The present invention provides a method for manufacturing an
AMOLED display device and a structure thereof. The method for manufacturing the
AMOLED display device includes, before formation of a gate
electrode (3), first depositing and subjecting an inorganic film a
plasma bombardment treatment to form a gate reflection prevention layer (2) and, before formation of source / drain electrodes (71) and a data line (72), first depositing and subjecting an inorganic film to a
plasma bombardment treatment to form an
etching stop and source / drain reflection prevention layer (6), so as to provide the
AMOLED display device with an excellent effect of preventing reflection of external surrounding light, increase display brightness of the AMOLED display device, extend the lifespan of the AMOLED display device, and reduce the thickness and manufacturing cost of the AMOLED display device. The structure of the AMOLED display device includes a gate
metal reflection prevention layer (2) and an
etching stop and source / drain reflection prevention layer (6) so as to achieve an excellent effect of preventing reflection of external surrounding light, increased display brightness, extended lifespan, a reduced thickness, and a lowered manufacturing cost.