79results about How to "Avoid shadow effect" patented technology

A method for the three-dimensional imaging of a sample in which image information from different depth planes of the sample is stored in a spatially resolved manner, and the three-dimensional image of the sample is subsequently reconstructed from this stored image information is provided. A reference structure is applied to the illumination light, at least one fluorescing reference object is positioned next to or in the sample, images of the reference structure of the illumination light, of the reference object are recorded from at least one detection direction and evaluated. The light sheet is brought into an optimal position based on the results and image information of the reference object and of the sample from a plurality of detection directions is stored. Transformation operators are obtained on the basis of the stored image information and the reconstruction of the three-dimensional image of the is based on these transformation operators.

The invention provides a mask and a preparation method and application of the mask. The mask which is made from an Invar material and cannot control the etching precision easily is replaced by a flexible thin film with the opening precision controlled by laser etching, so that the preparation precision of a fine metal mask (FMM) is improved and the opening ratio of the screen body is increased. The invention provides two preparation schemes. In the first embodiment, the fine mask is fully made from a high-strength magnetic flexible material, the mask and a base plate are fully attached through magnetic attraction, and the mask does not need to be fixed on a stainless steel frame. In the second embodiment, the opening degree of the mask made from the Invar material is increased, the opening area is filled with a flexible material, and small holes are etched in the flexible material by using a laser etching method, so that the precision of the FMM is improved.

The invention discloses an improved constant false alarm rate detecting method for a ship-borne linear frequency modulation continuous wave radar and belongs to the field of signal processing. The method includes: the maximum value of each Doppler channel energy after Doppler treatment of each distance unit is used as the input of a two-dimensional reference window; judgment is performed twice, targets and backgrounds are preliminarily distinguished through the first judgment, and before the second judgment, the units judged as the targets by the first judgment are removed during energy average value calculation of the distance units. Compared with traditional CA_CFAR, the method has the advantages that the defect of mutual shielding of adjacent targets is overcome, the advantage of low calculation complexity of the traditional CA_CFAR is kept, and both detection performance and software-hardware implementation cost are considered.

The invention discloses a method for measuring the tooth profile deviation of a cylindrical gear based on linear structured light. According to the method, firstly a three-dimensional nominal mathematical model of the tooth surface of a measured gear is built; the structured light is formed by a series of equally spaced light spots, and the operation is performed based on characteristics of the structured light and within an effective value range of the structured light; a mathematical model of a gear tooth profile deviation item is built; and finally high-precision measurement for the tooth profile total deviation, the tooth profile slope deviation and the tooth profile shape deviation of the cylindrical gear is realized. According to the invention, detection for each tooth of the cylindrical gear in a complex environment can be realized, the measurement speed is high, and the efficiency is high; the method can adapt to detection for various types of cylindrical gears and does not have problems such as measuring head abrasion and radius compensation; the measurement accuracy can be improved through big data, the repeatability is good, and a shadow effect in gear detection is avoided. Tooth profile error calculation can be performed on all measured data transformed into a gear coordinate system, and the method is high in calculation speed.

This invention provides a 3D laser capture system, and method for employing the same, that avoids a shadow effect and allows for straightforward set-up and use of the system in imaging the surface profile of an object. A camera is provided with a head assembly that includes a lens configuration and a pair of mirrors that generate two simultaneous views, of opposite object sides. The two views are projected by the mirrors and lens configuration onto discrete portions of the camera's image sensor. The separate images captured on each of the two portions of the sensor are both analyzed by the systems vision system processor, thereby allowing the processor's profiling algorithm to analyze the surface from two different viewing angles concurrently. Portions of the laser blocked in one view are generally visible in the other view. Alternatively, a second lens can be employed to provide a second field of view.

