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602 results about "Multiple exposure" patented technology

In photography and cinematography, a multiple exposure is the superimposition of two or more exposures to create a single image, and double exposure has a corresponding meaning in respect of two images. The exposure values may or may not be identical to each other.

Merging Multiple Exposures to Generate a High Dynamic Range Image

A method of generating a high dynamic range (HDR) image is provided that includes capturing a long exposure image and a short exposure image of a scene, computing a merging weight for each pixel location of the long exposure image based on a pixel value of the pixel location and a saturation threshold, and computing a pixel value for each pixel location of the HDR image as a weighted sum of corresponding pixel values in the long exposure image and the short exposure image, wherein a weight applied to a pixel value of the pixel location of the short exposure image and a weight applied to a pixel value of the pixel location in the pixel long exposure image are determined based on the merging weight computed for the pixel location and responsive to motion in a scene of the long exposure image and the short exposure image.
Owner:TEXAS INSTR INC

Optical formation device and method

The purpose of the invention is to provide a solid model creation apparatus that is small in size and inexpensive. A multiplicity of blue LEDs are prepared, optical fibers are connected thereto, and GRIN lenses are arranged at the ends of the tips of the respective optical fibers to constitute an exposing head 23. The exposing head 23 forms images of the end faces of the respective optical fibers in a photocurable resin exposure region 24 as light spots 55. The diameter of a light spot 55 is, for example, 0.5 mm, but the size of a pixel 71 within the exposure region 24 is much smaller; for example, 62.5mu. The multiplicity of optical fibers at the exposing head 23 are arrayed in a matrix such that they are displaced in staggered fashion so that respective light spots 55 are lined up at the pitch 62.5mu of the pixels 71 in the primary scan (Y-axis) direction. As the exposing head 23 scans the exposure region 24 in the secondary scan (X-axis) direction, all of the light spots capable of directing light onto appropriate pixels, these being the respective pixels 71 to be cured within the exposure region 24, are turned on and multiple exposure is carried out.
Owner:NABLESCO CORP +1

Method, program product and apparatus for performing double exposure lithography

A method of generating complementary masks based on a target pattern having features to be imaged on a substrate for use in a multiple-exposure lithographic imaging process. The method includes the steps of: defining an initial H-mask corresponding to the target pattern; defining an initial V-mask corresponding to the target pattern; identifying horizontal critical features in the H-mask having a width which is less than a predetermined critical width; identifying vertical critical features in the V-mask having a width which is less than a predetermined critical width; assigning a first phase shift and a first percentage transmission to the horizontal critical features, which are to be formed in the H-mask; and assigning a second phase shift and a second percentage transmission to the vertical critical features, which are to be formed in the V-mask. The method further includes the step of assigning chrome to all non-critical features in the H-mask and the V-mask. The non-critical features are those features having a width which is greater than or equal to the predetermined critical width. The non-critical features are formed in the H-mask and the V-mask utilizing chrome. The target pattern is then imaged on the substrate by imaging both the H-mask and V-mask.
Owner:ASML NETHERLANDS BV

Method and apparatus for performing model-based layout conversion for use with dipole illumination

A method of generating complementary masks for use in a multiple-exposure lithographic imaging process. The method includes the steps of: identifying a target pattern having a plurality of features comprising horizontal and vertical edges; generating a horizontal mask based on the target pattern; generating a vertical mask based on the target pattern; performing a shielding step in which at least one of the vertical edges of the plurality of features in the target pattern is replaced by a shield in the horizontal mask, and in which at least one of the horizontal edges of the plurality of features in the target pattern is replaced by a shield in the vertical mask, where the shields have a width which is greater that the width of the corresponding feature in the target pattern; performing an assist feature placement step in which sub-resolution assist features are disposed parallel to at least one of the horizontal edges of the plurality of features in the horizontal mask, and are disposed parallel to at least one of the vertical edges of the plurality of features in the vertical mask, and performing a feature biasing step in which at least one of the horizontal edges of the plurality of features in the horizontal mask are adjusted such that the resulting feature accurately reproduces the target pattern, and at least one of the vertical edges of the plurality of features in the vertical mask are adjusted such that the resulting feature accurately reproduces the target pattern.
Owner:ASML NETHERLANDS BV
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