143 results about "Continuous exposure" patented technology

For the high spatial resolution imaging of a structure of interest in a specimen, a substance is selected from a group of substances which have a fluorescent first state and a nonfluorescent second state; which can be converted fractionally from their first state into their second state by light which excites them into fluorescence, and which return from their second state into their first state; the specimen's structure of interest is imaged onto a sensor array, a spatial resolution limit of the imaging being greater (i.e. worse) than an average spacing between closest neighboring molecules of the substance in the specimen; the specimen is exposed to light in a region which has dimensions larger than the spatial resolution limit, fractions of the substance alternately being excited by the light to emit fluorescent light and converted into their second state, and at least 10% of the molecules of the substance that are respectively in the first state lying at a distance from their closest neighboring molecules in the first state which is greater than the spatial resolution limit; and the fluorescent light, which is spontaneously emitted by the substance from the region, is registered in a plurality of images recorded by the sensor array during continued exposure of the specimen to the light.

An image processing apparatus includes: a shaking estimating unit configured to estimate the shaking information of an image generated within a predetermined period of time; a short-time-exposure shaking correcting unit configured to correct the shaking of a plurality of short-time-exposure images generated due to intermittent exposure within the predetermined period of time based on the estimated shaking information; a long-time-exposure shaking correcting unit configured to correct the shaking of a long-time-exposure image generated due to consecutive exposure within the predetermined period of time based on the estimated shaking information; and an image synthesizing unit configured to synthesize the corrected short-time-exposure images and the corrected long-time-exposure image.

The invention discloses a full-automatic scanning system and a method for a microscopic section. The system comprises an object stage, a lighting device, an object lens, a Z-axis controller, a scanning camera and a computing device, the scanning camera is provided with a rolling shutter exposure mode and a banded array or banded subarray reading mode, the scanning camera performs a continuous digital imaging scanning for a banded partial area of a section sample which moves at a constant speed along a shutter rolling direction of the scanning camera, under the rolling shutter exposure mode, the scanning camera can perform a parallel exposure for next frame of image before the exposure of a former frame of image is finished, and the computing device can splice each frame of image which is subjected to continuous exposure to form a complete digital section. By means of the technical scheme, the uniform motion speed of the section sample can be improved, simultaneously the motion blurring caused by sample motion during exposure of the scanning camera can be reduced, the image acquisition speed is improved, and the image acquired by the scanning camera is clear and stable.

A method of simultaneously defining a waveguide and grating in a sample of photosensitive material comprises providing a sample of material (24) having a region which is photosensitive to light of a specific wavelength, generating a spot of light (22) at the specific wavelength, the spot having a periodic intensity pattern of high and low intensity fringes, and a width which is related to the width of the channel, positioning the spot within the photosensitive region and causing relative movement between the sample and the light spot along the desired path of the waveguide / grating define a channel of altered refractive index by exposing parts of the photosensitive region to the light spot. Modulation of the light spot to produce multiple exposures produces a grating, while continuous exposure results in a uniform waveguide. These structures can be written in straight lines or around curves, and can be accurately overwritten, so that complex optical devices can be produced in a single fabrication step.

An image acquisition unit acquires multiple image data sets of pixels in array, having subject distortion due to focal plane shutter effects, corresponding to images taken at continuous exposure timings; a coefficient storage unit stores coefficients, determined by which number-in-order of multiple images that the image data set corresponds to, and by each pixel position in the image; a multiplying unit multiplies a pixel value of a predetermined pixel in the image data sets, by the coefficient stored in the coefficient storage means; and an adding unit adds each pixel value of a predetermined number of the image data sets. The coefficients include a coefficient wherein, at the earliest image data set, pixels exposed earlier are weighted less and pixels exposed later are weighted more, and a coefficient wherein, at the latest image data set, pixels exposed earlier are weighted more and pixels exposed later are weighted less.

Disclosed herein are degradable sachets useful for enclosing a consumer product, such as, for example, shampoo, conditioner, soap, toothpaste, bar soap, and detergent. The sachets of the invention have a moisture vapor transmission rate (MVTR) of less than about ten grams per square meter per day (g / m2 / day) at 37° C. and 90% relative humidity (RH), and can disintegrate into pieces sufficiently small to pass through a one millimeter sieve, within two years after first and continuous exposure to water and microorganisms.

The invention relates to a method and a device for creating pictures and more particularly a method for creating an enhanced picture by means of several consecutive exposures. The exposures are combined to create pictures with enhanced properties, especially better color and light content. Sufficient light is obtained by performing a series of first exposures together with one second exposure in rapid succession. The first exposures are combined to provide sufficient luminance and sharpness. The second exposure is made to collect color information. The first exposures are combined with the second exposure to provide an enhanced picture.