A coating apparatus is revealed that is designed to coat substrates by means of a physical vacuum deposition process or a chemical vacuum deposition process or a combination thereof. Said coating apparatus is particular in that it uses a rotatable magnetron (14) that is coverable with an axially moveable shutter (18). Such an arrangement enables to keep the magnetron target clean or to clean the target in between or even during subsequent coating steps. The shutter further provides for a controllable gas atmosphere in the vicinity of the target. The arrangement wherein the magnetron is centrally placed is described. Substrates are then exposed to the sputtering source from all angles by hanging them on a planetary carousel (24) that turns around the magnetron.

Process and apparatus for joining components, in particular plastic components, by laser beams using a transmission welding process. To ensure that the laser beams are simultaneously introduced into the region of the joint seam even in the case of relatively large components, a clamping element is provided. The clamping element includes devices for diverting the laser beam onto the joint seam. In addition, there is a clamping part which is matched to the shape of the components and is transparent to the laser beam, by which clamping part the components are pressed together and the laser beam is introduced into the region of the joint seam. This allows a scanner process to be used without restriction for all possible components in particular in the case of simultaneous welding. The process can also be used to solder connections for electronic components.

The invention discloses a high-frequency ocean radar target detection method based on a compact antenna array. A receiving antenna of a high-frequency ocean radar is an compact antenna array which consists of two identical monopole cross looped antennas. In the same time period, two groups of coherent radar echoes can be received. The radar echoes respectively comprise a target, sea clutter, zero frequency clutter and noise. The method can achieve the high-efficiency detection and extraction of a target through three steps: sequentially carrying out the PCA and extraction, wavelet filtering and adaptive threshold detection of the two groups of radar echoes. The method is advantageous in that the method can greatly improve the SNR (signal to noise ratio) and SCR (signal to clutter ratio) of the target; the method can achieve the better inhibition of the continuous clutter, such as the sea clutter and zero frequency clutter; and the method has better detection performances in a multi-target occasion.

The invention provides a copper nanowire / copper film composite structure and a preparation method thereof, and aims to provide a copper nanowire / copper film composite structure and a magnetron sputtering preparation method thereof. The invention employs a small deposition angle direct current magnetron sputtering deposition technology and prepares a copper nanowire / copper film composite structure on a glass substrate by proper adjusting of film thickness, substrate temperature and substrate bias voltage. The copper nanowire / copper film composite structure provided by the invention has smooth copper nanowire surface, uniform radial thickness, a length of 0.1-5mm, a diameter of 100-500nm and a copper film thickness of 50-100nm. The copper nanowire is parallel to the copper film surface and embedded in the copper film with a thickness less than that of the copper nanowire. According to the invention, metal copper film surface is embedded with sub-wavelength copper nanowire, which has potential application prospect infields related to surface plasma.

A track assembly for supporting fabric on a surface includes a base track defining a first half of a hinge and a first half of a snapping clamp. The base track preferably includes a tension force dissipater extending from the first half of the hinge. An upper track defines a second half of the hinge and is pivotally connectable to the base track. The upper track defines a second half of the snapping clamp for releasably engaging the fabric. The upper track includes a strut extended downwardly towards the base track such that when high tension forces are applied to the upper track, due to fabric tensioning, the strut contacts the base track and at least partially transmits the tension forces to the surface.

The invention discloses a mask for the reflection type photolithography technology and a manufacture method and a using method of the mask. The method for manufacturing the mask for the reflection type photolithography technology comprises the following steps: providing a substrate; forming multiple reflecting layers on the substrate; forming protecting layers on the multiple reflecting layers; forming opening patterns exposing one part of each reflecting layer in the protecting layers; carrying out interface roughing process on the multiple reflecting layers and enabling the exposure parts of the multiple reflecting layers to form light absorption areas and enabling the non-exposed parts of the multiple reflecting layers to form light reflection areas, wherein the interface roughing process is used for roughing the interfaces of adjacent reflecting layers; and removing the protecting layer. According to the mask for the reflection type photolithography technology, manufactured by the method, no height difference exists between the light reflecting area and the light absorption area, light reflected by the light reflecting area cannot be absorbed by the light absorption area and the shadow effect can be avoided.

