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917results about How to "Improve system reliability" patented technology

Photovoltaic system power tracking method

ActiveUS20090145480A1Increased electrical powerMaximize solar powerSolar heating energySolar heat collector controllersSolar lightElectrical current
A photovoltaic system including a photovoltaic cell, and an electronic module connected to the photovoltaic cell. The electronic module is adapted to produce at least one control signal indicative of electrical power being generated by the photovoltaic cells. A tracking controller is adapted to receive the control signal(s) and based on the control signal(s), the controller is adapted to control a tracking motor for adjusting the system so that electrical power generated by the photovoltaic cells is increased. The photovoltaic system may include an optical element, adapted for concentrating solar light onto the photovoltaic cells. The electronic module preferably performs direct current (DC) to direct current (DC) power conversion and maximum power point tracking by electrical power, current, or voltage at either their inputs or their outputs. Alternatively, the tracking controller is configured to also perform maximum power point tracking by increasing to a local maximum electrical power by varying at least one of (i) current or voltage output from the photovoltaic cell or (ii) current or voltage output from the electronic module.
Owner:SOLAREDGE TECH LTD

Syringe pump rapid occlusion detection system

ActiveUS20050096593A1Reduces incidenceReduces infusion rateMedical devicesPump controlSyringeOcclusion detection
An apparatus, method and program product detects an occlusion in a fluid line by determining if a relationship between force measurements departs from an expected relationship.
Owner:SMITHS MEDICAL ASD INC

Processing system for fabricating compound nitride semiconductor devices

One embodiment of a processing system for fabricating compound nitride semiconductor devices comprises one or more processing chamber operable with form a compound nitride semiconductor layer on a substrate, a transfer chamber coupled with the processing chamber, a loadlock chamber coupled with the transfer chamber, and a load station coupled with the loadlock chamber, wherein the load station comprises a conveyor tray movable to convey a carrier plate loaded with one or more substrates into the loadlock chamber. Compared to a single chamber reactor, the multi-chamber processing system expands the potential complexity and variety of compound structures. Additionally, the system can achieve higher quality and yield by specialization of individual chambers for specific epitaxial growth processes. Throughput is increased by simultaneous processing in multiple chambers.
Owner:APPLIED MATERIALS INC

Method for performing a command cancel function in a DRAM

ActiveUS7480774B2Improve overall memory system reliabilityImprove system reliabilityOther printing matterMemory loss protectionClock rate8-bit
A method for performing a common cancel (CC) function on a dynamic random access memory (DRAM) semiconductor device to improve reliability and speed of a memory system. The CC function rakes advantage of the intrinsic delays associated wit memory read operations at high clock frequencies, and the increased write latency commensurate with increased read latencies where non-zero larencies for read and write operations are the norm by permitting address and command ECC structures to operate in parallel with the address and command re-drive circuitt The CC function is extendable to future DDR2 and DDR3 operating requirements in which latency of higher frequency modes will increase due to the shift from 2 bit pre-fetch to 4 and 8 bit pre-fetch architecture.
Owner:MARVELL ASIA PTE LTD

Cluster tool architecture for processing a substrate

Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, substrates processed in the cluster tool have a more repeatable wafer history, and also the cluster tool has a smaller system footprint. In one embodiment, the cluster tool is adapted to perform a track lithography process in which a substrate is coated with a photosensitive material, is then transferred to a stepper/scanner, which exposes the photosensitive material to some form of radiation to form a pattern in the photosensitive material, which is then removed in a developing process completed in the cluster tool. In track lithography type cluster tools, since the chamber processing times tend to be rather short, and the number of processing steps required to complete a typical track system process is large, a significant portion of the time it takes to process a substrate is taken up by the processes of transferring the substrates in a cluster tool between the various processing chambers. In one embodiment of the cluster tool, the cost of ownership is reduced by grouping substrates together and transferring and processing the substrates in groups of two or more to improve system throughput, and reduces the number of moves a robot has to make to transfer a batch of substrates between the processing chambers, thus reducing wear on the robot and increasing system reliability. In one aspect of the invention, the substrate processing sequence and cluster tool are designed so that the substrate transferring steps performed during the processing sequence are only made to chambers that will perform the next processing step in the processing sequence. Embodiments also provide for a method and apparatus that are used to improve the coater chamber, the developer chamber, the post exposure bake chamber, the chill chamber, and the bake chamber process results. Embodiments also provide for a method and apparatus that are used to increase the reliability of the substrate transfer process to reduce system down time.
Owner:SCREEN SEMICON SOLUTIONS CO LTD
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