89 results about "Beam electron" patented technology

The system uses an X-ray imaging system having an elongated lifetime. Further, the system uses an X-ray beam that lies in substantially the same path as a charged particle beam path of a particle beam cancer therapy system. The system creates an electron beam that strikes an X-ray generation source located proximate to the charged particle beam path. By generating the X-rays near the charged particle beam path, an X-ray path running collinear, in parallel with, and / or substantially in contact with the charged particle beam path is created. The system then collects X-ray images of localized body tissue region about a cancerous tumor. Since, the X-ray path is essentially the charged particle beam path, the generated image is usable for precisely target the tumor with a charged particle beam.

X-ray inspection of moving cargo based on acquiring multiple image lines at one time or substantially at one time. An X-ray source with multiple-beam electron beam targets creates multiple parallel X-ray fan beams. X-ray inspection systems and methods employ such multiple-beam sources for purposes of inspecting fast moving cargo.

A system for storing data on a magnetic medium using spin polarized electron beams is provided. The system includes a source of spin polarized electrons and a storage medium disposed a selected distance from the source. The storage medium has a plurality of storage locations, each of which includes a layer of magnetic material sandwiched between first and second layers of a half-metallic material. The resulting sandwich structure forms a spin dependent electron trap that increases coupling between beam electrons in a first spin state and target electrons in a second spin state. An electron optics system directs the source of spin polarized electrons to one of the plurality of storage locations.

The invention relates to a vacuum welding device and method, in particular to a low-voltage high-current-beam electron beam vacuum welding device and method. The low-voltage high-current-beam electron beam vacuum welding device and method are used for solving the problems that in the prior art, preparation before electron beam welding is complex and the operating cost is high. The low-voltage high-current-beam electron beam vacuum welding device comprises a hollow cathode, an anode, an accelerating electrode, an axial constraint magnetic field, a focusing mechanism, a discharging power supply, an accelerating power supply, a vacuum chamber, a welding platform and an insulating sleeve, wherein the axial constraint magnetic field, the insulating sleeve, the accelerating electrode, the focusing mechanism and the welding platform are arranged in the vacuum chamber in sequence from top to bottom, the hollow cathode is inserted into the axial constraint magnetic field, the anode is arranged between the hollow cathode and the accelerating electrode and located under the hollow cathode, a workpiece is placed on the working platform, the negative electrode of the discharging power supply is connected with the hollow cathode, the positive electrode of the discharging power supply and the negative electrode of the accelerating power supply are connected with the anode, and the accelerating power supply is connected with the accelerating electrode. The low-voltage high-current-beam electron beam vacuum welding device and method are used in the welding field.

An inductive output tube (IOT) provides improved efficiency and larger bandwidth. In one embodiment, an IOT is provided with an electron gun that generates an electron beam, a tube body, a collector for collecting the electron beam, and an extended-interaction output circuit. The electron beam travels through the tube body and the extended-interaction output circuit. The extended-interaction output circuit is located within the tube body. The extended-interaction output circuit comprises a short-circuited resonant structure. The extended-interaction output circuit is used for reducing undesired components of a radio frequency (RF) wave, increasing desired components of the RF wave, and slowing down the propagation of the RF wave. (That is the circuit increases the integral of the electric field along the path of the beam electrons while decreasing the stored energy associated with those fields.) The extended-interaction output circuit also provides the IOT with larger bandwidth operation. The collector may be a multi-stage depressed collector having voltages on the collector to result in a constant efficiency characteristic. The radio-frequency drive power to the tube is connected by means of a broadband impedance matching transformer, and the grid to cathode capacitance may be reduced by depressions in the surface of the cathode directly underneath the grid structure.

A klystron has a hollow beam electron gun that has a circular planar electron emitting surface. A hollow electron beam is directed from the electron gun through a plurality of drift tubes, resonant chambers and magnetic fields to a collector. The hollow electron beam does not experience significant radial movement and can operate at a lower beam voltage which reduces the required length of the RF interaction circuit and lowers the risks of RF arcing.

