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580 results about "Diffraction spectrum" patented technology

Methods and Scatterometers, Lithographic Systems, and Lithographic Processing Cells

In a method of determining the focus of a lithographic apparatus used in a lithographic process on a substrate, the lithographic process is used to form a structure on the substrate, the structure having at least one feature which has an asymmetry in the printed profile which varies as a function of the focus of the lithographic apparatus on the substrate. A first image of the periodic structure is formed and detected while illuminating the structure with a first beam of radiation. The first image is formed using a first part of non-zero order diffracted radiation. A second image of the periodic structure is foamed and detected while illuminating the structure with a second beam of radiation. The second image is formed using a second part of the non-zero order diffracted radiation which is symmetrically opposite to the first part in a diffraction spectrum. The ratio of the intensities of the measured first and second portions of the spectra is determined and used to determine the asymmetry in the profile of the periodic structure and / or to provide an indication of the focus on the substrate. In the same instrument, an intensity variation across the detected portion is determined as a measure of process-induced variation across the structure. A region of the structure with unwanted process variation can be identified and excluded from a measurement of the structure.
Owner:ASML NETHERLANDS BV

Methods and Scatterometers, Lithographic Systems, and Lithographic Processing Cells

In a method of determining the focus of a lithographic apparatus used in a lithographic process on a substrate, the lithographic process is used to form a structure on the substrate, the structure having at least one feature which has an asymmetry in the printed profile which varies as a function of the focus of the lithographic apparatus on the substrate. A first image of the periodic structure is formed and detected while illuminating the structure with a first beam of radiation. The first image is formed using a first part of non-zero order diffracted radiation. A second image of the periodic structure is formed and detected while illuminating the structure with a second beam of radiation. The second image is formed using a second part of the non-zero order diffracted radiation which is symmetrically opposite to the first part in a diffraction spectrum. The ratio of the intensities of the measured first and second portions of the spectra is determined and used to determine the asymmetry in the profile of the periodic structure and / or to provide an indication of the focus on the substrate. In the same instrument, an intensity variation across the detected portion is determined as a measure of process-induced variation across the structure. A region of the structure with unwanted process variation can be identified and excluded from a measurement of the structure.
Owner:ASML NETHERLANDS BV

ZSM-11 molecular sieve with hierarchical porous structure and preparation method thereof

A ZSM-11 molecular sieve with a hierarchical porous structure is characterized in that X-X-ray diffraction spectrum of the molecular sieve is as shown in Figure 1(a) / table 1; the molecular sieve has an even spherical appearance, each ball is formed through self assembly of rod-shaped crystallites (Figure 2), the molecular sieve is formed by evenly mixing raw materials of substance containing IVA elements, substance containing IIIA element, alkali metal hydroxide, template and water, and then through two stages of crystallization processes, the molecular sieve product has pure crystalling phase, is relatively high in degree of crystallinity, and has an excellent heat and water heat stability, namely, the method is relatively low in cost, the performance of the ZSM-11 molecular sieve is excellent, and the method is suitable for industrialized production.
Owner:CHINA UNIV OF PETROLEUM (EAST CHINA)

SAPO-34/ZSM-5 composite molecular sieve and synthesis method of composite molecular sieve

