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16512 results about "Engineering physics" patented technology

Engineering physics or engineering science refers to the study of the combined disciplines of physics, mathematics and engineering, particularly computer, nuclear, electrical, electronic, materials or mechanical engineering. By focusing on the scientific method as a rigorous basis, it seeks ways to apply, design, and develop new solutions in engineering.

Barrier first method for single damascene trench applications

Methods for forming a diffusion barrier on low aspect features of an integrated circuit include at least three operations. The first operation deposits a barrier material and simultaneously etches a portion of an underlying metal at the bottoms of recessed features of the integrated circuit. The second operation deposits barrier material to provide some minimal coverage over the bottoms of the recessed features. The third operation deposits a metal conductive layer. Controlled etching is used to selectively remove barrier material from the bottom of the recessed features, either completely or partially, thus reducing the resistance of subsequently formed metal interconnects.
Owner:NOVELLUS SYSTEMS

Method and device for protecting micro electromechanical systems structures during dicing of a wafer

InactiveUS20020076848A1Prevent electrostatically induced damageAvoid damageDecorative surface effectsSolid-state devicesSystem structureEngineering
A wafer cap protects micro electromechanical system ("MEMS") structures during a dicing of a MEMS wafer to produce individual MEMS dies. A MEMS wafer is prepared having a plurality of MEMS structure sites thereon. Upon the MEMS wafer, the wafer cap is mounted to produce a laminated MEMS wafer. The wafer cap is recessed in areas corresponding to locations of the MEMS structure sites on the MEMS wafer. The capped MEMS wafer can be diced into a plurality of MEMS dies without causing damage to or contaminating the MEMS die.
Owner:ANALOG DEVICES INC

Method of forming ultra thin chips of power devices

A method for making thin semiconductor devices is disclosed. Starting from wafer with pre-fabricated front-side devices, the method includes:Thinning wafer central portion from its back-side to produce a thin region while preserving original wafer thickness in the wafer periphery for structural strength.Forming ohmic contact at wafer back-side.Separating and collecting pre-fabricated devices. This further includes:Releasably bonding wafer back-side onto single-sided dicing tape, in turn supported by a dicing frame. Providing a backing plate to match the thinned out wafer central portion. Sandwiching the dicing tape between wafer and backing plate then pressing the dicing tape to bond with the wafer.With a step-profiled chuck to support wafer back-side, the pre-fabricated devices are separated from each other and from the wafer periphery in one dicing operation with dicing depth slightly thicker than the wafer central portion. The separated thin semiconductor devices are then picked up and collected.
Owner:ALPHA & OMEGA SEMICON LTD

Wafer-level fabrication of lidded chips with electrodeposited dielectric coating

A method is provided for fabricating a unit including a semiconductor element such as a sensor unit, e.g., for optical imaging. A semiconductor element has plurality of conductive features exposed at the front surface and semiconductive or conductive material exposed at at least one of the front and rear surfaces. At least some of the conductive features are insulated from the exposed semiconductive or conductive material. By electrodeposition, an insulative layer is formed to overlie the at least one of exposed semiconductive material or conductive material. Subsequently, a plurality of conductive contacts and a plurality of conductive traces are formed overlying the electrodeposited insulative layer, the conductive traces connecting the conductive features to the conductive contacts on the rear surface. The unit can be incorporated in a camera module having an optical element in registration with an imaging area of the semiconductor element.
Owner:INVENSAS CORP +1
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