The invention discloses a channel
voltage dividing
field effect tube and production method based on a high-energy
ion implantation mode. High-energy
ion implantation equipment is used for carrying out gradual-deep implantation, an N-shaped channel is manufactured through
diffusion for connecting a groove channel and a drain
electrode, a similar-to-T-shaped structure formed by the N-shaped channel is of a 3D structure, a depletion zone formed between P and N is changed from a single vertical direction to a vertical direction and a horizontal direction, and accordingly the withstand
voltage of the zone is greatly improved, the dosage concentration of the
N channel can be increased, then the effect of lowering communicating resistance is achieved, and meanwhile P extends outwards and forms an obstruction between the bottom of a grid
electrode and the drain
electrode of the structure, and accordingly the
capacitance between the bottom of the grid electrode and the drain electrode is nearly zero, the contacting part of the channel and the groove channel is small, so that the
capacitance between the grid electrode and the drain electrode can be greatly removed, according to the two improvements, charging and discharging time during grid electrode opening and closing can be greatly shortened (Qgd can be greatly lowered), and accordingly opening and closing speed of an MOS tube is improved.