The invention discloses a device and a method for large-area nano imprinting photoetching. A fluoropolymer-based thin film structure composite soft mould is introduced, and a gas assisting pressing mode and a mould micro-feed pressure pressing mode are adopted in the imprint process. The demoulding is carried out on the basis of low surface energy of a fluoropolymer base by a two-time solidifying and revealing type demoulding method, and thus the large area demoulding can be realized by small demoulding power. The device and the method for the large-area nano imprinting photoetching, disclosed by the invention, realize that a large-area nano-structure can be manufactured on various kinds of substrates, such as uneven (bent, cocked or stepped) substrates, curved substrates, or fragile substrates, and have the obvious advantages of high complex precision, large imprinting area, high efficiency, and low cost and a mould is long in service life. The device and the method for the large-area nano imprinting photoetching are suitable for LED (light emitting diode) nano-imaging technology and manufacturing of optical devices (such as optical lenses), butterfly solar condensers, micro-fluid control devices and the like.