177results about How to "Reduce release force" patented technology

The production process of soft magnetic Fe-Si-Al powder core includes the steps of compounding magnetic powder in different sizes, surface treatment, mixing magnetic powder, insulating agent, adhesive and demolding agent, molding, curing, magnetic heat treatment, soaking and surface coating. The present invention has the advantages of: breaking strength after curing in radial direction of 7-12 kg, less surface stripping, small demolding force, final breaking strength in radial direction of 17-24 kg, no influence of the insulating lacquer on electromagnetic performance and capability of realizing automatic production.

There is provided an adhesive sheet comprising an adhesive base sheet, an adhesive layer, and a release sheet laminated in sequence from the adhesive base sheet. The release sheet comprises a release agent layer and a release base material laminated in sequence from the adhesive layer. A release force between the release sheet and the adhesive layer is decreased by an external stimulus.

The invention relates to a reel-to-reel hot roller coining forming method for a micro-nano structure on the surface of polymer. The reel-to-reel hot roller coining forming method comprises the steps that a polymer material is conveyed to a preheat roller from an unreeling device, preheated to the attaching temperature and attached to a base band in a hot pressing mode; the polymer material attached to the base band is conveyed to the position between a mold roller and a pressure roller and heated to the coining temperature through the mold roller heated in advance, and then a mold cavity is filled with the polymer material through the action of the pressure roller; mold filling and supersonic vibration assembly starting are conducted at the same time, and the reel-to-reel hot roller coining process is completed with assistance of supersonic vibration; the polymer material is conveyed out from the position between the mold roller and the pressure roller, and then cooled and separated from the position inside the mold roller; and after demolding is completed, a polymer product is continuously cooled, separation of the polymer product and the base band is achieved, and finally reeling is conducted. According to the reel-to-reel hot roller coining forming method for the micro-nano structure on the surface of the polymer, the reel-to-reel hot roller coining process is improved through supersonic vibration, the mold filling process is accelerated, the duplication precision is improved, and the demolding force and demolding deformation are reduced; and the reel-to-reel hot roller coining forming method is advanced.

The invention discloses a nano imprint demoulding structure based on air driving, wherein a polymer clamping casing is arranged on a work bench, a mould plate is arranged at the lower end of the clamping casing, a plunger is arranged on the upper end surface of the mould plate, a sleeve is fixedly connected with the clamping casing, the sleeve and the plunger move from up to down, thereby the mould plate can move from up to down in the clamping casing, a sliding passage arranged on the lower end surface of the mould plate is provided with a spring and a slide block, a mould clamping air passage connected to the clamping casing is led into the slide passage via the mould plate, thereby the slide block can slide in the slide passage on the lower end surface of the mould plate, a demoulding air passage is switched in from the clamping casing and passes through the mould plate, and a sealing ring is arranged on the lower end surface of the clamping casing. The nano imprint demoulding structure is capable of demoulding smoothly, and stress of the polymer and the mould is uniform, further damages of the microstructure imprinted can be reduced to the minimum, the mould can be protested, and the cost of imprinting can be reduced.

A photocurable composition excellent in the effect of reducing the mold releasing force even in a small amount of light exposure, and a photosensitive gas generating agent contained in the photocurable composition are provided.

The photosensitive gas generating agent is a compound having a photostimulation responsive gas generating group to generate a gas by photostimulation, a perfluoroalkyl group and a polyalkyleneoxy group to link the photostimulation responsive gas generating group and the perfluoroalkyl group. The photocurable composition contains the photosensitive gas generating agent.

A display panel is provided. The display panel includes a substrate, a pixel array, a peripheral circuit, and a protective layer. The substrate includes a display region and a non-display region. The pixel array is located in the display region of the substrate. The peripheral circuit is located in the non-display region. The protective layer is located in the display region and the non-display region. The peripheral circuit and the pixel array are covered by the protective layer. The protective layer in the non-display region has a plurality of openings, which expose the substrate. The apertures of the openings is between 1 μm and 1 mm, and the spacing between the openings is 10 μm and 1 cm.

The invention provides a light release regulator for a silicon release agent. The light release regulator is methyl phenyl silicone oil which is an acid catalytic polymerization product of hexamethyldisiloxane, octamethylcyclotetrasiloxane and 2,4,6-trimethyl-2,4,6-triphenylcyclotrisiloxane. The invention also provides a synthesis method of the light release regulator for the silicon release agent, and a formula composition applied to the silicon release agent. The silicon release agent obtained by using the light release regulator for the silicon release agent has good performance indexes: the release force is small, the release force after aging is close to the release force measured immediately, and the residual adhesion rate can reach 90% or above.

