31 results about "Vacuum ultraviolet spectroscopy" patented technology

A spectroscopy system is provided which operates in the vacuum ultra-violet spectrum. More particularly, a system utilizing reflectometry techniques in the vacuum ultraviolet spectrum is provided for use in metrology applications. The system may further include the use of an array detector in combination with an imaging spectrometer. In this manner data for multiple wavelengths may be simultaneously collected. Moreover, the multiple wavelengths of data may be collected simultaneously for a two dimensional sample area. The system may further include the use of a fixed diffraction grating and does not require the use of polarizing elements. To ensure accurate and repeatable measurement, the environment of the optical path is controlled. The optical path may include a controlled environmental chamber in which non-absorbing purge gases are present or in which vacuum evacuation techniques are utilized. The controlled environment may further include a separate instrument chamber and a separate sample chamber. The controlled environment limits in a repeatable manner the absorption of VUV photons.

A spectroscopy system is provided which operates in the vacuum ultraviolet spectrum. More particularly, a system utilizing reflectometry techniques in the vacuum ultraviolet spectrum is provided for use in metrology applications. To ensure accurate and repeatable measurement, the environment of the optical path is controlled to limit absorption effects of gases that may be present in the optical path. The VUV reflectometer may be utilized to monitor a wide range of data in a semiconductor processing environment. For example, the techniques may be used for measuring thicknesses, optical properties, composition, porosity and roughness of a film or stack of films. Further, the VUV techniques and apparatus may be used to characterize critical dimensions and other features of a device. The VUV reflectometer system may be utilized as a stand alone tool, or the relatively compact nature of the system may be taken advantage of such that the system is incorporated into other process tools. Thus, for example, the VUV techniques described herein may be incorporated directly into tools used for deposition, etch, photolithography, etc. so that in-line measurements, monitoring and control may be advantageously obtained.

A spectroscopy system is provided which operates in the vacuum ultra-violet spectrum. More particularly, a system utilizing reflectometry techniques in the vacuum ultraviolet spectrum is provided for use in metrology applications. The system may further include the use of an array detector in combination with an imaging spectrometer. In this manner data for multiple wavelengths may be simultaneously collected. Moreover, the multiple wavelengths of data may be collected simultaneously for a two dimensional sample area. The system may further include the use of a fixed diffraction grating and does not require the use of polarizing elements. To ensure accurate and repeatable measurement, the environment of the optical path is controlled. The optical path may include a controlled environmental chamber in which non-absorbing purge gases are present or in which vacuum evacuation techniques are utilized. The controlled environment may further include a separate instrument chamber and a separate sample chamber. The controlled environment limits in a repeatable manner the absorption of VUV photons.

A spectroscopy system is provided which operates in the vacuum ultraviolet spectrum. More particularly, a system utilizing reflectometry techniques in the vacuum ultraviolet spectrum is provided for use in metrology applications. To ensure accurate and repeatable measurement, the environment of the optical path is controlled to limit absorption effects of gases that may be present in the optical path. To account for absorption effects that may still occur, the length of the optical path is minimized. To further account for absorption effects, the reflectance data may be referenced to a relative standard. Referencing is particularly advantageous in the VUV reflectometer due to the low available photon flux and the sensitivity of recorded data to the composition of the gaseous medium contained with the optical path. Thus, errors that may be introduced by changes in the controlled environment may be reduced. In one exemplary embodiment, the VUV reflectometer may utilize a technique in which a beam splitter is utilized to create a sample beam and a reference beam to form the two arms of a near balanced Mach Zehnder interferometer. In another exemplary embodiment, the reference channel may be comprised of a Michelson interferometer.