The invention belongs to an oval sheet beam electron gun, which is used with a travelling wave tube, a backward wave tube and the like. The oval sheet beam electron gun comprises a shell, an electric heating wire in the shell, a cathode component, a focusing electrode component and an anode, wherein an emitting surface of a cathode head of the cathode component is a plane, the focusing electrode component comprises a pyramidal focusing hole, and the anode is positioned at an output port of the shell and provided with an anode hole which is a cylindroid hole. The cathode head is made of lanthanum hexaboride, the emitting surface of the cathode head is modified into a plane, a pyramidal hole with a rectangular axial section is used as the focusing hole, and the cylindroid hole is used as the anode hole, so that the oval sheet beam electron gun has the advantages that the oval sheet beam electron gun is simple in structure and convenient in processing, the precision is easy to be guaranteed, devices are easy to be miniaturized, the production cost is low, current emitted by the cathode head is high in density, operation frequency of the devices and current density of electron beams can be improved effectively, the electron gun is high in output efficiency and long in service life, and the like. The defects of complex structure, low current density and unevenness of the electron beams, high evaporativity and short service life of the cathode in operation at high temperature, and the like in the prior art can be overcome.

The invention relates to a high-intensity focused ultrasound spherical phased array with array elements annually and intensively distributed, comprising a rigid spherical crown body and a plurality of array elements, wherein one array element is independently arranged in the center of the spherical crown body, and the other array elements are evenly and dispersedly distributed on a plurality of layers of concentric rings which take the center of the spherical crown body as an original point; the angular spacings among all ring layers are not equal, and the spacings among all ring layers and the spacing between adjacent array elements in the same ring are set according to an array element intensive distribution principle; the position of the original array element of each layer of concentric rings is randomly set, the other array elements are subsequently, intensively and evenly distributed on the concentric rings according to equiangular spacing, and each array element has independent electric excitation signal feeder lines which are respectively connected to a phased signal excitation system. The invention calculates the phase position and the voltage amplitude distribution of the array elements by adopting a focus model synthesis method based on a pseudo-inverse matrix theory, realizes acoustic beam electron focusing and scanning, generates required single-focus or multi-focus sound field control modes, and the like and is applied to heating and fusing target tumor focuses in the human body.

The invention relates to a porous membrane material continuous radiation grafting method and support equipment therefor, belonging to the technical field of graft copolymerization. The method comprises the following steps: a macromolecule porous membrane material with absorbed allyl monomer aqueous solution or aqueous emulsion passed through an electron beam irradiation chamber for carrying out electron beam electron beam in an expansion mode. The method features simple process, can be used to overcome the defect of discontinuous pre-irradiation and copolymerization irradiation in the prior art and is conducive to industrialized application of the radiation grafting technology. Meanwhile, according to the characteristics that the porous membrane material is porous and easy to be continuously transmitted, electron beam irradiation is directional and absorption dose is large, the invention further provides the support equipment for carrying out the porous membrane material continuous radiation grafting method; the equipment comprises an electron accelerator, an irradiation chamber connected with the electron accelerator, a coating device and a guidance device for guiding the coated macromolecule porous membrane material to pass through the irradiation chamber. The equipment features high automation degree, high pertinence and excellent application prospect.

The invention relates to the technical field of material testing, and specifically relates to a sample sealing and vacuum transferring device for cross-platform connection of an electron microscope ora micro-nano laser processing system. The device comprises a rectangular airtight flange, a vacuum sealing transferring box, a high-precision support, a clamp structure, a mechanical arm unlocking mechanism, a vacuum transition bin, an observation window and a bin door, wherein the rectangular airtight flange is used for being connected with the side wall of an electron microscope vacuum sample chamber or a laser processing system vacuum cavity; the vacuum sealing transferring box is used for packaging a test sample; the high-precision support and the clamp structure are used for achieving connection of the sample and the electron microscope or the micro-nano laser processing system; the mechanical arm unlocking mechanism is used for controlling the vacuum sealing transferring box; the vacuum transition bin is used for placing and replacing the vacuum sealing transferring box; the observation window is used for determining the opening state of the vacuum sealing transferring box; andthe bin door is used for observing opening. The sample sealing and vacuum transferring device can be widely applied to cross-platform connection and vacuum transferring of scanning electron microscopes, electron beam and ion beam double-beam electron microscopes or micro-nano laser processing systems of various types, and a systematic sample assembling, protecting, transferring and feeding deviceis formed.

Photonic integration has primarily sought to exploit optical parallelism through wavelength division multiplexing whilst in many instances “brute-force” time division multiplexing offers benefits through reduced complexity and cost. However, photoreceivers are primarily the same now for operation at 10 Gb / s, 20 Gb / s, 40 Gb / s and above as 20 or 25 years ago and exploit the same optical detection—amplification—logic processing design. However, high speed low cost electronics ca be leveraged in conjunction with optical time sampling and logic to provide a new design paradigm. An incoming XGbs−1 optical data stream is sampled and processed by N photodetectors each operating at (X / N)Gbs−1 rather than the current direct XGbs−1 front-end of the prior art. Flexibility for the designer in establishing N within optical layer constraints, electronics capabilities etc. allows for further cost—power—complexity—performance tradeoffs to be established in different systems such that high capacity TDM links can exploit direct CMOS integrated optoelectronic front-ends.