A silicone release coating composition comprises:

• (A) 100 weight parts of an organopolysiloxane fluid having a viscosity at 25° C. of 50 to 10,000 mPa·s and an alkenyl content of 0.10 to 3.0 wt %;
• (B) 0.5-40 weight parts of a diorganopolysiloxane represented by the average structural formula (1):

R^c₃SiO(R^bR^cSiO_2/2)_n1(R^c₂SiO_2/2)_n2SiR^c₃   (1)

wherein R^b is an alkenyl group; R^c is an alkyl group or a phenyl group; n1 provides an alkenyl content of 0.05 to 0.80 wt. %; n2 is at least 1; and n1+n2 provides this component with a viscosity at 25° C. of 5,000 to 150,000 mPa·s;

• (C) an organohydrogenpolysiloxane that has a viscosity at 25° C. of 1 to 1,000 mPa·s, at least two silicon-bonded hydrogen atoms in each molecule, and an alkyl group or a phenyl group for its silicon-bonded organic groups;
• (D) a hydrosilylation reaction catalyst in a catalytic amount;
• (E) a surfactant;
• (F) water; and
• (G) an inhibitor.

A cold seal release film including a cold seal release layer employing a silicone oil slip agent therein. The release layer is oxidatively treated to a level to reduce the cold seal release force by at least 25%, as compared to the cold seal release force without oxidative treatment of the release layer. A method of forming the cold seal release film with an improved cold seal release layer as described above also forms a part of the present invention.

The invention discloses a demolding method in a nanoimprint technology process. The demolding method comprises the following steps: firstly, coating a substrate with a nanoimprint adhesive material to form an imprint adhesive layer; secondly, pressing a template into the imprint adhesive layer; thirdly, transmitting an ultrasonic wave to the template by an ultrasonic transmitting device at the upper part of the template after the imprint adhesive layer is cured and fixed, so as to assist separation of the template and the imprint adhesive layer; and finally removing the template and finishing the demolding process. Compared with the prior art, the problems that the molded nanoimprint structure is serious in deformation, overlarge in tear force and demolding force and the like due to cohesion force of the template and the adhesive layer in the demolding process of a nanoimprint technology are solved; imprinted pattern transferring and photoetching are completely consistent; the demolding force is effectively reduced; the demolding success rate is greatly improved; and large-scale industrial production is realized.

The invention relates to a method for producing a bonding of two substrates of which at least one is transparent and of which at least one has a surface having a surface energy (measured according to test method C) of 40 mN/m at maximum, comprising the use off a double-sided adhesive product having a first and a second adhesive surface, wherein the first adhesive surface is covered by a first separating layer and the second adhesive surface is covered by a second separating layer, wherein the pull-off force of the first separating layer from the first adhesive surface, AZK₁, is less than the pull-off force of the second separating layer from the second adhesive surface, AZK₂, and wherein the ratio of adhesion force of the fresh bond of the first adhesive surface on a surface having a surface energy (measured according to test method C) of 40 mN/m at maximum (KK_fresh, measured according to test method B) to the pull-off force (measured according to test method A) of the second separating layer from the second adhesive surface, KK_fresh: AZK₂, equals at least 13.5, comprising the following step: (a) removing the first separating layer from the first adhesive surface and bringing the first adhesive surface into contact with the surface having a surface energy (measured according to test method C) of 40 mN/m at maximum.

The invention discloses a high-temperature-resistant composite release film, which comprises a release film layer, an adhesive layer and a high-temperature-resistant resin film layer, wherein the release film layer is obtained by co-extrusion process of two thermoplastic resin materials; the adhesive layer is formed by coating one surface of the release film layer with an adhesive; and the high-temperature-resistant resin film layer is glued on the adhesive layer. The three-layer high-temperature-resistant composite release film has a compact structure and is easy to peel off. On the basis of not influencing characteristics of rubber surface, release force is low. A fluorine-containing material is selected for the high-temperature-resistant resin film layer. At the high temperature of 200 DEG C, the high-temperature-resistant resin film layer can never be decomposed or react with the release layer or the adhesive layer. The release film has excellent anti-sticking and isolation effects, and has dimensional stability at high temperature. The release layer adopts an organosilicon elastomer adhesive and the thickness is controlled. Then, there is no residue on the release layer.