A spectroscopy system is provided which operates in the vacuum ultraviolet spectrum. More particularly, a system utilizing reflectometry techniques in the vacuum ultraviolet spectrum is provided for use in metrology applications. To ensure accurate and repeatable measurement, the environment of the optical path is controlled to limit absorption effects of gases that may be present in the optical path. To account for absorption effects that may still occur, the length of the optical path is minimized. To further account for absorption effects, the reflectance data may be referenced to a relative standard. Referencing is particularly advantageous in the VUV reflectometer due to the low available photon flux and the sensitivity of recorded data to the composition of the gaseous medium contained with the optical path. Thus, errors that may be introduced by changes in the controlled environment may be reduced. In one exemplary embodiment, the VUV reflectometer may utilize a technique in which a beam splitter is utilized to create a sample beam and a reference beam to form the two arms of a near balanced Mach Zehnder interferometer. In another exemplary embodiment, the reference channel may be comprised of a Michelson interferometer.

The invention relates to a testing technique for testing transmission characteristics of spectral radiation, particularly to a testing device for testing transmission characteristics of ultraviolet-vacuum ultraviolet spectral radiation. The testing device comprises a monochrometer, a standard light source, a vacuum container, a photomultiplier tube disposed in the vacuum container and fixed at one side of a rotary table, a cryogenic pump and a molecular pump respectively communicated with the cavity of the vacuum container via two gate valves, a dry vacuum pump communicated with the cavity pipeline of the vacuum container, and a cryogenic unit communicated with the vacuum container via a pipeline, wherein a flange interface is provided at one end of the vacuum container and used for alternatively connecting with the monochrometer or standard light source; the movement platform capable of performing translational movement with respect to the vertical direction of the axial line of the interface is disposed in the vacuum container, and the rotary table is disposed on the movement platform. The invention can be used for high-precision calibration of the spectral radiation brightness and the spectral irradiance responsibility of the entire machine of an ultraviolet spectra remote sensing instrument; and can be used for testing the spectral responsibility of an ultraviolet detector and testing the spectral transmission characteristics of an ultraviolet optical element.

A vacuum ultraviolet hemisphere reflectivity testing device belongs to the field of vacuum ultraviolet spectrum transmission testing and comprises a deuterium lamp light source, a toroid mirror, a Seya-Namioka monochrometer, an alignment reflector, a photochopper, a fluorescent integrating sphere coated with a fluorescent conversion film on the inner wall, a sample, a diffuse transmission light filter, a detector, an accurate rotary table, a wavelength driving mechanism, a data collection system, a computer and a vacuum tank. All optical elements of the testing device are of reflection structures, a light division system adopts the Seya-Namioka monochrometer, a IV type phase difference elimination concave face grating with large numerical is adopted at a light division element of the monochrometer, and efficient transmission of vacuum ultraviolet spectrum energy is guaranteed. A receiving system of the detector adopts the scheme of the fluorescent integrating sphere, thereby avoiding excess energy loss after vacuum ultraviolet beams are reflected mangy times on the inner wall of the integrating sphere. By means of two working models (sample / reference), absolute measurement of the vacuum ultraviolet hemisphere reflectivity is achieved.

The invention provides a vacuum ultraviolet spectroscopy detecting device, which belongs to the field of spectrum analysis. The device includes: an entrance slit (2), a concave grating (3), a optical fiber array (4) and a flat plate detector (5). The entrance slit (2) and concave grating (3) are fixed in the vacuum cavity (1), one head face of the optical fiber array (4) coincides with the Rowland circle determined by the entrance slit (2) and the concave grating (3). The head face of the optical fiber array (4) is painted with fluorescent substance which can transform vacuum ultraviolet light into visible light, the other end face bifurcates into a number of sub-optical fiber arrays, and the end face of the sub-optical fiber array is a plain face and is connected with one flat plate detector (5). The device can measure vacuum ultraviolet spectroscopy within a certain range of wavelength simultaneously, and achieve the optical spectrum and pixel resolution of glancing incidence grating vacuum ultraviolet spectrometer, the testing time responses well and the device has high sensitivity; the moveable component is not needed in the vacuum cavity, and the structure is simple and reliable.

