Provided is a semiconductor device wherein a gate electrode (14) of a thin film transistor (100) is formed of a single conductive film, and a semiconductor layer (10) is provided with a first low-concentration impurity region, which is arranged between the channel region (12) and the source region (15), and has an impurity concentration lower than the impurity concentrations of the source region and the drain region (15), and a second low-concentration impurity region, which is arranged between the channel region (12) and the drain region (15), and has an impurity concentration lower than the impurity concentrations of the source region and the drain region (15). A region (16a), which is one of the first and the second low-concentration impurity regions, entirely overlaps with the gate electrode (14), and a region (16b), which is the other one of the first and the second low-concentration impurity regions, does not overlap with the gate electrode (14).