265results about How to "Reduce divergence" patented technology

A laser diode array has a semiconductor layered structure that includes at least one active layer. A heat sink is coupled to semiconductor layered structure. A plurality of laser emitters are formed in the active layer. A majority of the plurality of laser emitters have a spacing between adjacent laser emitters that provides for a more uniform heat distribution.

A measuring device is provided with a signal generator and a signal receiver, which is located at a measurable distance from the signal generator. The signal generator is designed for the emission of at least two signal beams covering in given relationship to each other an area and the signal receiver is designed for the time-resolved reception of the signal beams in such a manner that the generator-receiver distance can be determined from the time signature of the signal beam reception.

Apparatus for shaping an optical beam bundle carrying a plurality of substantially parallel optical beams disposed in a common plane of travel. First reflective facets and second reflective facets are provided, the first reflective facets being oriented so as to deflect the optical beams of the bundle into a plurality of intermediate, substantially non-parallel optical beams. Each of the second reflective facets is spatially disposed so as to receive a respective one of the intermediate optical beams at a different respective distance from the plane of travel of the optical beam bundle. Also, the second reflective facets are oriented so as to deflect the intermediate optical beams into a bundle of substantially parallel output optical beams. In this way, the output beam can be more adapted for a particular application. In certain cases, this also achieves increased brightness of a laser beam through reduced output beam divergence and / or total cross-sectional area.

A method for analysing ions according to their mass-to-charge ratio and mass spectrometer for performing the method, comprising directing a collimated ion beam along an ion path from an ion source to an ion detector, causing a portion of the ion beam to contact one or more surfaces prior to reaching the ion detector, wherein the method comprises providing a coating on and / or heating the one or more surfaces to reduce variation in their surface patch potentials. The method is applicable to multi-reflection time-of-flight (MR TOF) mass spectrometry.

A method of changing the kinetic energy of ions is provided, comprising: trapping ions in a trapping region of an ion trap; and directing a beam of gas through the trapping region, so as to change the kinetic energy of the trapped ions thereby. Also provided is a method of separating ions, the method comprising: causing ions to enter a trapping region of an ion trap along a first axis of the trapping region; directing a beam of gas along the first axis and applying an electric potential in the direction of the first axis so as to cause separation of the ions based on their ion mobility. An ion trap and a mass spectrometer for performing the methods are also provided.

A lighting apparatus for providing illumination, comprising:a) an array of surface-emitting light sources, wherein each surface-emitting light source directs a source illumination beam, over a beam angle θ, toward an illumination plane;b) an array of beam spreading optical elements corresponding with the array of surface-emitting light sources, wherein refraction of the source illumination beam by each beam spreading optical element substantially satisfies a distribution function:dy / d⁢⁢θ=f⁡(θ)wherein y is a radial distance along the illumination plane from the optical axis of the beam-spreading optical element,dy is an arbitrarily small increment of the radial distance,dθ is the angular increment of the beam angle corresponding to dy, andƒ(θ) is the distribution function for the angular distribution of the light source, such that each beam spreading optical element adjusts the luminous intensity of the source illumination beam from the corresponding surface-emitting light source to provide a uniformized illumination beam directed toward the illumination plane;and,c) an array of beam-divergence reducing lens elements, wherein each beam-divergence reducing lens element reduces the angular divergence of a corresponding uniformized illumination beam,providing illumination having improved uniformity and reduced beam divergence thereby.

The invention discloses a laser guiding back charging method and chip for a mobile robot. The laser guiding back charging method comprises the steps of step 1, controlling the mobile robot to move toa first preset position; step 2, judging that whether an intensity distribution law of an effective laser frame acquired by a laser receiver conforms to an encoding mode of a charging cradle, and thenproceeding to step 3; step 3, determining a preset number of back charging candidate positions within a preset search range based on an acquired laser guiding signal; step 4, controlling the mobile to traverse a preset number of the back charging candidate positions within the preset search range; step 5, controlling the mobile robot to move to a second preset position; step 6, adjusting the posture and orientation of the mobile robot at the second preset position, and controlling a first charging pole of the mobile robot and a second charging pole of the central position of the charging cradle to be docked and charged, thereby improving the guiding precision and efficiency of the laser back charging.

An light-emitting diode (LED) optical component includes a component substrate having an LED side, an opposite side opposing the LED side, and, optionally, a broken or separated component tether. An LED structure includes an LED and, optionally, a broken or separated LED tether separate from the component substrate. The LED structure is disposed on or adjacent to the LED side of the component substrate and the LED emits light when provided with electrical power. An optical element is disposed at least partly in contact with the component substrate such that at least a portion of the emitted light is incident on the optical element. A second optical element can optionally be disposed between the LED and the component substrate or on the opposite side of the component substrate. An LED optical system includes a system substrate on which one or more LED optical components are disposed. The system substrate can be or include one or more optical elements.

A display apparatus for producing colored pixelated light includes a backlight unit for providing a pump-beam light. The apparatus also includes a microcavity light-producing array responsive to pump-beam light and having pixels wherein each pixel including a transparent substrate, a bottom dielectric stack reflective to light over a predetermined range of wavelengths, an active region responsive to pump-beam light for producing display light, and a top dielectric stack spaced from the bottom dielectric stack and reflective to light over a predetermined range of wavelengths. The apparatus further includes a light shutter for permitting selected display light from the microcavity light-producing array to pass therethrough, a polarizing layer disposed between the microcavity light-producing array and the light shutter, and a beam expander disposed over the light shutter for increasing the angular cone of view of the display light.

The invention is directed to a method and an arrangement for the plasma-based generation of intensive short-wavelength radiation, particularly EUV radiation. The object of the invention, to find a novel possibility for plasma-based generation of intensive soft x-radiation, particularly EUV radiation, which permits efficient energy conversion in the desired spectral band with high repetition frequency (several kHz) of the plasma excitation, minimized emission of debris and low erosion of the nozzle of the target generator, is met according to the invention in that an additional energy beam is directed on the target flow spatially in advance of its interaction with the high-energy beam, the target flow being acted upon by this additional energy beam with substantially weaker energy pulses compared to the high-energy beam in order to divide the target flow into a first portion and at least one second portion, wherein the target flow is excited at an interaction point within the second portion by the high-energy beam for generating a hot, radiating plasma, and the second portion is decoupled from the first portion and therefore from the target generator in such a way that a hydrodynamic disturbance generated in the second portion by the pulse of the high-energy beam is transmitted into the first portion only negligibly.

The content of the invention comprises a concept of multi-beam ion pre-selection from a single sample, coordinated mobility (against the gas flow) separation, cooling ions in supersonic gas flow and mass separation of thus low divergent ions by single or plural compact high-resolution orthogonal time-of-flight mass spectrometers both linear or reflectron type with controlled collision-induced dissociation (CID) and multi-channel data recording for the optimization of sample use in the analysis, and obtaining as much useful information about the sample as possible in a reasonably short time.

The closed electron drift plasma accelerator comprises an annular ionization chamber, an acceleration chamber on the same axis as the ionization chamber, an annular anode, a hollow cathode, a first DC voltage source, an annular gas manifold, a magnetic circuit, and magnetic field generators. A coaxial annular coil is placed in the cavity of the ionization chamber, is provided with bias conductive cladding connected, together with the electrically-conductive material of the inside faces of the walls of the ionization chamber, to the positive pole of a second voltage source whose negative pole is connected to the anode, and constitutes an additional magnetic field generator which, together with the other magnetic field generators, forms a magnetic field having a magnetic line of force with an “X” point corresponding to a magnetic field zero situated between the coaxial annular coil and the anode.