The invention relates to a method and a device for calibrating vacuum ultraviolet spectral radiometers. The method comprises spectral radiant luminance responsivity calibration, spectral radiant irradiance responsivity calibration and / or wavelength accuracy calibration, which are conducted in an oil-free vacuum chamber. The device comprises a spectral radiant luminance responsivity calibration mechanism, a spectral radiant irradiance responsivity calibration mechanism, and a wavelength accuracy calibration mechanism. There is no calibration device suitable for vacuum ultraviolet spectral radiometers in our country at present. By using the method and the device for calibrating vacuum ultraviolet spectral radiometers of the invention, the multiple parameters of a vacuum ultraviolet spectral radiometer can be calibrated in a ground laboratory before emission, and therefore, the accuracy of data acquired by the vacuum ultraviolet spectral radiometer is guaranteed. The method and the device are of great significance to the acquisition of spectral information of the sun, the earth surface and other sun-earth space environments.

A spectroscopy system (500) is provided which operates in the vacuum ultra-violet spectrum. More particularly, a system utilizing reflectometry techniques in the vacuum ultraviolet spectrum is provided for use in metrology applications. To ensure accurate and repeatable measurement, the environment of the optical paths (506, 508) is controlled to limit absorption effects of gases that may be present in the optical path. To account for absorption effects that may still occur, the length of the optical path is minimized. To further account for absorption effects, the reflectance data may be referenced to a relative standard.

A method for determining a set of grating parameters for producing a diffraction grating for a vacuum-ultraviolet spectrometer, the parameters used being the small and large radius of the toroidal grating substrate, the two distances between the two holographic illumination points and the grating origin, the angular position of the holographic illumination points in relation to the grating normal, and the laser wavelength for the holographic illumination. The method determines respective optimum grating parameters on numeric iterative paths for a specific problem definition. The method thus advantageously enables the production of a VUV spectrometer having a diffraction grating that for a predetermined wavelength range produces a minimum line width on the detector with a large range.

The invention relates to micromechanical mirrors with a high-reflection coating for the deep-ultraviolet (DUV) and vacuum-ultraviolet (VUV) spectral range, based on a substrate which is coated with an aluminium layer and a transparent blooming coating. Likewise the invention relates to a method for the production of such micromechanical layers with a high-reflection coating and to the use thereof for the production of microsensors, optical data stores or video and data projection displays.

The invention discloses an adjusting method for a vacuum ultraviolet plane grating dispersion spectrograph and belongs to the technical field of spectrographs. The adjusting method is used for solving the problem that precision is lowered when the vacuum ultraviolet grating spectrograph is adjusted. According to the adjusting method, an interferometer serves as the light source, a plane mirror is used for replacing a vacuum ultraviolet grating in an original light path, and a system wave aberration interferogram is used for sequentially adjusting a telescoping system, a collimation system and a slot of the spectrograph; afterwards, a visible light grating is used for replacing the plane mirror, collimation light of a parallel mercury lamp characteristic spectrum built through a mercury lamp and the collimation system serves as the adjusting light source, an image surface ideal spectrum chart of the system under the vacuum ultraviolet waveband is calculated, the vacuum ultraviolet wavelength corresponding to the mercury lamp characteristic spectrum is calculated according to the groove density of the visible light grating for replacement and the vacuum ultraviolet grating of the vacuum ultraviolet spectrograph to be adjusted, the positions of all vacuum ultraviolet spectrum lines corresponding to the mercury lamp characteristic spectrum on an image surface are recorded, the light grating and a focusing mirror are adjusted in sequence, and the positions of mercury lamp characteristic spectrum lines fall on the optimal positions obtained through calculation.

The invention belongs to the technical field of semiconductor lighting devices, and specifically relates to a vacuum ultraviolet LED junction temperature and ultraviolet radiation measuring system based on an integrating sphere. The measuring system comprises an external bearing sphere which can be pumped to a low-vacuum state, an internal integrating sphere which can be pumped to a high-vacuum state, a constant temperature device, a measuring circuit, and a driving circuit. The bearing sphere and the integrating sphere are electrically connected by an aviation plug. The side wall of the internal integrating sphere is equipped with a standard lamp, a vacuum ultraviolet power meter probe and a vacuum ultraviolet spectrometer, and can measure the radiation flux and the spectrum of a vacuum ultraviolet LED. The constant temperature device is connected with a temperature feedback system and a computer control system, and can control the temperature accurately and quickly. The advantage lies in that the parameters of a vacuum ultraviolet LED, such as spectral power distribution, radiation flux, electric power, thermal power and junction temperature, can be measured simultaneously under constant junction temperature, and test is highly repeatable.

