Vacuum ultraviolet referencing reflectometer

A reflectometer and reflectivity technology, applied in the field of spectroscopy systems, can solve the problems of poor system repeatability and no reference device, and achieve the effect of small space, simple design, and small measurement spot size

Active Publication Date: 2006-11-01
布鲁克科技公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

While this system enables efficient measurements to be performed over multiple spectral subbands, it has no means of providing a reference for the collected data
Thus, while signal throughput may be high, system repeatability may be rather poor

Method used

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  • Vacuum ultraviolet referencing reflectometer
  • Vacuum ultraviolet referencing reflectometer
  • Vacuum ultraviolet referencing reflectometer

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Embodiment Construction

[0076] In order to increase the sensitivity of optical metrology equipment for challenging applications, it is desirable to extend the wavelength range over which such measurements are performed. In particular, it would be advantageous to utilize shorter wavelength (higher energy) photons that extend into and beyond a region of the electromagnetic spectrum known as the vacuum extreme ultraviolet (VUV). In the past, relatively little effort has been expended to develop optical instruments designed to operate at these wavelengths due to acknowledgment of the fact that VUV (and lower) photons are strongly absorbed under standard atmospheric conditions. Vacuum extreme ultraviolet (VUV) wavelengths are generally considered to be wavelengths smaller than deep ultraviolet (DUV) wavelengths. Thus, VUV wavelengths are generally considered wavelengths less than about 190 nm. While there is no universal cut-off point for the bottom end of the VUV range, some in the field would consider ...

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Abstract

A spectroscopy system (500) is provided which operates in the vacuum ultra-violet spectrum. More particularly, a system utilizing reflectometry techniques in the vacuum ultraviolet spectrum is provided for use in metrology applications. To ensure accurate and repeatable measurement, the environment of the optical paths (506, 508) is controlled to limit absorption effects of gases that may be present in the optical path. To account for absorption effects that may still occur, the length of the optical path is minimized. To further account for absorption effects, the reflectance data may be referenced to a relative standard.

Description

Background technique [0001] The present invention relates generally to the instrumentation and application of vacuum ultraviolet reflectance spectroscopy. In one embodiment, the present invention can be used to provide semiconductor manufacturers with high throughput with non-contact metrology capabilities for process control during the manufacture of cutting-edge semiconductor devices. Furthermore, the invention is sufficiently compact to facilitate its use in integrated (in-line) process control applications. [0002] The semiconductor industry is currently developing processing technologies to enable the fabrication of devices composed of thinner layers and to handle smaller feature sizes than ever before. To enable these advances, supporting metrology techniques must be developed because current systems lack the sensitivity required to detect subtle changes in processing conditions. [0003] Optical metrology instruments have long been used in semiconductor processing ap...

Claims

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Application Information

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IPC IPC(8): G01N3/28G01N21/55
Inventor 戴尔·A.·哈瑞森
Owner 布鲁克科技公司
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