Disclosed is a method for manufacturing a fine metal mask using electroplating. The method includes the following steps: (a), forming a sacrificial layer on a carrier; (b) forming an electrode layer on the sacrificial layer; (c) forming a photoresist coating on the electrode layer; (d) patterning the photoresist coating through photoetching; (e) forming an electroplating layer; (f) removing the patterned photoresist coating to make the electroplating layer serving as a metal pattern remain; (g) patterning the electrode layer and forming a pattern corresponding to the metal pattern, thereby forming a mask pattern including the electroplating layer and the electrode layer; (h) performing heat treatment to increase the hardness of the mask pattern; (i) checking the mask pattern; and (j) separating the mask pattern from the carrier.

The invention discloses a nucleic acid detection method for separating a luminous marker based on magnetic beads and nucleic acid hydrolysis. The method comprises the following steps: designing a functional probe for detecting a target nucleic acid fragment; modifying the functional probe on the surface of functional magnetic beads; capturing the target nucleic acid fragment and a luminous marker to the surface of the magnetic beads by virtue of hybridization; performing magnetic separation; cleaning, thereby obtaining the magnetic beads on which the luminous marker is obtained; adding a nucleic acid hydrolysis reagent, separating the luminous marker from the surface of the magnetic beads by virtue of nucleic acid hydrolysis, thereby obtaining a luminous marker solution which does not contain the magnetic beads; and performing luminous detection on the solution, thereby acquiring the target nucleic acid information. According to the method disclosed by the invention, the luminous signal loss caused by a shielding effect of the magnetic beads on the luminous signal is completely overcome, 0.1pM of nucleic acid fragments can be detected at least, and the detection sensitivity is high.

A track assembly for supporting fabric on a surface includes a base track defining a first half of a hinge and a first half of a snapping clamp. An upper track defines a second half of the hinge and is pivotally connectable to the base track. The upper track defines a second half of the snapping clamp for releasably engaging the fabric. The upper track includes a strut extended downwardly towards the base track such that when high tension forces are applied to the upper track, due to fabric tensioning, the strut contacts the base track to reinforce the track assembly.

The present invention provides a deposition device and a mask assembly applied thereto. The deposition device comprises a mask frame possessing a frame opening; a mask combined with the upper surface of the mask frame and configured to cover the frame opening; an extending component arranged on at least one part of an edge of the frame opening and configured to protrude from the upper surface of the mask frame, and enable the vertical distance of a first part corresponding to the frame opening of the mask to be greater than the vertical distance of a second part contacted with the upper surface of the mask frame of the mask, wherein each vertical distance is measured from the upper surface of the mask frame.

The present invention discloses an adaptive through-wall imaging method based on a narrow-band system, relates to the technology of the through-wall imaging, especially to a novel through-wall imagingtechnology based on the narrow-band system. The method comprises the steps of: employing a narrow-band system to scan an interested area along a plurality of angles, and employing Radon inverse transformation to perform rapid reconstruction of images; and finally, performing optimization of initial images through adoption of the adaptive image optimization algorithm to obtain a binary area reconstruction image. The adaptive through-wall imaging method can employ a very simple hardware system to achieve high-resolution through-wall imaging, has a good application value, high in environment applicability, high in image resolution and small in computing amount and is a novel through-wall imaging algorithm.

A method for the thermal regulation of photovoltaic panels exposed to the wind and comprising a plurality of devices for the spraying of a cooling liquid suitable for spraying the liquid onto the photovoltaic panels, the method being characterized in that it comprises the steps consisting in:measuring a temperature of at least one panel;measuring the wind speed;activating the spraying of at least one of the spraying devices;deactivating the spraying of all or a part of the spraying devices.The method is such that the activation, deactivation and / or spray pressure, of some of the spraying devices are controlled relative to the measured wind speed.Device for the implementation of this method.

