In production of
ultrapure water by purifying primary pure water with a secondary pure water manufacturing apparatus and a
tertiary pure water manufacturing apparatus, high-purity
ultrapure water is produced, wherein generation of
hydrogen peroxide is minimized and the concentrations of TOC, DO, and
hydrogen peroxide are reduced to the limit. In an
ultrapure water manufacturing
system, each of the secondary pure water manufacturing apparatus and the
tertiary pure water manufacturing apparatus includes an
ultraviolet oxidation device and a deionization device, downstream therefrom, by using an
ion exchange resin. UV
light control is performed in such a way that the
hydrogen peroxide concentration results in 1 to 30 μg / L and the TOC concentration results in 1 to 10 μg / L at the outlet of the
ultraviolet oxidation apparatus of the secondary pure water manufacturing apparatus and, in addition, the TOC concentration results in 0.1 to 5 μg / L at the outlet of the
ultraviolet oxidation apparatus of the
tertiary pure water manufacturing apparatus. UV
light control is performed in such a way that the TOC concentration results in 1 to 10 μg / L at the outlet of the ultraviolet oxidation apparatus of the secondary pure water manufacturing apparatus and, in addition, the
hydrogen peroxide concentration results in 1 to 20 μg / L and the TOC concentration results in 0.1 to 5 μg / L at the outlet of the ultraviolet oxidation apparatus of the tertiary pure water manufacturing apparatus.