The invention discloses a metal nanowire detector and method for measuring vacuum ultraviolet intensity. By means of the metal nanowire detector and method for measuring the vacuum ultraviolet intensity, a vacuum ultraviolet spectral signal is absolutely measured. The detector is composed of a multihole anodised alumina template with nanometer holes, and single substance metal on which single substance metal nanowires can grow is deposited inside the nanometer holes of the multihole anodised alumina template. The detector is used for measuring the 30-250eV ultraviolet signal intensity under the vacuum environment. The measuring method comprises the steps that a copper ring sheet serves as a positive electrode, the metal nanowire detector serves as a negative electrode, an insulating washer is inserted between the copper ring sheet and the metal nanowire detector, the negative electrode is connected with a current meter in series, and a DC stabilized power supply which can provide positive voltage or back bias voltage for the positive electrode and the negative electrode is additionally arranged in a measuring loop; the metal nanowire detector is demarcated through a transmission standard detector; the demarcated detector is placed at a corresponding position in the light intensity signal measuring light path layout; a light path system is started to provide the positive voltage or the back bias voltage for the positive electrode and the negative electrode; the light intensity signal is measured based on the full electron yield method, measuring is efficient, and the signal is stable.

An apparatus for measuring the transport time of impurity particles in a plasma includes a spectrometer, a system for the spatially-resolving conversion into charge of light exiting the spectrometer, an integrator circuit for the spatially-resolving integration of the charge, as well as a display screen that presents the integrated charge as a series of spectral lines. The integrator circuit is assembled from discrete components. Thus, the transport of plasma impurities can be properly measured.

The invention provides a vacuum ultraviolet spectroscopy detecting device, which belongs to the field of spectrum analysis. The device includes: an entrance slit (2), a concave grating (3), a opticalfiber array (4) and a flat plate detector (5). The entrance slit (2) and concave grating (3) are fixed in the vacuum cavity (1), one head face of the optical fiber array (4) coincides with the Rowlandcircle determined by the entrance slit (2) and the concave grating (3). The head face of the optical fiber array (4) is painted with fluorescent substance which can transform vacuum ultraviolet lightinto visible light, the other end face bifurcates into a number of sub-optical fiber arrays, and the end face of the sub-optical fiber array is a plain face and is connected with one flat plate detector (5). The device can measure vacuum ultraviolet spectroscopy within a certain range of wavelength simultaneously, and achieve the optical spectrum and pixel resolution of glancing incidence gratingvacuum ultraviolet spectrometer, the testing time responses well and the device has high sensitivity; the moveable component is not needed in the vacuum cavity, and the structure is simple and reliable.

A vacuum ultraviolet hemisphere reflectivity testing device belongs to the field of vacuum ultraviolet spectrum transmission testing and comprises a deuterium lamp light source, a toroid mirror, a Seya-Namioka monochrometer, an alignment reflector, a photochopper, a fluorescent integrating sphere coated with a fluorescent conversion film on the inner wall, a sample, a diffuse transmission light filter, a detector, an accurate rotary table, a wavelength driving mechanism, a data collection system, a computer and a vacuum tank. All optical elements of the testing device are of reflection structures, a light division system adopts the Seya-Namioka monochrometer, a IV type phase difference elimination concave face grating with large numerical is adopted at a light division element of the monochrometer, and efficient transmission of vacuum ultraviolet spectrum energy is guaranteed. A receiving system of the detector adopts the scheme of the fluorescent integrating sphere, thereby avoiding excess energy loss after vacuum ultraviolet beams are reflected mangy times on the inner wall of the integrating sphere. By means of two working models (sample / reference), absolute measurement of the vacuum ultraviolet hemisphere reflectivity is achieved.

