The invention discloses a
silicon-based light-emitting device and a preparation method thereof. The device includes a
silicon substrate, the front of the substrate is etched to form a nano-column
photonic crystal array, and a film layer containing a
silicon nanocrystal quantum dot structure is conformally deposited on the array, and the film layer is covered with a transparent conformal
electrode.
Ohmic contact electrodes are deposited on the bottom and back; the method is as follows: using
microsphere mask etching technology on the front of the substrate to obtain a silicon nanocolumn
photonic crystal array through
deep reactive ion etching, and then co-existing on the silicon nanocolumn
photonic crystal array. Formally grow a thin film layer containing a nano-silicon
quantum dot structure and a transparent conformal
electrode, and deposit an
ohmic contact electrode on the back of the substrate to obtain the target product. The silicon-based light-emitting device of the present invention adopts photonic
crystal nano-column array and silicon nano-
crystal quantum dot structure at the same time, which effectively improves the light extraction efficiency and carrier injection efficiency, thereby improving the
luminous intensity and
light emission efficiency of the device, and the device structure is simple, The process is simple and the cost is low.