34 results about "Polysilicon halides" patented technology

Methods for forming metal silicate films are provided. The methods comprise contacting a substrate with alternating and sequential vapor phase pulses of a metal source chemical, a silicon source chemical and an oxidizing agent. In preferred embodiments, an alkyl amide metal compound and a silicon halide compound are used. Methods according to preferred embodiments can be used to form hafnium silicate and zirconium silicate films with substantially uniform film coverages on substrate surfaces comprising high aspect ratio features (e.g., vias and / or trenches).

A solid catalyst component useful for the (co)-polymerization of olefins is disclosed. The catalyst component is prepared by reacting an activated magnesium halide composite support with a halogenized transition metal compound and a chelating diamide compound in the presence of organo-magnesium as a promoting agent and halogenized silicon or boron compounds as an activator. The catalyst component can be used with an organo-aluminum compound to provide a solid catalyst system that is compatible with slurry and gas phase polymerization processes. Linear low density polyethylene (LLDPE) produced using the catalyst component of the present invention displays a low molecular weight distribution, improved co-monomer incorporation, low content of the low molecular weight component, and excellent morphological properties such as spherical shape and high bulk density.

A process for synthesizing a catalyst component for manufacturing ethylene polymer and co-polymer. The present invention provides a process for synthesizing catalyst component (A), comprising forming a complex by contacting the solid intermediate (B) with an aluminum compound represented by formula X3-nAl(OY)n, and alkyl metal (C), wherein X is halide, Y is a hydrocarbon group or chelating carbonyl group, and wherein 1 is less than or equal to n which is less than or equal to 3, and then contacting the complex with titanium halide having formula TiX4 wherein X is halide. Solid intermediate (B) is formed by reacting magnesium metal with alkyl halide in the presence of alkoxy aluminum represented by formula Al(ORa)3, silicon halide represented by formula SiX4 and alkoxy silane represented by formula Si(ORb)4, wherein Ra and Rb are an aromatic or aliphatic alkyl group and wherein X is halide. Alkyl metal (C) is synthesized by reacting alkyl aluminum compounds represented by formula AlRc3 with a secondary amine having formula HNRd2 and then by reacting with alkyl magnesium compounds represented by formula ReMgRf, wherein Rc, Rd, Re and Rf are an aromatic or aliphatic alkyl group. The catalyst component is suitable for producing ethylene polymer and co-polymer with narrow molecular weight distribution as well as improved branching compositional distribution.

A method of preparing a diorganodihalosilane, the method comprising the following separate and consecutive steps: (i) treating a preformed metal silicide with a mixture comprising hydrogen gas and a silicon tetrahalide at a temperature from 300 to 1400° C. to form a treated metal silicide, wherein the preformed metal silicide comprises a metal selected from at least one of Ni, Pd, or Pt; and (ii) reacting the treated metal silicide with an organohalide according to the formula RX at a temperature from 250 to 700° C. to form a diorganodihalosilane, wherein R is C1-C10 hydrocarbyl and X is halo.

A method of preparing a diorganodihalosilane comprising the separate and consecutive steps of (i) contacting a copper catalyst with a mixture comprising hydrogen gas and a silicon tetrahalide at a temperature of from 500 to 1400° C. to form a silicon-containing copper catalyst comprising at least 0.1% (w / w) of silicon, wherein the copper catalyst is selected from copper and a mixture comprising copper and at least one element selected from gold, magnesium, calcium, cesium, tin, and sulfur; and (ii) contacting the silicon-containing copper catalyst with an organohalide at a temperature of from 100 to 600° C. to form at least one diorganodihalosilane.

