A double-workpiece-table same-
phase rotation exchange method and a device based on follow-up rotation-resisting mechanisms belong to technology of
semiconductor manufacturing equipment. The device comprises two workpiece tables, a rotation transfer table and two follow-up rotation-resisting mechanisms, the rotation transfer table captures and clamps the two workpiece tables to rotate around a
base station center in a rotation exchange process of the two workpiece tables, exchange of an
exposure work position and a pretreatment work position is achieved, and the follow-up rotation-resisting mechanisms control autoroatation of the two workpiece tables so that same phase position of the two workpiece tables is guaranteed in a table exchange process. The double-workpiece-table same-
phase rotation exchange method and the device solve the problem that the existing linear table exchange scheme has plenty of table exchange beat and large
impact torque, the existing rotation table exchange scheme is reverse in phases of sensors and marking plates of two workpiece table and twining in cables, targets of a
laser interferometer lose, and the like. The double-workpiece-table same-
phase rotation exchange method and the device adopt a small
mass balance
system, are favorable to shortening balance time, simultaneously simplify a
system, lower cost, reduce table exchange beat, shorten table
exchange time, and effectively improve productivity of
lithography machines.