The invention discloses a
storage cell, a formation method of the
storage cell and a reading method of the
storage cell. The formation method of the storage
cell comprises the steps that a
semiconductor substrate is provided, wherein the
semiconductor substrate comprises a first bit area and a second bit area, and a first
dielectric layer, a floating gate material layer and a second
dielectric layer are formed on the surface of the
semiconductor substrate; a first
doping area is formed in the first bit area; a second
doping area is formed in the second bit area, wherein the dosage concentration of the second
doping area is smaller than that of the first doping area; the second
dielectric layer is etched to form an opening; a side wall is formed on the surface of the side wall of the opening; the floating gate material layer and the first
dielectric layer are etched with the side wall as a
mask to the surface of the semiconductor substrate; a source line is formed in the opening; the second
dielectric layer and the floating gate material layer and the first
dielectric layer below the second dielectric layer are removed, and a floating gate and a floating
gate dielectric layer below the side wall are formed; a tunneling dielectric layer is formed; a word line located on the surface of the tunneling dielectric layer is formed; a first drain area and a second drain area are formed. The formation method of the storage
cell can lower the cost of a storage.