The invention discloses a double electron beam electron gun and a gyrotron. The double electron beam electron gun can produce two beams of electron beams and comprises a first anode, a first cathode and a second cathode, wherein the first cathode is under the action of a voltage between the first cathode and the first anode and generates a first electron beam, and the second cathode is under the action of a voltage between the second cathode and the first anode and generates a second electron beam. The electron gun with double cathodes not only can be applied in the field of gyrotron, but also can be applied in other fields of the microwave industry.

The invention belongs to a coaxial dual-electron beam electron gun assorted with a gyrotron (an oscillator and an amplifier), which comprises an electron gun barrel body, a base, a cathode sleeve with an electric heating wire and two electron beam emitting rings, internal and external anodes and a control anode. In the coaxial dual-electron beam electron gun, the internal and external anodes and the cathode sleeve are arranged oppositely and coaxially, the internal anode and the external anode are still arranged in an overlapping (telescopic) way, and the control anode is also arranged between the internal and external anodes and a cathode head to regulate the current of an electron beam and the rotation speed and axial speed of the electron beam in the gyrotron. Therefore, the invention has the characteristics that: output power can be regulated quickly, work efficiency of the gyrotron also can be regulated arbitrarily within the range of the peak efficiency of the gyrotron, the performance of the coaxial dual-electron beam electron gun and the application range of the gyrotron assorted with the electron gun are improved effectively, breakdown between the internal and external anodes and the cathode sleeve and between the control anode and the cathode sleeve is prevented, the coaxial dual-electron beam electron gun is favorable for the miniaturization of devices, and the like.

The invention belongs to the field of planetary science and planetary detection, and provides a method for preparing a micron-sized single-particle multi-TEM slice sample in situ. The method comprisesthe following steps: adhering and fixing a single-particle sample on a needle point in a partially suspended mode, placing the single-particle sample on a sample table of a double-beam electron microscope, installing an FIB carrying net, sealing a sample cavity and vacuumizing; depositing a Pt layer on the surface of the single-particle sample; observing the single-particle sample from an ion beam interface of the double-beam electron microscope, selecting an interested region, performing denudation cutting processing on the single-particle sample by using FIB, cutting the interested region from the single-particle sample to obtain a slice, and bonding the slice with a nano manipulator configured by the double-beam electron microscope; adhering the slice on the nanometer manipulator to anFIB carrying net to enable the slice to be vertical to the sample table, cutting off the connection between the slice and the nanometer manipulator, and thinning the slice by using the FIB to preparea TEM slice sample; and repeating the cutting and thinning operations to prepare single particle samples into a plurality of TEM sheet samples.

A color picture tube which prevents a change in convergence due to current leaked from a resistor during operation of the color picture, thus, providing a stable and satisfactory convergence characteristic in the overall region of the screen. The color picture tube comprises a main electron lens portion, a deflection yoke, and an inline electron gun that includes an electron beam generating portion for generating three electron beams in line consisting of a center beam and a pair of side beams. Distances between the center axis of the center beam passage hole and that of each of the side beam passage holes in a first electrode (G5), a second electrode (GM) and a third electrode (G6) are represented by Sg(1), Sg(2) and Sg(3). The first and second electrodes are separated by a gap L(1); and the second and third electrodes are separated by a gap L(2). The distance Sg(2) is set to satisfy the relationship:

A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron beam source configured to generate a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly, and a detector assembly configured to detect a plurality of electron signalbeams emanating from the surface of the sample to form a plurality of images, each image associated with an electron beam of the plurality of electron beams. The system includes a controller configured to receive the images from the detector assembly, compare two or more of the images to identify common noise components present in the two or more images, and remove the identified common noise components from one or more images of the plurality of images.

The invention discloses a focusing device of a large-beam electron beam shooting micro-beam spot X-ray source and an application method of the focusing device. The focusing device comprises a condenser module, a transition section module, a movable diaphragm module, an objective lens module and an electronic beam channel, wherein an electronic beam emitted from an electronic gun passes through the condenser module, and forms a parallel beam under the action of a magnetic field formed by the condenser module; after the transition section module is passed, an incident angle of a target surface electron beam is adjusted by moving a movable diaphragm and selecting a proper light-pass hole in the movable diaphragm; and the beam flow size and the beam spot size on the target plane are changed. The application of the focusing device comprises the following steps: (1) setting initial conditions and performance indexes; (2) setting parameters of the objective lens module; (3) setting the parameters of the condenser module, and realizing a parallel work mode; and (4) realizing rapid switching between electron beam flows and forming large-beam micro-beam spots on the target surface. The focusing device has the advantages that by the parallel mode, no electron beam intersection point exists; and the coulomb force effect between electrons is reduced.

