The invention provides an insulating ring, a pre-cleaning chamber and
semiconductor processing equipment. The insulating ring is applied to the pre-cleaning chamber. A base is arranged in the pre-cleaning chamber; the base comprises a first
bearing surface for bearing the center area of the lower surface of a
wafer; the insulating ring is arranged on the base and surrounds the edge of the first
bearing surface; the insulating ring comprises a ring-shaped body, the ring-shaped body is provided with a second
bearing surface and a ring-shaped boss, the second bearing surface and the edge area of the lower surface of the
wafer are arranged oppositely, the ring-shaped boss surrounds the edge of the second bearing surface, and the upper surface of the ring-shaped boss is higher than that of the
wafer. According to the insulating ring provided in the invention, the
etching rate of the edge area of the wafer can be reduced, the difference between the
etching rate of the edge area of the wafer and the
etching rate of the center area of the wafer can be reduced, and the etching uniformity can be further improved.