A method of controlling an image capturing system comprising an interface for receiving an external trigger to capture an image, and an image capturing device provided with a photosensitive area and an array of pixel cells, each pixel cell including a device for generating a signal indicative of the intensity of light falling on an associated part of the photosensitive area, which image capturing device is further provided with readout circuitry for generating an array of pixel values to capture an image frame at a set spatial resolution, such that each pixel value represents an integral of the signal or signals generated in at least one of the pixel cells in an associated one of a number of areas over an exposure time interval, the number of areas being determined by the set spatial resolution, the areas together covering a region of the photosensitive area corresponding to a region in the image, comprises receiving an external trigger to capture an image, and, in response to the external trigger, directing the image capturing device to capture at least two image frames by generating respective arrays of pixel values representing integrals over respective consecutive exposure time intervals. The spatial resolutions of at least two of the captured image frames are set to different values.

A solid-state imaging device with unit pixels which have a photoelectric conversion element, an electric charge transferring / accumulating unit with multiple levels able to transfer electric charge generated in the photoelectric conversion element and accumulate the electric charge, and an electric charge detection unit that holds the electric charge transferred from the photoelectric conversion element, where, after resetting the photoelectric conversion element, all unit pixels simultaneously transfer signal electric charges, which are generated in the photoelectric conversion element during continuous exposure times of which each has a different duration, to the electric charge transferring / accumulating units and accumulate the signal electric charges in the different respective electric charge transferring / accumulating units, and in units of one or more pixels, the signal electric charges is transferred to the electric charge detecting unit and a plurality of signals which respectively corresponds to the plurality of signal electric charges is read out.

The synchronous bus controller adopts internal self-defined sync bus, outer sync signal, and minimum time unit data transmitting period of sync bus as the sync time base, produces precise time control point with data transmission period FIFO queue and 'time-command' FIFO queue, to realize the strict sync course of the submodules in stepped scan projecting photoetching machine. The sync control system includes upper computer, industrial control computer CPU board, motion control card, laser counter card, alignment control system and lighting control system. The sync bus controller sends real-time sync information to the motion control card and sends sync triggering signal to the alignment control system and the lighting control system via the sync bus to ensure the complete sync among the workpiece table, the mask table, the exposure dosage and slit motion in continuous exposure and scanning control.

The invention discloses a multi-stage exchange system and a multi-stage exchange method for a multi-station silicon wafer stage. The multi-stage exchange system comprises a measurement station, an exposure station and a process treatment station, wherein the process treatment station, the measurement station and the exposure station are all positioned in an air floatation plane or a magnetic suspension plane on the upper surface of a base stage; and a wafer carrying stage is arranged on the upper surface of the base stage through an air floatation bearing or magnetic suspension, carries a silicon wafer and is driven by a linear motor or a planar motor to finish exchange of all stations. By adding the process treatment station, the process treatment of two adjacent exposure procedures can be realized in a photo-etching machine, and an exposure procedure and a process treatment procedure can be concurrently finished in the same photo-etching machine, so continuous exposure is realized in the same photo-etching machine, and requirements for improving productivity and accuracy and reducing cost and using area in a dual-exposure technology or even a multi-exposure technology are met.

A method of simultaneously defining a waveguide and grating in a sample of photosensitive material comprises providing a sample of material (24) having a region which is photosensitive to light of a specific wavelength, generating a spot of light (22) at the specific wavelength, the spot having a periodic intensity pattern of high and low intensity fringes, and a width which is related to the width of the channel, positioning the spot within the photosensitive region and causing relative movement between the sample and the light spot along the desired path of the waveguide / grating define a channel of altered refractive index by exposing parts of the photosensitive region to the light spot. Modulation of the light spot to produce multiple exposures produces a grating, while continuous exposure results in a uniform waveguide. These structures can be written in straight lines or around curves, and can be accurately overwritten, so that complex optical devices can be produced in a single fabrication step.

The invention provides a drawing apparatus, which can continuously expose a long strip of flexible recording medium and can expose a plurality of flexible recording medium in a short time, thereby shortening the latency time and the raising productivity. Between at least two rollers (30, 32), the long strip of flexible recording medium (28) is arranged, and can be conveyed to certain conveying direction. Then, a tension setting mechanism (68) is used for definitely maintaining part of the tension of the long strip of flexible recording medium which is arranged between the two rollers (30, 32) through, so as to pull the long strip of flexible recording medium in a tabulate way; a drawing unit (48) is used for drawing the long strip of flexible recording medium according to two-dimensional graphics, therefore, the invention can raise the productivity because of continuous exposure treatment.

An imaging device from which charge signals accumulated in a light receiving part having a pixel array divided into a plurality of fields can be read out is used. In a predetermined image capturing mode such as a MOVE mode, high-speed continuous-exposure mode or live view mode, a captured image is generated only by using charge signals read out from at least one field having a relatively small number of defective pixels.