A klystron has a hollow beam electron gun that has a circular planar electron emitting surface. A hollow electron beam is directed from the electron gun through a plurality of drift tubes, resonant chambers and magnetic fields to a collector. The hollow electron beam does not experience significant radial movement and can operate at a lower beam voltage which reduces the required length of the RF interaction circuit and lowers the risks of RF arcing.

The invention relates to a scanning tunneling microscope probe with the use of a two-dimensional atomic crystal material. The two-dimensional atomic crystal material is vertically fixed to the end face of a conductive rod according to an ohmic contact mode, an atomic level tip is realized by using the atomic layer thickness of the two-dimensional atomic crystal material, line scanning is obtained by using the linear beam electron emission of a two-dimensional structure, and the high conductivity of the two-dimensional atomic crystal material is used to realize weak signal acquisition. The technical realization method of the invention is simple, and high resolution imaging and rapid scanning imaging functions can be realized.

The invention discloses a radial radiating beam electronic gun suitable for radial logarithmic spiral microstrip slow-wave lines, and is an electronic gun in the technical field of vacuum electronic devices. The radial radiating beam electronic gun suitable for radial logarithmic spiral microstrip slow-wave lines ensures better synchronization with radial logarithmic spiral microstrip slow-wave lines employing planar sector electron beams for working. The radial radiating beam electronic gun comprises a gun casing, and a cathode assembly, a control electrode and an anode arranged in the gun casing, wherein the cathode head of the cathode assembly is placed in a radial hole in the control electrode. The invention is especially for a radial radiating beam electron gun cooperatively used with radial logarithmic spiral microstrip slow-wave lines.

The invention discloses a design method of a strip beam traveling wave tube slow wave structure working in a high-order mode, and relates to the technical field of microwave electronics and terahertz.The design method has the advantages that the strip beam traveling wave tube is enabled to successfully work in a high-order mode, limitation of cut-off frequency on the width of an electron channelis eliminated, the advantage of large width of strip beam electrons is brought into full play, and the power capacity of the strip beam traveling wave tube is greatly increased. Meanwhile, due to thefact that the size is enlarged, the machining and assembling difficulty is further reduced, a device can work under the large voltage, the interaction impedance is improved, and the electron beam andelectromagnetic wave transduction efficiency is improved. Compared with a traveling wave tube with a circular section electron beam in a traditional working mode, the power capacity is improved by oneorder of magnitude.

The invention belongs to a coaxial dual-electron beam electron gun matched with a gyrotron (an oscillator and an amplifier), which comprises an electron gun barrel body, a base, a cathode sleeve withan electric heating wire and two electron beam emitting rings, internal and external anodes and a control anode. In the coaxial dual-electron beam electron gun, the internal and external anodes and the cathode sleeve are arranged oppositely and coaxially, the internal anode and the external anode are still arranged in an overlapping (telescoping) manner, and the control anode is arranged between the internal and external anodes and a cathode head so as to regulate the current of an electron beam and the rotation speed and axial speed of the electron beam in the gyrotron. Therefore, the coaxialdual-electron beam electron gun has the characteristics that the output power can be regulated quickly, the work efficiency of the gyrotron can be regulated arbitrarily within the range of the peak efficiency of the gyrotron, the performance of the coaxial dual-electron beam electron gun and the application range of the gyrotron matched with the electron gun are effectively improved, breakdown between the internal and external anodes and the cathode sleeve and between the control anode and the cathode sleeve is prevented, the miniaturization of devices is facilitated, and the like.

The invention discloses a structure of a high-power strip beam electron gun with a rectangular section and relates to a vacuum electronic device technology. A cathode is a rectangular cylinder structure; a focusing electrode is a square frame-shaped structure spliced by two focusing planes with a certain inclination angles in the transverse direction; an anode is a structure with a hollow passage with a certain taper; an anode head is fixedly arranged at the center of a bottom surface inside an anode supporting barrel; the periphery of the rectangular cylinder cathode is matched with the hollow square frame at the bottom of the focusing electrode; the cathode and the focusing electrode are positioned in the anode supporting barrel; two symmetrical planes of the focusing electrode are parallel to two symmetrical planes of the anode and the central axes of the focusing electrode nd the anode are coincident; and a certain distance is formed between the focusing electrode and the anode. The electron gun disclosed by the invention has a direct current power of about 15MW, specification of 50mm*4mm of an electron beam section and compression ratio of 5:1 in the narrow edge direction and has excellent fluidity of an beam inner layer at the position of a beam waist. The generation problem of a strip electron beam is solved. The high-power strip beam electron gun with the rectangular section can be used in a high-power strip beam device and can be matched with a focusing system to realize long-distance stable transmission.

