39results about How to "Improve manufacturing capacity" patented technology

A dual pattern shim assembly, for use in conjunction with hot melt adhesive dispensing systems, permits various different overlapping or overlying deposition or application patterns, having different length dimensions, different width dimensions, different coating thicknesses, and different longitudinal positional locations or dispositions with respect to each other, to be achieved during a single pass of the underlying substrate with respect to the hot melt adhesive contact die applicator or head. In this manner, different or multiple adhesive deposition or application procedures are able to effectively be accomplished simultaneously so as to effectively simplify and shorten the overall assembly lines and production times required for the fabrication or manufacture of various different particular products.

The invention contemplates a system and method offering control and management of manufacturing resources (Machine 1, Machine 2 . . . Machine n) to obtain optimal manufacturing capacities and to avoid manufacturing down-time currently realized through manual operation and control of manufacturing resources. In an illustrative implementation, the present invention contemplates an exemplary control computing application (180) operating in a computing environment (100) which communicates with, cooperates with, and provides control over at least one manufacturing resource (e.g. manufacturing machine—Machine 1, Machine 2, . . . Machine n). The computing application (180) provides at least one instruction set (110′) for use in controlling the manufacturing resource. The communication of the instruction set may be realized local to the manufacturing resource, remotely from the manufacturing resource, or some combination thereof.

The invention relates to a pass-over roller assembly, coating equipment and rolling equipment. The pass-over roller assembly comprises a threaded roller, a first adjusting roller and a second adjusting roller, wherein the threaded roller comprises an alloy roller and fillers; the surface of the alloy roller is provided with threaded grooves; the threaded grooves are symmetrically and continuouslydistributed in the direction from the center of the alloy roller to the two ends of the alloy roller; the fillers are embedded in the threaded grooves; the surfaces of the fillers are flush with the surface of the alloy roller; the friction coefficients of the surfaces of the fillers are larger than the friction coefficient of the surface of the alloy roller; and the first adjusting roller and thesecond adjusting roller are located on the two opposite sides of the threaded roller respectively and used for adjusting the wrap angle alpha between the threaded roller and a sheet-shaped roller passing object. According to the pass-over roller assembly, the coating equipment and the rolling equipment provided by the invention, when the sheet-shaped roller passing object is arranged on the threaded roller in a penetrating and wrapping mode, the threaded roller can apply continuous and stable transverse tension to the sheet-shaped roller passing object, the transverse tension extends from thecenter of the threaded roller to the two ends, and then transverse wrinkles in the width direction of the sheet-shaped roller passing object can be flattened.

The invention discloses a manufacturing method of a CMOS thin film transistor and a manufacturing method of an LTPS array substrate; manufacturing method of the CMOS thin film transistor comprises thefollowing steps of providing a substrate, and sequentially forming an active layer, a gate layer and a photoresist layer on the substrate, wherein the active layer comprises a first region, a secondregion and a third region; patterning the photoresist layer by using a photomask, so that the second region is not covered by the photoresist layer, and the first region and the third region are covered by the remaining photoresist; performing first-degree doping on the second region; removing residual photoresist; and carrying out second-degree doping on the first region. By means of the mode, the number of the photo masks in the manufacturing process can be reduced, the manufacturing period is shortened, and the manufacturing cost is lowered.

The invention provides a colorful filter array substrate applied to a semi-penetration and semi-reflection type wide-view angle LCD, comprising a transparent substrate and a plurality of sub-pixels, wherein each of the sub-pixels respectively comprises a reflecting region, a penetrating region, a colorful filter layer with at least one groove, and a transparent pole. The invention realizes a wide-view angle technology of a semi-penetration and semi-reflection type LCD by utilizing the groove on the colorful filter layer so as to simplify the structure, shorten the manufacturing process and effectively improve the production capacity of liquid crystal display panels.