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684results about How to "Reduce contamination" patented technology

RF shutter

The present invention generally comprises an RF shutter assembly for use in a plasma processing apparatus. The RF shutter assembly may reduce the amount of plasma creep below the substrate and shadow frame during processing, thereby reducing the amount of deposition that occurs on undesired surfaces. By reducing the amount of deposition on undesired surfaces, particle flaking and thus, substrate contamination may be reduced.
Owner:APPLIED MATERIALS INC

Sealed battery enclosure

A sealed battery enclosure to extend the life of the batteries contained therein is provided, the sealed battery enclosure significantly reducing contamination from water or other liquids and gases.
Owner:TESLA INC

Automatic exchanger for peritoneal dialysis

An automatic exchanger apparatus for peritoneal dialysis fluids is provided having a dialysis fluid bag and a drained fluid bag and arranged for connecting and disconnecting between the end of a peritoneal dialysis circuit equipped with a branching point and the end of a tube extending from a patient to drain the waste dialysis fluid from the cavity of the patient and fill the peritoneal cavity of the patient with a fresh peritoneal dialysis fluid for exchange, and in particular comprises: means A, B, and C for carrying out respectively a step (A) of connecting the end of the patient side tube to the end of the peritoneal dialysis circuit, a step (B) of delivering and draining the waste fluid, and a step (C) of, disconnecting the two ends and connecting the end of the patient side tube to its shut-off member, arranged for carrying out their respective steps (A) and (C) automatically; and a controlling means for controlling the respectively means to execute their respectively steps in a sequence. The apparatus is simple in the construction while carrying out, with much ease, the connection and disconnection of the tubes and the exchange of the fluids including a waste and a fresh supply one, hence avoiding operational errors of the operator and minimizing the possibility of infection and contamination.
Owner:JMS CO LTD

Apparatus and method for light-irradiation heat treatment

Light is applied for preheating from a halogen lamp to a lower surface of a semiconductor wafer supported on a susceptor within a chamber. Thereafter, flash light is applied for flash heating from a flash lamp to an upper surface of the semiconductor wafer. Treatment gas supplied from a gas supply source is heated by a heater, and supplied into the chamber. A flow amount control valve is provided to increase a flow amount of the treatment gas supplied into the chamber. Contaminants discharged from a film of the semiconductor wafer during heat treatment are discharged to the outside of the chamber with a gas flow formed by a large amount of high-temperature treatment gas supplied into the chamber to reduce contamination inside the chamber.
Owner:SCREEN HLDG CO LTD

Apparatus for and method of processing substrate

A stage cleaning substrate for use in the operation of cleaning a substrate stage within an exposure unit compatible with immersion exposure and a dummy substrate for use during the adjustment of an exposure position of a pattern image are held in a cleaning substrate housing part and a dummy substrate housing part, respectively, provided in a substrate processing apparatus. For the operation of cleaning the substrate stage or an alignment operation within the exposure unit, the stage cleaning substrate or the dummy substrate is transported from the substrate processing apparatus to the exposure unit. The process of cleaning the stage cleaning substrate or the dummy substrate is performed in a cleaning processing unit of the substrate processing apparatus immediately before or immediately after the operation of cleaning the substrate stage or the alignment operation.
Owner:SOKUDO CO LTD

Method of processing substrate, substrate processing system and substrate processing apparatus

In an exposure unit compatible with immersion exposure, a dummy substrate to be used for an alignment process for adjustment of an exposure position for a pattern image is transferred to a substrate processing apparatus for performing a resist coating process before exposure and a development process after exposure. In the substrate processing apparatus, the received dummy substrate is reversed and transferred to a back surface cleaning unit, to be subjected to a back surface cleaning process. After that, the dummy substrate is reversed again and transferred to a front surface cleaning unit, to be subjected to a front surface cleaning process. The dummy substrate after being cleaned is transferred back from the substrate processing apparatus to the exposure unit. Since the alignment process can be performed by using a clean dummy substrate in the exposure unit, it is possible to reduce contamination of mechanisms in the exposure unit, such as a substrate stage and the like.
Owner:SOKUDO CO LTD

Automotive heat exchanger assemblies having internal fins and methods of making the same

ActiveUS20060283585A1Reduce contaminationImproved thermal/pressure resistant heat exchangerReinforcing meansHeat exchanger casingsEngineeringHigh pressure
The present invention relates to automotive heat exchanger assemblies that can withstand high environmental temperature and pressures conditions. By providing for a tube strengthener into the tubes at the areas of highest stress, the heat exchanger assembly is strengthened to be efficient under typical operating conditions
Owner:VALEO INC

Compositions and methods for reducing microbial contamination in meat processing

The present invention is directed to compositions, methods, and systems for reducing microbial contamination in meat processing. In accordance with one aspect of the invention, disinfection composition and / or recycled disinfection composition comprising an acid, a buffer, and optionally an antimicrobial metal is applying to a carcass during at least one processing step of sacrificing, scalding, feather / hair / hide removal, eviscerating, and washing. Other aspects of the invention provide a carcass processing system comprising processing stations intermittently fluidly connected via a buffered acidic disinfection composition.
Owner:TASKER CAPITAL
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