InactiveCN104556143AAdjustable acid distributionWide distribution of acidityMolecular-sieve and base-exchange phosphatesMolecular sieveMaterial Pore Size
The invention relates to an SAPO-34 / ZSM-5 composite molecular sieve and a synthesis method of the composite molecular sieve, solving the problems of single pore diameter, low acidity and low reaction activity of the porous materials which are synthesized by the prior art. The synthesis method of the composite molecular sieve comprises the following steps: firstly mixing a silicon source, an aluminum source, a phosphorus source and an organic template agent according to a certain ratio, then adding a certain quantity of ZSM-5 molecular sieves, uniformly mixing and carrying out hydrothermal crystallization, and synthesizing the SAPO-34 / ZSM-5 composite molecular sieve by controlling nucleation and crystal growth conditions, wherein the composite molecular size is adjustable in ratio of two phases; an XRD diffraction spectrum of the composite molecular size has a maximum d interval at the positions of 7.92+ / -0.1, 8.79+ / -0.1, 9.52+ / -0.1, 12.85+ / -0.1, 16.00+ / -0.1, 20.56+ / -0.1, 23.01+ / -0.05, 23.24+ / -0.05, 23.86+ / -0.05, 25.83+ / -0.1, 30.55+ / -0.1 and 31.32+ / -0.1. The composite molecular sieve can be applied to industrial production for preparing aromatic hydrocarbon by reacting methyl alcohol / dimethyl ether.
Owner:CHINA PETROLEUM & CHEM CORP +1

High heat-resistant member, method for producing the same, graphite crucible and method for producing single crystal ingot

A high heat-resistant member includes a graphite substrate including isotropic graphite and a carbide coating film including a carbide, such as tantalum carbide, and covering a surface of the graphite substrate, the carbide coating film having a randomly oriented isotropic grain structure in which crystallites having a size indexed by a full width at half maximum of a diffraction peak of an X-ray diffraction spectrum of not more than 0.2° from (111) planes are accumulated at substantially random. The orientation of the carbide coating film is determined by whether degree of orientation (F) in any Miller plane calculated based on an XRD spectrum using the Lotgering method is within a range from −0.2 to 0.2.
Owner:TOYOTA CENT RES & DEV LAB INC

Method for determining unknown crystal Bravais lattice by electric back scattering diffraction

The invention provides a method used for determining Bravais lattice of unknown crystal by electron backscatter diffraction. The invention is characterized in that the method comprises the steps as follows: 1) an electron backscatter diffraction spectrum is obtained and the crystal diffraction information in the diffraction spectrum is measured; 2) a two-dimensional reciprocal surface of the crystal is obtained; 3) a three-dimensional reciprocal primitive cell is reconstructed by the two-dimensional reciprocal surface; 4) the cell parameter of the three-dimensional reciprocal primitive cell s worked out according to the width of the Kikuchi band and the angle between the Kikuchi bands in the same Kikuchi electrode; 5) a reciprocal reduced cell of the crystal is solved; 6) the Bravais lattice of the crystal is determined in the reciprocal space; 7) the Bravais lattice of the crystal is determined. In the method, only a scanning electron microscope and an electron backscatter diffraction accessory are used to realize the analysis on unknown lattice of bulk crystals, and the exponential of the Kikuchi band and the Kikuchi electrode in the electron backscatter diffraction spectrum is marked at the same time. The method has no special requirement on the samples to be analyzed, is suitable for quickly analyzing bulk samples, and can be used for analyzing the microstructure morphologies and crystal structure in the buck samples.
Owner:SHANDONG UNIV OF TECH

Method and device for measuring speed and frequency of ultrasonic traveling wave in liquid

The invention discloses a method and a device for measuring the speed and frequency of ultrasonic traveling wave in a liquid. The method comprises the following steps that a monochromatic parallel light beam is vertical to an ultrasonic transmission direction and radiates a dynamic ultrasonic grating that the ultrasonic wave forms in the liquid; the dynamic ultrasonic grating penetrates through a lens and the diffraction spectrum of a traveling wave ultrasonic phase grating is formed; the spectrum is processed and imaged through an amplitude filter and an imaging lens, and a spectrum image of the ultrasonic traveling wave grating is obtained; the spacing of two adjacent spectral lines on the spectrum image is measured, and the wavelength of the ultrasonic wave in the liquid is calculated; the change of an electrical signal after the previous level of spectrum and zero level spectrum of the spectrum image are mixed is detected or recorded, and the frequency of the ultrasonic wave is worked out; the speed of the ultrasonic wave in the liquid is worked out through the wavelength and the frequency. The device for realizing the method comprises a light source, a transparent sink, a lens I, the amplitude filter, the imaging lens and the measuring device which are sequentially connected, and a sound-absorbing medium and the ultrasonic transducer are arranged in the transparent sink and are respectively arranged on both sides.
Owner:SOUTH CHINA NORMAL UNIVERSITY

