The invention is applicable for the field of a quantum dot light emitting diode (QLED), and provides an indium tin oxide (ITO)-free QLED and a fabrication method thereof. The ITO-free QLED comprises a substrate carrier, a cathode layer, a first non-conjugated polyelectrolyte layer, an electron injection layer, a quantum dot light emitting layer, a hole transfer layer, a hole injection layer and an anode layer which are sequentially laminated, wherein the material of the anode layer is PEDOT:PSS (PH1,000). According to the fabrication method of the ITO-free QLED, the cathode layer, the first non-conjugated polyelectrolyte layer, the electron injection layer, the quantum dot light emitting layer, the hole transfer layer, the hole injection layer and the anode layer are sequentially fabricated on the substrate carrier.