Patents
Literature
Hiro is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Hiro

344 results about "Reflectometry" patented technology

Reflectometry uses the reflection of waves at surfaces and interfaces to detect or characterize objects. There are many different forms of reflectometry. They can be classified in several ways: by the used radiation (electromagnetic, ultrasound, particle beams), by the geometry of wave propagation (unguided versus wave guides or cables), by the involved length scales (wavelength and penetration depth versus size of the investigated object), by the method of measurement (continuous versus pulsed, polarization resolved, ...), and by the application domain.

Method and apparatus for measuring optical reflectivity and imaging through a scattering medium

An apparatus and method for performing optical coherence domain reflectometry. The apparatus preferably includes a single output light source to illuminate a sample with a probe beam and to provide a reference beam. The reference beam is routed into a long arm of an interferometer by a polarizing beamsplitter. A reflected beam is collected from the sample. A 90.degree. double pass polarization rotation element located between the light source and the sample renders the polarizations of the probe beam and reflected beam orthogonal. The polarizing beamsplitter routes the reflected beam into a short arm of the interferometer. The interferometer combines the reference beam and the reflected beam such that coherent interference occurs between the beams. The apparatus ensures that all of the reflected beam contributes to the interference, resulting in a high signal to noise ratio.
Owner:OPTICAL BIOPSY TECH

Common path frequency domain optical coherence reflectometry/tomography device

InactiveUS7428053B2Relieving the requirements to the spectral resolutionEliminate the problemInterferometersMaterial analysis by optical meansOptical radiationData acquisition
Common path frequency domain optical coherence reflectometry / tomography devices include a portion of optical fiber with predetermined optical properties adapted for producing two eigen modes of the optical radiation propagating therethrough with a predetermined optical path length difference. The two replicas of the optical radiation outgoing from the portion of the optical fiber are then delivered to an associated sample by an optical fiber probe. The tip of the optical fiber serves as a reference reflector and also serves as a combining element that produces a combination optical radiation by combining an optical radiation returning from the associated sample with a reference optical radiation reflected from the reference reflector. The topology of the devices allows for registering a cross-polarized or a parallel-polarized component of the optical radiation reflected or backscattered from the associated sample. Having the optical path length difference for the two eigen modes of the optical radiation (which is an equivalent of an interferometer offset in previously known devices) differ from the reference offset in the devices of the present invention allows for relieving the requirements to the spectral resolution of the FD OCT engine and / or data acquisition and processing system, and substantially eliminates depth ambiguity problems.
Owner:IMALUX CORP

Multi-technique thin film analysis tool

A thin film analysis system includes multi-technique analysis capability. Grazing incidence x-ray reflectometry (GXR) can be combined with x-ray fluorescence (XRF) using wavelength-dispersive x-ray spectrometry (WDX) detectors to obtain accurate thickness measurements with GXR and high-resolution composition measurements with XRF using WDX detectors. A single x-ray beam can simultaneously provide the reflected x-rays for GXR and excite the thin film to generate characteristic x-rays for XRF. XRF can be combined with electron microprobe analysis (EMP), enabling XRF for thicker films while allowing the use of the faster EMP for thinner films. The same x-ray detector(s) can be used for both XRF and EMP to minimize component count. EMP can be combined with GXR to obtain rapid composition analysis and accurate thickness measurements, with the two techniques performed simultaneously to maximize throughput.
Owner:KLA TENCOR CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products