1792results about "Chemical paints/ink removers" patented technology

The present invention relates to compositions and their use for removing coatings from a substrate. The present invention is directed to a composition comprising (a) surfactants, (b) a sequestrant, and (c) a plasticizer / solvent. The composition may also contain (d) a hydrolyzing agent, e.g., a strong base compound and other additives. The composition of the present invention is free of chlorinated solvents, environmentally safe and user-friendly. In one embodiment, the composition further comprises a hydrolyzing agent present in an amount sufficient to reduce at least one of mechanical strength and adhesion between the coating and the substrate. Another embodiment of the invention is a method for removing paint or a coating from a substrate comprising applying a paint or coating removing effective amount of a composition comprising the compositions described herein to the substrate. Yet another embodiment of the invention is a method for cleaning a substrate comprising applying a cleaning effective amount of the composition of the present invention to the substrate. In one particular embodiment of the present invention, an immersion method for the removal of cured and uncured paint and coatings from ferrous metals is provided.

A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating agent is preferred to be included since it provides added stability and activity to the cleaning composition so that the composition has long term effectiveness. If a chelating agent is not present, the composition, while providing for adequate stripping and cleaning upon initial use of the composition following mixing, has only short term stability. In this latter instance, the nucleophilic amine compound and organic solvent components of the composition preferably are maintained separate from each other until it is desired to use the composition. Thereafter, the components are combined. Following use of the composition, the non-used portion of the composition can be disposed of or be reactivated by the addition of a chelating agent.

A solvent that is biodegradable, provides effective solvency for a broad range of tasks and is generally benign to human health is disclosed. This solvent is a mixture of a lactate ester and an edible oil ester that has a closed cup flash point at or above 59° C., and can include other non-halogenated solvents and surfactants.

A reworkable conductive adhesive composition, and method of making such, comprising an epoxy based conductive adhesive containing conductive metal filler particles dispersed in a solvent-free hybrid epoxy polymer matrix. In an additional embodiment an improved method of removing cured conductive polymer adhesives, disclosed here as thermal interface materials, from electronic components for reclamation or recovery of usable parts of module assemblies, particularly high cost semiconductor devices, heat sinks and other module components.

Compositions of the invention include: a surfactant having an HLB value from 1 to 10; and a compound of formula (I): where; x is an integer from 2 to 6, y is an integer from 0 to 5, R is a bond or (C1-C4)alkylene, R1 is a hydrogen, halo, aryl, (C1-C4)alkyl, heteroaryl, cycloalkyl, or heterocycyl, R2 is independently selected from hydrogen, halo, (C1-C4)alkyl, (C1-C4)alkoxy, (C2-C4) alkenylene. Methods forming stable aqueous and non-aqueous solutions of the same are also provided.

This invention concerns a composition useful as a paint remover, comprising: an organic carbonate, an alcohol, an activator, hydrogen peroxide, and water. The alcohol may be benzyl alcohol. The organic carbonate may be propylene carbonate, ethylene carbonate, or combination thereof. The activator may be an alkyl-substituted cycloalkane (naphthene), a soy oil, an alkyl soyate, or combination thereof.

A remover composition and method for removing resists from substrates containing nucleophilic amine and at least one solvent is described. Optionally, a chelating agent can also be included in the remover composition. The remover composition is especially suitable for removing a variety of resists from substrates at different stages in the process of manufacturing integrated circuits.

The invention is a combination of at least one dense phase fluid and at least one dense phase fluid modifier which can be used to contact substrates for electronic parts such as semiconductor wafers or chips to remove photoresist materials which are applied to the substrates during manufacture of the electronic parts. The dense phase fluid modifier is one selected from the group of cyclic, aliphatic or alicyclic compounds having the functional group:wherein Y is a carbon, oxygen, nitrogen, phosphorus or sulfur atom or a hydrocarbon group having from 1 to 10 carbon atoms, a halogen or halogenated hydrocarbon group having from 1 to 10 carbon atoms, silicon or a fluorinated silicon group; and wherein R1 and R2 can be the same or different substituents; and wherein, as in the case where X is nitrogen, R1 or R2 may not be present. The invention compositions generally are applied to the substrates in a pulsed fashion in order to remove the hard baked photoresist material remaining on the surface of the substrate after removal of soft baked photoresist material and etching of the barrier layer.

A reworkable conductive adhesive composition, comprising an epoxy based conductive adhesive containing conductive metal filler particles dispersed in a solvent-free hybrid epoxy polymer matrix.

The present invention is directed to resist and etching residue removing compositions containing at least one nucleophilic amine compound possessing reduction and oxidation potentials, a two-carbon atom linkage alkanolamine compound, and optionally water and / or one or more corrosion inhibitors. The compositions may be substantially free of hydroxylamine, polar organic solvents, water, corrosion inhibitors, or a combination thereof. The compositions are useful in processes for removing resists and etching residue from metal or metal alloy substrates or substrate layers used in micro-circuitry fabrication.

This invention concerns a composition useful as a paint remover, comprising: an organic carbonate, an alcohol, an activator, hydrogen peroxide, and water. The alcohol may be benzyl alcohol. The organic carbonate may be propylene carbonate, ethylene carbonate, or combination thereof. The activator may be an alkyl-substituted cycloalkane (naphthene), a soy oil, an alkyl soyate, or combination thereof.

An oil-in-water emulsion composition remover is disclosed. The compositions comprise a solvent, water and a surfactant. The removers are useful in removing non-aqueous and aqueous coatings, waxes, greases, and the like, from substrates to which the coatings, waxes, greases, and the like, have been applied.

A composition useful as a paint remover which may include a carbonate, a dibasic ester and a mono-ester. The paint stripping composition may also contain an organic sulfur-containing compound such as dimethyl sulfoxide (DMSO), a glycol ether, a ketone, or combination thereof. The composition may be used in a process for removing paint by applying it to a painted surface. A degreasing composition is also disclosed which may comprise a carbonate and a alkyl-substituted cyclo-alkane such as naphthene. The compositions have several important attributes, including low toxicity and high efficacy in removing paint and coatings.