The invention relates to a loaded type polyolefin catalyst, a preparation method and an application, a main catalyst is composed of a carrier and a transition metal halide, a carrier is composed of a magnesium halide compound, a silicon halide compound, alcohol with carbon atoms number less than or equal to C5, and alcohol with carbon atoms number of C6-C20, wherein the mol ratio is 1: (0.1-20): (0.1-5): (0.01-10); the mol ratio of magnesium halide compound to transition metal halide is 1: (0.1-30); an organic alcohol ether compound is added during a preparation process of the main catalyst, wherein the mass ratio of the magnesium halide compound to the organic alcohol ether compound is 100: (0.1-20); and the mol ratio of the transition metal halide to cocatalyst in the main catalyst is 1:30-500. The catalyst has good particle form and uniform particle size distribution, the segmentation content of the obtained polymer through catalysis is low, the bulk density is high, and the loaded type polyolefin catalyst is suitable for an alkene slurry polymerization technology, gas phase polymerization technology or a combination polymerization technology.

Rubbery polymers made by anionic polymerization can be coupled with tin halides or silicon halides to improve the characteristics of the rubber for use in some applications, such as tire treads. In cases where the rubbery polymer was synthesized utilizing a polar modifier it is difficult to attain a high level of coupling. This invention is based upon the unexpected finding that coupling efficiency can be significantly improved by conducting the coupling reaction in the presence of a lithium salt of a saturated aliphatic alcohol, such as lithium t-amylate. This invention discloses a process for coupling a living rubbery polymer that comprises reacting the living rubbery polymer with coupling agent selected from the group consisting of tin halides and silicon halides in the presence of a lithium salt of a saturated aliphatic alcohol. The lithium salt of the saturated aliphatic alcohol can be added immediately prior to the coupling reaction or it can be present throughout the polymerization and coupling process. Lithium t-amylate reacts with water to form t-amyl alcohol during steam stripping. Since t-amyl alcohol forms an azeotrope with hexane, it co-distills with hexane and can contaminate recycle feed streams. This problem of recycle stream contamination can be solved by using metal salts of cyclic alcohols that do not co-distill with hexane or form compounds during steam stripping which co-distill with hexane. Thus, the use of metal salts of cyclic alcohols is preferred for this reason and because they are considered to be environmentally safe.

Silicon nanocrystals with chemically accessible surfaces are produced in solution in high yield. Silicon tetrahalide such as silicon tetrachloride (SiCl4) can be reduced in organic solvents, such as 1,2-dimethoxyethane(glyme), with soluble reducing agents, such as sodium naphthalenide, to give halide-terminated (e.g., chloride-terminated) silicon nanocrystals, which can then be easily functionalized with alkyl lithium, Grignard or other reagents to give easily processed silicon nanocrystals with an air and moisture stable surface. The synthesis can be used to prepare alkyl-terminated nanocrystals at ambient temperature and pressure in high yield. The two-step process allows a wide range of surface functionality.

A reactor for hydrogenation of a silicon tetrahalide and metallurgical grade silicon to trihalosilane includes a bed of metallurgical silicon particles, one or more gas entry ports, one or more solids entry ports, one or more solids drains and one or more ports for removing the trihalosilane from the reactor. Fresh surfaces are generated on the bed particles by internal grinding and abrasion as a result of entraining feed silicon particles in a silicon tetrahalide / hydrogen feed stream entering the reactor and impinging that stream on the bed of silicon particles. This has the advantages of higher yield of the trihalosilane, higher burnup rate of the MGS, removal of spent MGS as a fine dust carryover in the trihalosilane effluent leaving the reactor and longer times between shutdowns for bed removal.

Embodiments of the present disclosure generally relate to methods for trench filling of high quality epitaxial silicon-containing material without losing selectivity of growth to dielectrics such as silicon oxides and silicon nitrides. The methods include epitaxially growing a silicon-containing material within a trench formed in a dielectric layer by exposing the trench to a gas mixture comprising a halogenated silicon compound and a halogenated germanium compound. In one embodiment, the halogenated silicon compound includes chlorinated silane and halogenated germanium compound includes chlorinated germane.

