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Film coating system for depositing metal on plastic substrate surface on basis of glow discharge principle

A glow discharge and substrate surface technology, which is applied in metal material coating process, sputtering plating, ion implantation plating, etc., can solve the problems that the coating effect needs to be improved, so as to improve the application range and sputtering efficiency , The uniform effect of the coating surface

Active Publication Date: 2018-12-07
阜阳知麓信息科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The sputtering device can place more workpieces to be plated and improve the coating efficiency; however, the sputtering of the coated workpieces is not uniform, and the coating effect needs to be improved

Method used

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  • Film coating system for depositing metal on plastic substrate surface on basis of glow discharge principle
  • Film coating system for depositing metal on plastic substrate surface on basis of glow discharge principle

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Embodiment approach

[0021] As an embodiment of the present invention, the box body 1 is rectangular. During work, since the workpieces to be plated have different shapes, such as plates and rings, the workpieces to be plated with better plasticity can be placed on the material rod of the scissor mechanism 32 for coating, while the plate-shaped workpieces with poor plasticity can be coated by The box 1 is set as a rectangle, the target 4 can be placed on the scissor mechanism 32, and the workpiece to be plated can be placed on the inner wall around the box 1, thereby avoiding damage to the workpiece, so that the device can coat different plastics and shapes The workpiece, thereby improving the range of use of the device.

[0022] As an embodiment of the present invention, a second airbag 6 is provided between the upper support plate 33 and the inner wall of the box body 1 . During work, when the scissor mechanism 32 rises and rotates, the No. 2 air bag 6 is set between the upper support plate 33 ...

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Abstract

The invention belongs to the technical field of film coating, and particularly relates to a film coating system for depositing metal on the plastic substrate surface on the basis of the glow dischargeprinciple. The film coating system comprises a box body, a motor and a bearing device; the bearing device is driven by the motor and comprises a lower supporting plate, a shear fork mechanism and anupper supporting plate, and the shear fork mechanism is composed of a group of material rods which are hinged to one another; one end of the bottom of the shear fork mechanism is hinged to the lower supporting plate, and a roller rotatably connected to the other end of the bottom of the shear fork mechanism can slide in a sliding groove formed in the lower supporting plate; the top of the shear fork mechanism is hinged to one end of the upper supporting plate, and the top of the shear fork mechanism is slidably connected with the other end of the upper supporting plate; each material rod comprises an upper material rod, a middle material rod and a lower material rod, and the middle material rods can relatively rotate; and a first air cylinder is used for pushing the roller to slide in thesliding groove. According to the film coating system for depositing the metal on the plastic substrate surface on the basis of the glow discharge principle, through cooperation of the shear fork mechanism and the material rods, a workpiece can rotate when sputtering coating is conducted, therefore, a coating film of the coated workpiece is uniform, and then the film coating effect of a sputteringcoating device is improved.

Description

technical field [0001] The invention belongs to the technical field of coating, and specifically relates to a coating system for depositing metal on the surface of a plastic substrate based on the principle of glow discharge. Background technique [0002] Sputtering is a physical vapor deposition technology. The principle of sputtering is to use high-energy plasma generated by glow discharge or ion beam to hit the target material in a vacuum environment, and bombard the atoms in the target material from the target material by means of momentum transfer. out and deposited on the substrate to form a thin film. Because sputtering can achieve better deposition efficiency, precise composition control, and lower manufacturing costs, it has been widely used in the production of various metal and non-metal films in industry. [0003] There are also some technical solutions for sputtering devices in the prior art. For example, a Chinese patent with application number 2010106052656 d...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C23C14/50
CPCC23C14/34C23C14/505
Inventor 余泽军
Owner 阜阳知麓信息科技有限公司
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