A film
bulk acoustic wave resonator comprises a bottom
electrode layer, a piezoelectric layer and a top
electrode layer which are arranged on the upper portion of a substrate where an
acoustic wave reflection structure is located, and the portion, corresponding to the boundary of the
acoustic wave reflection structure, of the piezoelectric layer is subjected to
depolarization treatment to form a
depolarization part. The invention further discloses a manufacturing process of the film bulk acoustic
resonator. The manufacturing process comprises the following steps: manufacturing the bottom
electrode layer on the substrate on which the
acoustic reflection structure is formed or to be formed so as to cover the
acoustic reflection structure; manufacturing a piezoelectric layer on the bottom electrode layer; carrying out
depolarization processing on the part, corresponding to the boundary of the
sound wave reflection structure, of the piezoelectric layer to form a depolarization part; and manufacturing a top electrode layer on the piezoelectric layer. According to the film bulk acoustic
resonator and the manufacturing process thereof, transverse
waves can be prevented from taking away energy from a
resonance region at the upper part of the cavity of the resonator, so that the
mechanical vibration strength of the
resonance region is ensured,
parasitic oscillation is inhibited, and theQ value of the resonator is improved.