Method of correcting systematic error in a metrology system

A method for correcting systematic errors in an optical measurement tool in which a first diffraction spectrum is measured from a standard substrate including a layer having a known refractive index and a known extinction coefficient by exposing the standard substrate to a spectrum of electromagnetic energy. A tool-perfect diffraction spectrum is calculated for the standard substrate. A hardware systematic error is calculated by comparing the measured diffraction spectrum to the calculated tool-perfect diffraction spectrum. A second diffraction spectrum from a workpiece is measured by exposing the workpiece to the spectrum of electromagnetic energy, and the measured second diffraction spectrum is corrected based on the calculated hardware systematic error to obtain a corrected diffraction spectrum.
Owner:TOKYO ELECTRON LTD

Zeolite containing catalytic dewaxing catalyst

The dewaxing catalyst contains one kind of zeolite carrier and hydrogenating metal component, and the zeolite is one kind of RE containing high-silicon zeolite in five membered ring structure and hassilica / alumina molar ratio of 20-100, RE oxide content in 0.1-2.5 wt% and sodium oxide content of 0.1-1.5 wt%. The zeolite has special X-ray diffraction spectrum line and relatively high selectivity.
Owner:CHINA PETROLEUM & CHEM CORP +1

Device and method for measuring multi-wavelength characteristic X ray diffraction

InactiveCN104634799AHigh diffraction intensityEliminate attenuationMaterial analysis using radiation diffractionX-rayHigh pressure
The invention relates to a device and a method for measuring multi-wavelength characteristic X ray diffraction of an X ray diffraction spectrum of a measured crystal material sample by selecting a certain characteristic X ray of an X ray tube anode target within a relatively wide wavelength range. The device comprises an X ray tube, a high-pressure generator, a silt, an angle measurer, a detector, a multi-path analyzer, and the like. According to the device and the method disclosed by the invention, large-scale attenuation of the characteristic X ray diffraction due to use of a filter sheet or a crystal monochromator and the like is avoided; required characteristic X rays for measuring needed wavelength can be selected by regulating the tube voltage of the X ray tube and upper and lower thresholds of the multi-path analyzer, so that diffraction rays (characteristic X rays with relatively large wavelengths) on the surface of a sample can be measured in a nondestructive manner, and the diffraction rays (characteristic X rays with relatively small wavelengths) inside the sample can be measured in the nondestructive manner. Moreover, the device is simple and convenient to operate, relatively short in detection time; the characteristic X ray diffraction spectrums obtained by scanning are real and reliable.
Owner:郑琪

Methods and scatterometers, lithographic systems, and lithographic processing cells

In a method of determining the focus of a lithographic apparatus used in a lithographic process on a substrate, the lithographic process is used to form a structure on the substrate, the structure having at least one feature which has an asymmetry in the printed profile which varies as a function of the focus of the lithographic apparatus on the substrate. A first image of the periodic structure is formed and detected while illuminating the structure with a first beam of radiation. The first image is formed using a first part of non-zero order diffracted radiation. A second image of the periodic structure is formed and detected while illuminating the structure with a second beam of radiation. The second image is formed using a second part of the non-zero order diffracted radiation which is symmetrically opposite to the first part in a diffraction spectrum. The ratio of the intensities of the measured first and second portions of the spectra is determined and used to determine the asymmetry in the profile of the periodic structure and / or to provide an indication of the focus on the substrate. In the same instrument, an intensity variation across the detected portion is determined as a measure of process-induced variation across the structure. A region of the structure with unwanted process variation can be identified and excluded from a measurement of the structure.
Owner:ASML NETHERLANDS BV
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