The invention provides a mask and frame assembly of a mask tensioning machine for a deposition process. The mask and frame assembly comprises a frame and a mask, bumps are arranged on the peripheral edge of the frame, and the mask is assembled on the frame and is jacked by the bumps of the frame. The mask and frame assembly has the advantages that the mask is jacked by the bumps of the frame, the surface of the mask is flatly pressed by a roller so as to be easily flattened, accordingly, crinkling of the mask is prevented, and a shadow effect caused by crinkling of the mask is avoided.

Techniques for preventing parasitic beamlets from affecting ion implantation are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for preventing parasitic beamlets from affecting ion implantation. The apparatus may comprise a controller that is configured to scan a spot beam back and forth, thereby forming an ion beam spanning a predetermined width. The apparatus may also comprise an aperture mechanism that, if kept stationary, allows the spot beam to pass through. The apparatus may further comprise a synchronization mechanism, coupled to the controller and the aperture mechanism, that is configured to cause the aperture mechanism to move in synchronization with the scanned spot beam, allowing the scanned spot beam to pass through but blocking one or more parasitic beamlets associated with the spot beam.

The invention discloses a moisture-proof and mildew-proof optical film. The mildew-proof and moisture-proof optical film comprises a substrate, a high-density antireflection film system main body, a hard wear-resistant protective layer, a first hydrophobic film layer and a second hydrophobic film layer, wherein the high-density antireflection film system main body, the hard wear-resistant protective layer, the first hydrophobic film layer and the second hydrophobic film layer are sequentially evaporated on the substrate in a vacuum environment. The invention further discloses a preparation process method of the mildew-proof and moisture-proof optical film. The mildew-proof and moisture-proof optical film and the preparation method thereof have the typical characteristics that the transmittance of a coated optical window is high, the surface is smooth and wear-resistant, the moisture-proof performance and the mildew-proof performance are good, and the preparation process is easy to transplant. The mildew-proof and moisture-proof optical film and the preparation method thereof can effectively solve the moisture-proof and mildew-proof problems in the actual application process of optical lens, and can be widely applied to military optoelectronic equipment, precision optical instruments, outdoor monitoring cameras and other military and civilian optoelectronic technology fields ina high-humidity environment.

The invention discloses a method for measuring the pitch deviation of a cylindrical gear based on linear structured light. The method comprises the steps of building a three-dimensional mathematical model of a tooth surface of a measured gear; and when the right surface of the gear is measured, adjusting an angle [phi]1 to enable the previous gear not to shield incident light shooting to the toothroot, thereby being capable of avoiding a shadow effect, and being credible in measurement data. The tooth profile of the gear is divided into a left tooth profile and a right tooth profile, two structured light measuring heads are adopted to measure the left tooth profile and the right tooth profile simultaneously, and the two measuring heads are installed according to a calculated offset parameter in order to improve the measurement efficiency. According to the invention, the gear pitch deviation mathematical model is built; and the built gear pitch deviation mathematical model is effectivefor evaluating the pitch deviation on both the left tooth profile and the right tooth profile. According to the method, pitch deviation measurement can be performed on all positions on the tooth profile, the data utilization rate is high, the initial position of the gear can be adapted through the angle [phi]1, and measurement can be performed immediately after the installation.

The invention relates to a method of manufacturing a charge dissipative surface layer on a member made from or consisting of a dielectric polymeric material or polymer-based composite which is intended to be used in space and other extreme environments, the member having at least one surface, in particular two opposing surfaces, each of the surfaces having a flat or a three-dimensional shape. The method comprises the steps of carbonizing the at least one surface of the member in a vacuum environment through ion bombardment with simultaneous surface renewal in a dynamic way, by bombardment of the at least one surface with an ion beam formed in a gaseous linear high-current technological ion beam source of rare gas and added predetermined amount of a carbonaceous gas in the same ion beam gas admixture in order to achieve a treated carbonized surface layer with a uniform surface resistivity in a charge-dissipative range.