The invention relates to the technical field of ultraviolet irradiance measurement, in particular to a method and a system for standardization of vacuum ultraviolet spectrum irradiance. The method includes obtaining ultraviolet spectrum irradiance luminance L (lambada) of an ultraviolet source with the wavelength range of 115nm-400nm; obtaining the ultraviolet spectrum irradiance E (lambada) of the ultraviolet source with the wavelength range of 250nm-400nm; obtaining a light source solid angle omega with the wavelength range of 250nm-400nm by utilizing the omega=E (lambada) / L (lambada); obtaining the light source solid angle omega 1 with the wavelength range of 115nm-250nm according to the light source solid angle omega with the wavelength range of 250nm-400nm; and obtaining the ultraviolet spectrum irradiance luminance E 1 (lambada) with the wavelength range of 115nm-250nm according to the formula E I (lambada) = L (lambada) *omega I. By the aid of the method, the problem that lower limit wavelength of the vacuum ultraviolet spectrum irradiance fails to reach 250nm below is solved.

The invention discloses a method for detecting attenuation resistance characteristic of fluorescent powder. The method comprises the following steps: adding water into the fluorescent powder, mixing so as to obtain a mixture, slurrying the mixture, heating, drying, dispersing, sieving, stimulating by a vacuum ultraviolet spectrum analyzer and qualitatively judging the strength of the attenuation resistance characteristic of the fluorescent powder according to the brightness retention rate before and after the slurrying of the powder.

Analysis of chemically samples using gas chromatography (GC) separation with vacuum ultra-violet spectroscopy detection is described. One technique focuses on assigning a specific analysis methodology to each constituent in a sample. Constituents can elute from the GC by themselves or with other constituents, in which case a deconvolution is done using VUV spectroscopic data. In an exemplary embodiment, each constituent may be specifically included in an analysis method during a setup procedure, after which the same series of analyses are done on subsequent sample runs. The second approach essentially integrates an entire chromatogram by first reducing it into a series of analysis windows, or time slices, that are analyzed automatically. The analysis at each time slice determines the molecular constituents that are present as well as their contributions to the total response. Either approach can be used to quantify specific analytes or to do bulk classification.

The invention relates to the technical field of designs for optical systems, in particular to an optical system for calibrating vacuum ultraviolet spectral parameters. When the optical system is used for calibrating vacuum ultraviolet relative spectral response ratios of detectors, ultraviolet light with a specific wave band within a 110-400nm wave band range is turned into parallel light by specific collimating lenses of a plurality of collimating lenses, and the parallel light is transmitted to the detectors; and when the optical system is used for calibrating vacuum ultraviolet spectral irradiance of light, the ultraviolet light with a specific wave band within a 110-400nm wave band range is converged by specific converging lenses of a plurality of converging lenses after the ultraviolet light is transmitted through diffusers, the converged light is outputted to a standard detector, and the ultraviolet light with the specific wave band is equalized by the specific diffusers. The optical system in an embodiment of the invention has the advantages that seven lens materials, the wave band ranges and performance parameters of the optical system are reasonably matched with one another by a combined type design method, the cost is lowered, and the structure of the system is simplified.

The invention relates to an apparatus comprising a spectrometer, means for the spatially-resolving conversion into charge of light exiting the spectrometer, an integrator circuit for the spatially-resolving integration of the charge, as well as means for displaying the charge that is integrated dependent on the position. The integrator circuit is assembled from discrete components. Thus, the transport of plasma impurities can be properly measured.

The invention relates to the technical field of designs for optical systems, in particular to an optical system for calibrating vacuum ultraviolet spectral parameters. When the optical system is used for calibrating vacuum ultraviolet relative spectral response ratios of detectors, ultraviolet light with a specific wave band within a 110-400nm wave band range is turned into parallel light by specific collimating lenses of a plurality of collimating lenses, and the parallel light is transmitted to the detectors; and when the optical system is used for calibrating vacuum ultraviolet spectral irradiance of light, the ultraviolet light with a specific wave band within a 110-400nm wave band range is converged by specific converging lenses of a plurality of converging lenses after the ultraviolet light is transmitted through diffusers, the converged light is outputted to a standard detector, and the ultraviolet light with the specific wave band is equalized by the specific diffusers. The optical system in an embodiment of the invention has the advantages that seven lens materials, the wave band ranges and performance parameters of the optical system are reasonably matched with one another by a combined type design method, the cost is lowered, and the structure of the system is simplified.