Compositions for making temperature resistant protective tapes utilizing halogen-free, crosslinked polymeric resins in the tape backing and an adhesive adhered thereto. Also, methods utilizing solvent free, one-step calendering processes. Such tapes are especially well suited for applications for continuous exposure to high levels of heat.

The invention relates to a method and a device for creating pictures and more particularly a method for creating an enhanced picture by means of several consecutive exposures. The exposures are combined to create pictures with enhanced properties, especially better color and light content. Sufficient light is obtained by performing a series of first exposures together with one second exposure in rapid succession. The first exposures are combined to provide sufficient luminance and sharpness. The second exposure is made to collect color information. The first exposures are combined with the second exposure to provide an enhanced picture.

An exposure method includes a first step filling a liquid in a predetermined optical path space for exposure light (EL) in an optical system (PL), or for exchanging the liquid (LQ) filled in the space; a second step for successively exposing a predetermined number of substrates (P) through the liquid (LQ) filled in the optical path space or through the exchanged liquid; and a third step for judging, after the completion of the second step and based on an elapsed time elapsed after the first step, whether or not to exchange the liquid (LQ) filled in the optical path space. Exposure processing and measurement processing can be satisfactorily performed by making the liquid filled in the optical path space held in a desired state.

This invention provides synchronization control means of steps caned projection mask aligner, it based on negotiation mechanism and alignment mechanism, the negotiation mechanism obtained required parameters of next scanning in forthright scanning execute phase; the alignment mechanism put the required parameters of next scanning which obtained by negotiating into sweeping column of subschema, in security for extend multiple sweeping, by organic combining of these two mechanism, thereby it achieves synchronization control of successive exposure sweeping of mask aligner system. This invention also offers synchronization control system of steps caned projection mask aligner to carry out above-mentioned means, the system includes rocator and several subsystem, synchronous control card sends synchronizing information to work head control card and mask motion control card real time through internal bus, in the mean time, it sends synchronous triggering order to dose control card of lighting control unit and slit motion control card, which guarantees work head, mask, exposure dosage and slit motion in the control of successive exposure synchronize completely.

A device (10) for exposing, developing and cutting photographic reeled material (9), comprises: an exposure unit (22) with associated transport mechanism (20), a cutting unit (34) with associated fixable transport mechanism (42), a developer unit (40) with associated fixable transport mechanism (54), a first buffer container (36), which can be closed and opened, between the exposure unit (22) and the cutting unit (34) and a second buffer container (48), which can be closed and opened, between the cutting unit (34) and the developer unit (50). As part of a method for exposing, developing and cutting photographic reeled material, the following processes are run: continuously exposing and transporting the reeled material, immobilising the reeled material at an appropriate point alongside the cutting unit and then buffering ahead of the cutting unit, cutting the reeled material whilst the exposure process and buffering continues, transporting the reeled material to a developer unit once the buffered length is greater than or the same as the distance between the developer unit and the cutting unit, immobilising the reeled material at an appropriate point alongside the developer unit and buffering ahead of the developer unit, feeding the reeled material along, immobilising the reeled material at a predetermined point alongside the cutting unit, cutting the reeled material and feeding it on to the developer unit and feeding the reeled material on to the developer unit as soon as a buffer container ahead of the developer unit has been emptied.

A light exposure system includes a light source device, a shutter device and a control device. The light source device is capable of emitting a light to an assembly liquid crystal cell. The shutter device is located on an optical path of the light. The control device controls the light source device or the shutter device to control the illuminance on the assembly liquid crystal cell. The control device makes the assembly liquid crystal cell have a plurality of first exposure times receiving a first illuminance and a plurality of second exposure times receiving a second illuminance during the light exposure process. The first exposure times and the second exposure times are arranged alternately. The sum of the first exposure times and the second exposure times is substantially equal to the default continuous exposure time.

The present invention aims to provide a solar cell in which a decrease in photoelectric conversion efficiency due to continuous exposure to light (photodegradation) is reduced, and a method of producing the solar cell. The present invention relates to a solar cell, including: an electrode; a counter electrode; and a photoelectric conversion layer between the electrode and the counter electrode, the photoelectric conversion layer containing an organic-inorganic perovskite compound represented by the formula R-M-X3 where R is an organic molecule, M is a metal atom, and X is a halogen atom or a chalcogen atom, the solar cell satisfying the formula (1):N(T, I) / N(0, I)<5   (1)where N(0, I) is a carrier density of the organic-inorganic perovskite compound immediately after start of exposure of the solar cell to light at an intensity of I mW / cm2, and N(T, I) is the carrier density of the organic-inorganic perovskite compound after continuous exposure of the solar cell to light at an intensity of I mW / cm2 for T hour / hours.