The invention discloses a bearing substrate for bearing an OLED (Organic Light Emitting Diode) during preparation of the OLED. The bearing substrate comprises a substrate part and an adsorbed layer arranged on the surface of the substrate part, wherein the adsorbed layer comprises a resin layer and a plurality of magnetic nano particles distributed in the resin layer. The invention further discloses a preparation method of the bearing substrate. During the preparation of the OLED, the gravity of the substrate can be counteracted or reduced by an attractive force of an adsorbent to the adsorbed layer, so that deformation caused by gravity sag of the substrate for bearing the OLED during the preparation of the OLED can be eliminated or reduced; and a shadow effect and evaporation color mixture in a preparation process can be further avoided.

The invention relates to a preparation method of a semiconductor device. The method comprises: providing a semiconductor substrate; forming a virtual gate on the semiconductor substrate; forming a first offset side wall and a second offset side wall at the side of the virtual gate; removing the virtual gate; and removing the first offset side wall to form a groove with the increased critical dimension. According to the invention, after the virtual gate is formed, a thermal treatment oxide layer, the first offset side wall, and the second offset side wall are formed on the virtual gate; and after LDD and source-drain ion injection are executed, the thermal treatment oxide layer and the first offset side wall are removed to form the groove, wherein the critical dimension of the groove is the critical dimension of the metal gate and the critical dimension of the metal gate is larger than that of the conventional metal gate. Moreover, the thermal treatment oxide layer and the first offset side wall are formed after the source-drain ion injection, so that the large critical dimension is obtained and the shadow effect can be avoided and thus the device performance is improved.

The invention discloses a wave energy power generation unit and a wave energy power generation device comprising the same and a wave energy power generation method. The wave energy power generation unit comprises a plurality of single rear bent pipe structures connected in parallel, each single rear bent pipe structure comprises a bent pipe and a floating body, each bent pipe comprises a bent pipe vertical section and a bent pipe horizontal section, the upper portions of the horizontal sections of the bent pipes are connected with the floating bodies, the vertical sections of the adjacent bent pipes communicate with one another, the vertical section of the bent pipe of one single rear bent pipe structure is connected with an air chamber pipeline, and an air turbine is arranged in the air chamber pipeline. According to the wave energy power generation unit and the wave energy power generation device comprising the same and the wave energy power generation method, the plurality of single rear bent pipe structures are combined and connected, the vertical sections of the adjacent bent pipes communicate with one another, the same air turbine does work, the flow of reciprocating airflow in an air chamber can be increased, the utilization efficiency of wave energy is remarkably improved, and the installed capacity is improved; and a thought of improving the wave energy utilization efficiency by forming resonance is provided, and the maximum water surface movement wave height in the air chamber is obtained in the process that parameter optimization is carried out on the wave energy power generation device.

The invention discloses a mask and a fabrication method thereof. The fabrication method comprises the steps of providing a mask substrate, wherein the mask substrate comprises a glass surface and an evaporation surface which are opposite to each other; forming a plurality of grooves independent to one another in a side of the glass surface of the mask substrate by laser; and forming a plurality ofholes, corresponding to the grooves, in a side of the evaporation surface of the mask substrate by employing a yellow light process, wherein the plurality of holes respectively communicate with the corresponding grooves. Compared with the a mask fabrication method employing the yellow light process on the glass surface and the evaporation surface in the prior art, the fabrication method providedby the technical scheme of the embodiment of the invention has the advantages that the yellow light process in one time is reduced, and the mask fabrication efficiency is further improved; and moreover, smooth transition can be achieved after the groove formed by the laser communicate with the corresponding holes, a shadow effect at a connection position is prevented, and the mask accuracy is improved.