The method for installing and adjusting the vacuum ultraviolet grating dispersion spectrometer belongs to the field of spectrum technology. In order to solve the problem that the accuracy of the vacuum ultraviolet grating spectrometer is lowered during the installation and adjustment, the method uses an interferometer as a light source, and uses a plane mirror to carry out the vacuum ultraviolet grating in the original optical path. Instead, adjust the telescopic system, collimation system and slit of the spectrometer in sequence through the system wave aberration interferogram; then replace the plane mirror with a visible light grating, and use the mercury lamp and collimation system to build the characteristic spectral collimation of the parallel mercury lamp Light is the light source for installation and adjustment, calculate the ideal spectrum of the image plane of the system in the vacuum ultraviolet band, and calculate the characteristics of the corresponding mercury lamp according to the ratio of the reticle density of the replaced visible light grating to the vacuum ultraviolet grating of the vacuum ultraviolet spectrometer to be adjusted The vacuum ultraviolet wavelength of the spectrum, record the position of each vacuum ultraviolet spectral line corresponding to the characteristic spectrum of the mercury lamp on the image plane, and adjust the grating and focusing mirror in turn, so that the position of the characteristic spectral line of the mercury lamp falls to the best position obtained by calculation superior.

An apparatus and method are presented for use in optical processing of an article. The apparatus comprises: one or more optical windows for directing predetermined electromagnetic radiation therethrough to illuminate a region of interest and collecting radiation returned from the illuminated region; and two or more ports operable for inputting or discharging one or more gases from the vicinity of the region of interest on the article being processed to create in the vicinity of said region a substantially static state of environment, non-absorbable for said electromagnetic radiation, thereby reducing amount of ambient gas in the vicinity of said region of interest and enabling optical processing of the article while maintaining it in the ambient gas environment.

The invention discloses a metal nanowire detector and method for measuring vacuum ultraviolet intensity. By means of the metal nanowire detector and method for measuring the vacuum ultraviolet intensity, a vacuum ultraviolet spectral signal is absolutely measured. The detector is composed of a multihole anodised alumina template with nanometer holes, and single substance metal on which single substance metal nanowires can grow is deposited inside the nanometer holes of the multihole anodised alumina template. The detector is used for measuring the 30-250eV ultraviolet signal intensity under the vacuum environment. The measuring method comprises the steps that a copper ring sheet serves as a positive electrode, the metal nanowire detector serves as a negative electrode, an insulating washer is inserted between the copper ring sheet and the metal nanowire detector, the negative electrode is connected with a current meter in series, and a DC stabilized power supply which can provide positive voltage or back bias voltage for the positive electrode and the negative electrode is additionally arranged in a measuring loop; the metal nanowire detector is demarcated through a transmission standard detector; the demarcated detector is placed at a corresponding position in the light intensity signal measuring light path layout; a light path system is started to provide the positive voltage or the back bias voltage for the positive electrode and the negative electrode; the light intensity signal is measured based on the full electron yield method, measuring is efficient, and the signal is stable.

The invention relates to the technical field of ultraviolet irradiance measurement, in particular to a method and a system for standardization of vacuum ultraviolet spectrum irradiance. The method includes obtaining ultraviolet spectrum irradiance luminance L (lambada) of an ultraviolet source with the wavelength range of 115nm-400nm; obtaining the ultraviolet spectrum irradiance E (lambada) of the ultraviolet source with the wavelength range of 250nm-400nm; obtaining a light source solid angle omega with the wavelength range of 250nm-400nm by utilizing the omega=E (lambada) / L (lambada); obtaining the light source solid angle omega 1 with the wavelength range of 115nm-250nm according to the light source solid angle omega with the wavelength range of 250nm-400nm; and obtaining the ultraviolet spectrum irradiance luminance E 1 (lambada) with the wavelength range of 115nm-250nm according to the formula E I (lambada) = L (lambada) *omega I. By the aid of the method, the problem that lower limit wavelength of the vacuum ultraviolet spectrum irradiance fails to reach 250nm below is solved.