The invention relates to the field of production of solar cells, in particular to a method for depositing a back
electrode in
solar cell production. The method is implemented by special magnetron
sputtering equipment for
sputtering the back
electrode on the back face of a
solar cell by the following steps of: firstly, introducing two
cell slices into a buffer cabin every time through a slice inlet platform under the driving action of a conveying guide rail on which a
cell slice suspension box is hung, and making the
cell slices continually move forward into two heating cabins in turn, wherein the
heating temperature of one heating cabin into which the cell slices moves earlier is 35 DEG C, the
heating temperature of the other second heating cabin into which the cell slices moves later is 50 DEG C, and the temperature is up to 50 DEG C after twice heating; and making the cell slices enter a
sputtering cabin, uniformly sputtering an Al layer serving as the back
electrode in the sputtering cabin by a magnetron sputtering principle, discharging the cell slices out of the cabin, and making the cell slices enter next equipment through a buffer cabin and a cell slice outlet platform, wherein a vacuum
system connected to each cabin through a vacuum pipeline is used for controlling the vacuum value of each cabin, and a valve is used for partitioning each cabin into relatively independent spaces, so that the aim of sputtering the back electrode of the
solar cell is fulfilled.