The invention claims a direct image exposure device, characterized in that an exposure head assembly (1) has several exposure heads (10, 11, 12, 13) arranged parallel in a space W at a sub-scan direction Y; an exposure table (5) may move along the sub-scan direction Y under the exposure head assembly 1, may remove a printed circuit board (90) on the exposure table (5) under the exposure heads (10, 11, 12, 13), and may continuously expose the printed circuit board (90) by the exposure heads (10, 11, 12, 13); the exposure heads (10, 11, 12, 13) are provided with an array of LED (20) linearly arranged with the same space P; the LED (20) is arranged with space d at a main scan direction X among the exposure heads (10, 11, 12, 13), by which a same position of the sub-scan direction Y is repeatedly exposed, thereby implementing exposure of high position precision.

An inert dispersible granular substrate is suitable for use as a carrier for chemical agents. The granular substrate is comprised of one or more mineral components, the one or more mineral components having a bulk density of greater than about 70 pounds per cubic foot, one or more dispersibility additives; and one or more water soluble binders. The granular substrate has a bulk density of from greater than 55 pounds pcf to about 70 pcf, a water dispersibility of less than 5 minutes, a pH of from 6 to 8, and sufficient strength to survive formulation processing after 3 days of continuous exposure to a temperature of approximately 75° F. and a relative humidity of approximately 95%. Preferably, an active pesticide is applied to the dispersible granular substrate. The water dispersible granular substrates may be produced by forming a granular substrate admixture, pelletizing the admixture to form granular substrates, and drying the granular substrates.

The present invention provides a process for producing an optical waveguide, comprising the steps of: continuously applying a fluorene derivative layer onto a continuous substrate and curing the layer to thereby form a lower cladding layer; continuously applying a photosensitive fluorene derivative layer onto the lower cladding layer; continuously exposing the applied photosensitive fluorene derivative layer to a light through a photomask having a predetermined pattern; continuously subjecting the exposed photosensitive fluorene derivative layer to post-exposure heating; continuously developing the heated photosensitive fluorene derivative layer to remove the unexposed areas therein, thereby forming into the predetermined pattern; curing the developed photosensitive fluorene derivative layer to thereby form a core layer having the predetermined pattern on the lower cladding layer; and continuously applying a fluorene derivative layer over the lower cladding layer so as to cover the core layer and curing the fluorene derivative layer to thereby form an upper cladding layer.

The invention discloses an HDR image generation method based on multi-camera image fusion, terminal equipment and a computer storage medium. The method comprises the steps: obtaining a plurality of images with different exposure degrees, which are photographed at the same time in the same scene, from a plurality of cameras, and enabling the current exposure parameters of the plurality of cameras to be generated by the result of a previous frame; aligning at least one abnormal exposure image by taking the normal exposure image as a reference; and finally, respectively fusing the brightness channel and the chrominance channel of the aligned image to generate an HDR image. According to the technical scheme, HDR images can be generated by multiple cameras, and the problems of ghosting and color cast possibly caused by continuous exposure of a single camera are avoided.

Greening and decay of potato tubers is inhibited for five or more days of continuous exposure to light, after a treatment mixture comprising effective amounts of natural or ozonated water, food-grade citric acid, food-grade polar lipid or phospholipid emulsifier and food-grade salt has been infused in the potatoes by cyclically dipping and withdrawing the potatoes in a vacuum environment of about 84-90 Kpa less than atmospheric pressure for a time period of about 2-8 minutes.

The invention discloses a method for improving the stability of an alignment precision of a high-transparency mask plate. The method comprises the steps of reversing a light-transmitting region of a high-transparency positive photoresist mask plate to obtain a low-transparency mask plate with a light-transmitting region opposite to the light-transmitting region of the positive photoresist mask plate; and taking the reversed low-transparency mask plate as an aeration mask plate, and utilizing negative photoresist to carry out aeration and developing on a silicon wafer. Therefore, the energy for heating a lens in an aeration process is effectively reduced and the degree of expanding of the lens by heating is reduced after the silicon water is continuously aerated; and the alignment precision is kept stable, and the yield and the process production efficiency of the silicon wafer are improved.

An arrangement for, and a method of, controlling image exposure in an imaging reader for reading symbols, employ an illuminating light assembly for illuminating a symbol with illumination light, a solid-state imager for capturing return light from the symbol over a field of view, and a controller for successively exposing the imager over a first exposure time period to capture the return light from, and to optimally image, a first area of the symbol, and over a second exposure time period to capture the return light from, and to optimally image, a second area of the symbol. The first and the second areas have different light intensity levels. The first and the second exposure time periods are different in duration. The controller is operative for combining the optimally imaged first and second areas to read the symbol.