The invention discloses a preparation method of an in-situ electrical TEM sample. The method comprises the following steps: connecting an electrode material and a solid electrolyte by using a magnetron sputtering method, then placing the electrode / electrolyte material in a focused ion beam-electron beam double-beam electron microscope, depositing a protective layer on the surface, etching, cuttingoff and extracting a TEM sheet. A circulating electrode of the in-situ heating chip, the in-situ heating chip is refitted into a double-electrode power-up chip, the double-electrode power-up chip isconnected with the TEM sheet, the double-electrode power-up chip is bidirectionally shearing until the thickness is about 200nm, and an amorphous layer is removed until the thickness of the amorphouslayer is below 100nm to obtain thein-situ electrical TEM sample. According to the invention, scanning electron microscopy is combined with in-situ transmission electron microscopy,and dynamic observation of charge distribution of an electrode / electrolyte interface or an electrode internal interface on working conditions and a microcosmic scale is achieved. The preparation process is simple, and the universality is high.

Multiple electron beamlets are split from a single electron beam. The electron beam passes through an acceleration tube, a beam-limiting aperture, an anode disposed between an electron beam source and the acceleration tube, a focusing lens downstream from the beam-limiting aperture, and a micro aperture array downstream from the acceleration tube. The micro aperture array generates beamlets from the electron beam. The electron beam can be focused from a divergent illumination beam into a telecentric illumination beam.

Axially symmetric magnetic fields are provided about the longitudinal axis of each beam of a multi-beam electron beam device. The magnetic field symmetry is independent of beam voltage, beam current and applied magnetic field strength. A flux equalizer assembly is disposed between the cathodes and the anodes and near the cathodes of a multi-beam electron beam device. The assembly includes a ferromagnetic flux plate completely contained within the magnetic focusing circuit of the device. The flux plate includes apertures for each beam of the multi-beam device. A flux equalization gap or gaps are disposed in the flux plate to provide a perturbation in the magnetic field in the flux plate which counters the asymmetry induced by the off-axis position of the beam. The gaps may be implemented in a number of ways all of which have the effect of producing a locally continuously varying reluctance that locally counters the magnetic field asymmetry. The flux equalizer assembly prevents or substantially reduces beam twist and maintains all of the electron beams of the device as linear beams.

A multiple-electron-beam-image acquisition apparatus includes an electromagnetic lens to receive and refract multiple electron beams, an aberration corrector, disposed in a magnetic field of the electromagnetic lens, to correct aberration of the multiple electron beams, an aperture-substrate, disposed movably at the upstream of the aberration corrector with respect to an advancing direction of the multiple electron beams, to selectively make an individual beam of the multiple electron beams pass therethrough independently, a movable stage to dispose thereon the aberration corrector, a stage control circuit, using an image caused by the individual beam selectively made to pass, to move the stage to align the position of the aberration corrector to the multiple electron beams having been relatively aligned with the electromagnetic lens, and a detector to detect multiple secondary electron beams emitted because the target object surface is irradiated with multiple electron beams having passed through the aberration corrector.

The invention belongs to a coaxial double electron beam electron gun matched with a gyrotron (an oscillator and an amplifier), an electron gun barrel body, a base, a cathode sleeve with a heating wireand two electron beam emission rings, inner and outer anodes and a control anode. The inner anode, the outer anode and the cathode sleeve are oppositely arranged by employing a coaxial line, the inner anode and the outer anode are arranged in a stack mode, and the control anode is arranged among the inner and outer anodes and the cathode sleeve to regulate the size of an electron beam current andthe rotation speed and the axial speed of the electron beam in the gyrotron. The coaxial double electron beam electron gun can rapidly regulate the output power and can perform any regulation for theworking efficiency of the gyrotron in the highest efficiency range to effectively improve the performances of the coaxial double electron beam electron gun and the application range of the gyrotron matched with the coaxial double electron beam electron gun; and moreover, breakdown cannot be generated between the inner and outer anodes and the cathode sleeve and between the control anode and the cathode sleeve to facilitate the miniaturization of the device.