The invention discloses an
electron injection enhanced
high voltage IGBT.
Gate oxide layers are arranged in a trench in a middle part on an n-
silicon substrate and flat surface parts at two sides, and a
polycrystalline silicon layer is arranged on the
gate oxide layers, which is called a trench-planar gate G; two sides of the trench-planar gate G are each provided with a p base region on the n-
silicon substrate, the p base regions are isolated from the trench-planar gate G through the gate oxides, and in each p base region an upper surface of an n+ emitter region and the p base region are short-circuited to form an emitting
electrode E; joints of the upper side of an n- drift region and bottoms of the p base regions at the two sides are provided with discrete n carrier storage
layers; and an n field stop layer, a p+ collector region and a collector
electrode C are arranged in sequence under the n- drift region. The
high voltage IGBT structure provided by the invention remarkably improves
saturation voltage when a device is turned on, blocking
voltage is high, on-state loss is low, and latch
current density is relatively high.