate having microparticle-laminated thin film, and method for pr

Provided is a film having a low refractive index, which can be formed under normal temperature and pressure while obtaining a lower refractive index, has excellent adhesion with a solid substrate, and does not lose geometric optical properties, such as the diffusibility or light-harvesting capability attributed to the microstructure. Also disclosed is a method for producing the same. The film having a low refractive index is obtained by causing an electrolyte polymer and microparticles to be alternately adsorbed on the surface of a solid substrate and bringing the resulting microparticle-laminated film into contact with a silicon compound solution in order to bond the solid substrate with microparticles and microparticles with microparticles. The silicon compound solution is selected from (1) the hydrolysis product of alkoxysilane (I) wherein the functional groups are formed from hydrolyzable groups and non-hydrolyzable organic groups, and the condensation reaction product thereof, (2) the hydrolysis product of a mixture of alkoxysilane (I) and alkoxysilane (II) wherein the functional groups are formed from hydrolyzable groups alone, and the condensation reaction product thereof; and (3) a mixture of hydrolysis product and condensation product thereof according to (1) and alkoxysilane (II).
Owner:RESONAC CORPORATION

Resist underlayer film forming composition containing silicone having onium group

ActiveUS20110143149A1Small film thicknessDry etching rateSilicon organic compoundsPhotosensitive materialsResistAnti-reflective coating
There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hard mask or a bottom anti-reflective coating, or a resist underlayer film causing no intermixing with a resist and having a dry etching rate higher than that of the resist. A film forming composition comprising a silane compound having an onium group, wherein the silane compound having an onium group is a hydrolyzable organosilane having, in a molecule thereof, an onium group, a hydrolysis product thereof, or a hydrolysis-condensation product thereof. The composition uses as a resist underlayer film forming composition for lithography. A composition comprising a silane compound having an onium group, and a silane compound having no onium group, wherein the silane compound having an onium group exists in the whole silane compound at a ratio of less than 1% by mol, for example 0.01 to 0.95% by mol. The hydrolyzable organosilane may be a compound of Formula: R1aR2bSi(R3)4-(a+b). A resist underlayer film obtained by applying the composition as claimed in any one of claims 1 to 14 onto a semiconductor substrate and by baking the composition.
Owner:NISSAN CHEM IND LTD

Anti-Reflective and Anti-Soiling Coatings with Self-Cleaning Properties

InactiveUS20100275815A1Augment anti-reflection benefitImprove efficiencyAnti-reflective coatingsSolventPolymer
The embodiments of the invention are directed to organosilane-based coating compositions having anti-reflective, anti-soiling, and self-cleaning properties; methods of forming of the coatings; and articles of manufacture that utilize the coatings. In some embodiments, the coating compositions comprise an organosilane or mixture of organosilanes, a solvent, optionally an acid catalyst, and optionally a low molecular weight polymer.
Owner:DAVE BAKUL CHAMPAKLAL
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