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Mask and fabrication method thereof

A manufacturing method and a technology of a mask, which are applied in the direction of photolithography, optics, instruments, etc. on a patterned surface, can solve the problems of reduced mask precision and low production efficiency, and achieve improved production efficiency, avoiding shadow effects, The effect of improving accuracy

Inactive Publication Date: 2018-03-13
EVERDISPLAY OPTRONICS (SHANGHAI) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] At present, the production method of the mask plate needs to use two yellow light processes. Due to the relatively many steps of the yellow light process, the production efficiency is not high, and there is a shadow effect on the inner wall of the mask plate through hole, which leads to a decrease in the accuracy of the mask plate.

Method used

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  • Mask and fabrication method thereof
  • Mask and fabrication method thereof

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Embodiment Construction

[0018] The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, but not to limit the present invention. In addition, it should be noted that, for the convenience of description, only some structures related to the present invention are shown in the drawings but not all structures.

[0019] Figure 1a-Figure 1c It is a schematic diagram of the manufacturing method of the mask plate in the prior art. like Figure 1a As shown, a mask substrate 100 is provided, and the mask substrate 100 includes a glass surface 110 and an evaporation surface 120 opposite to each other. A plurality of grooves 111 are formed on the glass surface 110 side of the mask substrate 100 by using a yellow light process, such as Figure 1b shown. Then again use the yellow light process to form a plurality of openings 12...

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Abstract

The invention discloses a mask and a fabrication method thereof. The fabrication method comprises the steps of providing a mask substrate, wherein the mask substrate comprises a glass surface and an evaporation surface which are opposite to each other; forming a plurality of grooves independent to one another in a side of the glass surface of the mask substrate by laser; and forming a plurality ofholes, corresponding to the grooves, in a side of the evaporation surface of the mask substrate by employing a yellow light process, wherein the plurality of holes respectively communicate with the corresponding grooves. Compared with the a mask fabrication method employing the yellow light process on the glass surface and the evaporation surface in the prior art, the fabrication method providedby the technical scheme of the embodiment of the invention has the advantages that the yellow light process in one time is reduced, and the mask fabrication efficiency is further improved; and moreover, smooth transition can be achieved after the groove formed by the laser communicate with the corresponding holes, a shadow effect at a connection position is prevented, and the mask accuracy is improved.

Description

technical field [0001] Embodiments of the present invention relate to a mask preparation technology, in particular to a mask and a manufacturing method thereof. Background technique [0002] The organic light-emitting display device has excellent performance, can emit light without backlight, is easy to realize flexible display, and has a short response time, so it is favored by users. [0003] The effective preparation of organic light-emitting devices is the basis for realizing the application of organic light-emitting display devices. There are many methods for preparing organic light-emitting devices in the prior art, and one of the most widely used methods is the pixel juxtaposition method. The obtained organic light-emitting device shows pure color and high luminous efficiency. Specifically, in the pixel juxtaposition method, a mask plate is used as a mask tool in a coating process to form a pixel material layer. Therefore, the accuracy of the mask plate directly affe...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/50
CPCG03F1/50
Inventor 高志豪
Owner EVERDISPLAY OPTRONICS (SHANGHAI) CO LTD
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