1565results about "Non-surface-active detergent solvents" patented technology

Water-soluble solvent compositions, including from about 10% to about 60% by weight of an aromatic ester; from about 30% to about 60% by weight of an aliphatic ester; from 0% to about 15% by weight of a co-solvent; from 0% to about 20% of one of a cyclic terpene and a terpenoid; from 0% to about 1% by weight of an odor-masking agent; and from 0% to about 20% by weight of a nonionic surfactant, for removing petroleum residue from a substrate, and methods of use thereof. The composition can further comprise water. The composition also can comprise an aqueous solution. The method for removing petroleum residue from a substrate can further comprise recycling the solvent composition by using a countercurrent separation column charged with compressed ammonia and / or carbon dioxide and a spinning band distillation column to separate the solvent composition from the petroleum residue.

Compositions and methods based on the use of fluoroalkene containing from 3 to 4 carbon atoms and at least one carbon-carbon double bond, such as HFO-1214, HFO-HFO-1233, or HFO-1354, having properties highly beneficial in solvent cleaning applications.

The present invention relates to two solvent antimicrobial compositions and methods employing these two solvent compositions. The two solvent compositions typically contain a second solvent that is not or is only sparingly soluble in a diluting solvent. The two solvent composition can form a clear single-phase solution. The two solvent antimicrobial compositions can reduce the population of microbes on various surfaces such as facilities, containers, or equipment found in food, beverage, or pharmaceutical industries at temperatures between about −70° C. to about 100° C.

The present invention relates to the use of absorbent materials for separating water from an emulsion comprising water and lipophilic fluid. The methods, systems, and compositions of the present invention expose the emulsion to absorbent materials such that water is absorbed out of the emulsion in order to facilitate the recovery of the lipophilic fluid.

The cleaning composition for removing resists includes a salt of hydrofluoric acid and a base not containing a metal (A component), a water-soluble organic solvent (B1 component), at least one organic acid or inorganic acid (C component), water (D component), and, optionally, an ammonium salt (E1 component), and having a pH 4-8. Thus, in manufacturing a semiconductor device, such as a copper interconnecting process, efficiency of removing resist residue and other etching residue after etching or ashing is improved, and corrosion resistance of a copper and an insulating film is also improved.

The present invention relates to an apparatus for treating, refreshing or cleaning fabric articles, especially articles of clothing, linen and drapery.

The present invention is directed to encapsulated fragrance materials. The fragrance materials are comprised of high Clog P materials or high Clog P fragrance materials along with high Clog P solvent materials. The encapsulated fragrance and solvent materials can then be further coated with a second coating, preferably a cationic coating. The selective use of solvents enables the fragrance and fragrance materials to remain in the capsules for extended periods of time without leaching from the capsule. The leaching of the flavor or fragrance materials is a problem especially in products that contain a high loading of surfactant or emulsifying materials such as laundry and oral care products.

The present invention relates to disinfecting wipes or pads that can be use to treat or clean glass or other glossy surfaces. The disinfecting wipes or pads do not depend upon quaternary ammonium compounds for disinfection, but instead depend upon relatively low solvent levels and basic pH or relatively high levels of sodium hydroxide or potassium hydroxide.

The use of pentafluoropropene (HFO-1225) and tetrafluoropropene (HFO-1234) in refrigeration equipment is disclosed. These materials are generally useful as refrigerants for heating and cooling, as blowing agents, as aerosol propellants, as solvent composition, and as fire extinguishing and suppressing agents.

A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating agent is preferred to be included since it provides added stability and activity to the cleaning composition so that the composition has long term effectiveness. If a chelating agent is not present, the composition, while providing for adequate stripping and cleaning upon initial use of the composition following mixing, has only short term stability. In this latter instance, the nucleophilic amine compound and organic solvent components of the composition preferably are maintained separate from each other until it is desired to use the composition. Thereafter, the components are combined. Following use of the composition, the non-used portion of the composition can be disposed of or be reactivated by the addition of a chelating agent.

A semiconductor wafer cleaning formulation, including 1-35% wt. fluoride source, 20-60% wt. organic amine(s), 0.1-40% wt. nitrogenous component, e.g., a nitrogen-containing carboxylic acid or an imine, 20-50% wt. water, and 0-21% wt. metal chelating agent(s). The formulations are useful to remove residue from wafers following a resist plasma ashing step, such as inorganic residue from semiconductor wafers containing delicate copper interconnecting structures.

A skin cleansing composition suitable for removing ink and other stains from the hands and arms of a user includes an effective amount of a low molecular weight alcohol having from one to twelve carbon atoms and an effective amount of a peroxide releasing agent, e.g., a percarbonate salt, preferably sodium percarbonate, such that together, the alcohol and percarbonate salt provide a synergistic reaction that effectively removes ink from the skin of the user. Other additives such as fillers, abrasives, and detergents may be employed to provide further cleansing action.

Disclosed is a method for removing residue from a surface comprising: contacting the surface with a composition comprising at least one unsaturated fluorinated hydrocarbon selected from the group consisting of compounds having the formula E- or Z-R1CH═CHR2, wherein R1 and R2 are, independently, C1 to C6 perfluoroalkyl groups, or C1 to C6 hydrofluoroalkyl groups, and recovering the surface from the composition.

A solvent that is biodegradable, provides effective solvency for a broad range of tasks and is generally benign to human health is disclosed. This solvent is a mixture of a lactate ester and an edible oil ester that has a closed cup flash point at or above 59° C., and can include other non-halogenated solvents and surfactants.

This invention relates to cleaning compositions comprising unsaturated fluorinated hydrocarbons. The invention further relates to use of said cleaning compositions in methods to clean, degrease, deflux, dewater, and deposit fluorolubricant. The invention further relates to novel unsaturated fluorinated hydrocarbons and their use as cleaning compositions and in the methods listed above.

Disclosed herein are blowing agents comprising fluorocarbons and / or hydrofluorocarbons useful in foamable compositions. Also disclosed are methods for forming a foam comprising the aforementioned blowing agents.

The present invention relates to an aqueous cleaning composition used to remove unwanted organic and inorganic residues and contaminants from a substrate such as, for example, a semiconductor substrate. The cleaning composition comprises from about 0.01% to about 40% by weight of a salt selected from a guanidinium salt, an acetamidinium salt, a formamidinium salt, and mixtures thereof; water; and optionally a water soluble organic solvent. Compositions according to the present invention are free of an oxidizer and abrasive particles and are capable of removing residues from a substrate and, particularly, a substrate having silicon-containing BARC and / or photoresist residue.