A process of hydrogenation of a silicon tetrahalide and silicon to a trihalosilane comprising: providing a vessel with at least one inlet and one outlet with a plurality of silicon particles located in a bed inside the vessel and feeding a mixture of gases consisting primarily of a silicon tetrahalide and hydrogen. A calculational procedure is provided where the flow rate of the gases and the incoming size of the silicon particulates are chosen so that at least 90% of the volume of the bed is free of bubbles after allowance for decrease in particle size due to the reaction and attrition resulting in a higher yield of the trihalosilane.

A method for preparing a reaction product including an aryl-functional silane includes sequential steps (1) and (2). Step (1) is contacting, under silicon deposition conditions, (A) an ingredient including (I) a halosilane such as silicon tetrahalide and optionally (II) hydrogen (H2); and (B) a metal combination comprising copper (Cu) and at least one other metal, where the at least one other metal is selected from the group consisting of gold (Au), cobalt (Co), chromium (Cr), iron (Fe), magnesium (Mg), manganese (Mn), nickel (Ni), palladium (Pd), and silver (Ag); thereby forming a silicon alloy catalyst comprising Si, Cu and the at least one other metal. Step (2) is contacting the silicon alloy catalyst and (C) a reactant including an aryl halide under silicon etching conditions.

Embodiments of the present disclosure relate to forming a two-dimensional crystalline dichalcogenide by positioning a substrate in an annealing apparatus. The substrate includes an amorphous film of a transition metal and a chalcogenide. The film is annealed at a temperature from 500° C. to 1200° C. In response to the annealing, a two-dimensional crystalline structure is formed from the film. The two-dimensional crystalline structure is according to a formula MX2, M includes one or more of molybdenum (Mo) or tungsten (W) and X includes one or more of sulfur (S), selenium (Se), or tellurium (Te).

The invention discloses a composite hole molecular sieve and a preparation method thereof. The preparation method of the composite hole molecular sieve comprises the following steps: (1) making a molecular sieve be in contact with a reagent containing silicon tetraauragen or ammonium fluorosilicate to form a pretreatment molecular sieve; (2) making the pretreatment molecular sieve be in contact with a first alkali solution to form a primary treatment molecular sieve; (3) making the primary treatment molecular sieve be in contact with a second alkali solution, cleaning pore canals of a preparedproduct with an acid solution, and performing calcining to obtain the composite hole molecular sieve. By adopting the method, a part close to the surface of the molecular sieve can be formed into a mesoporous-microporous composite structure, and a part far away from the surface of the molecular sieve can be formed into a microporous structure.

A method for preparing a reaction product includes: steps (1) and (2). Step (1) is contacting, at a temperature from 200° C. to 1400° C., a first ingredient including a silane of formula HaRbSiX(4-a-b), where subscript a is an integer from 0 to 4, subscript b is 0 or 1, a quantity (a+b)<4, each R is independently a monovalent organic group, and each X is independently a halogen atom, with the proviso that when the quantity (a+b)<4, then the ingredient further includes H2; with a spinel catalyst including copper; thereby forming a reactant. Step (2) is contacting the reactant with a second ingredient including an organohalide at a temperature from 100° C. to 600° C.; thereby forming the reaction product and a spent reactant. The reaction product is distinct from the silane used in step (1). The method may be used to prepare diorganodihalosilanes from silicon tetrahalides.

Disclosed is a pattern formation method comprising: a first step of arranging at least one silane compound selected from the group consisting of silicon hydride compounds and silicon halide compounds in a gap formed between a substrate and a pattern-shaped mold; and a second step of applying at least one treatment selected from a heat treatment and an ultraviolet ray radiation treatment to the arranged silane compound. When the second step is carried out under an inert atmosphere or a reductive atmosphere, a pattern comprising silicon can be formed. When at least a part of the second step is carried out under an oxygen-containing atmosphere, a pattern comprising a silicon oxide can be formed.