2591results about How to "Improve alignment accuracy" patented technology

An alignment system uses a self-referencing interferometer that produces two overlapping and relatively rotated images of an alignment markers. Detectors detect intensities in a pupil plane where Fourier transforms of the images are caused to interfere. The positional information is derived from the phase difference between diffraction orders of the two images which manifests as intensity variations in the interfered orders. Asymmetry can also be measured by measuring intensities at two positions either side of a diffraction order.

An alignment method for aligning each shot area on a photosensitive substrate with a reticle according to array coordinate predicted by a statistical technique with an improved alignment precision without inviting degradation of throughput, wherein a plurality of alignment marks 29-1, 30-1, 34-1, 35-1 in a short area 27-1 and so forth provided on the n-th wafer 8 (1<=n<=N-1) are measured to carry out the alignment of the shot area with the reticle considering the misalignment of the wafer 8 and the distortion of the shot area 27-1 and so forth, and one alignment mark in a shot are 27-1 or another provided on the (n+k)th wafer 8 (1<=k<=N-n) is measured to carry out the alignment of the shot area with the reticle considering the misalignment of the wafer 8 found from the measurement results, and the distortion of the shot area 27-1 and so forth obtained when the nth wafer 8 is processed.

The invention discloses an alignment system applied in a lithography device, which uses three periods phase grating with crude precision combination in a substrate marker or a substrate station reference marker, uses a first order diffraction light of the three periods as an alignment signal, simultaneously realizes a big capture range and gets high alignment precision, gets labeled deformation information and other useful information, and through the optimum design of the match and/or the layout of the three periods, the influence on an alignment position by asymmetrical deformation of the marker is effectively reduced.

The invention relates to a rapid alignment method with high precision for a strap-down inertial navigation system, belonging to the alignment method for the strap-down inertial navigation system. The method comprises the following steps of: collecting an output signal from an inertia measurement component, and obtaining the angular velocity and the specific force information of a vehicle; performing coarse alignment by the strap-down inertial navigation system; performing calculation by the strap-down inertial navigation system; performing precise alignment by the strap-down inertial navigation system; filter outputting and correcting; and finishing the precise alignment. The invention can be used for improving alignment precision and rapidness of the low-cost strap-down inertial navigation system; realizes azimuth alignment; and has the advantages of high feasibility and operability, and low cost.

A dental x-ray apparatus is provided that includes an x-ray system having an x-ray source and x-ray detection means; positioning means for positioning a patient's head in a predefined position with respect to the x-ray system; and at least one video camera for generating video images of the patient's head.

A method for bonding substrates together. The method includes providing a first substrate comprising a first surface. The first substrate comprises a plurality of first chips thereon. Each of the chips has integrated circuit devices. The first substrate includes a first alignment mark on the first substrate and a second alignment mark on the first substrate. The method also includes providing a second substrate comprising a silicon bearing material and second surface. The second substrate comprising a plurality of second chips thereon. Each of the chips comprises a plurality of mechanical structures. The second substrate has a first silicon based pattern on the second substrate and a second silicon based pattern on the second substrate. The method includes moving the first alignment mark of the first substrate to the first silicon based pattern on the second substrate and aligning the second alignment mark of the first substrate to the second silicon based pattern on the second substrate. A portion of at least one of the first substrate or the second substrate is illuminated with electromagnetic radiation. The method includes detecting a portion of the electromagnetic radiation and using the detected portion of the electromagnetic radiation to align the first substrate with the second substrate. The method also includes coupling the first substrate with the second substrate by contacting the first surface with the second surface and bonding the first surface with the second surface.

Optical modules and methods for making optical modules are described. In one embodiment, an optical module includes a substrate assembly including a photonic chip mounting region, and a groove extending towards the photonic chip mounting region. A waveguide is disposed within the groove. A plurality of spacers is on the chip mounting region, each spacer having a predetermined height. A photonic chip is placed on the plurality of spacers and above the chip mounting region, and an optical coupler is between the photonic chip and the waveguide.

The invention discloses mask-alignment aligning system and its grade combining system. The aligning system includes light source module, illumination module, imaging module, and detecting module. The grade combining system makes positive negative grade frequency spectrum facula of the alignment mark diffraction spectrum process corresponding overlap coherent, uses polychromatic light separating system to separate multiple wavelength light signal, measures light intensity or phase change at the corresponding position of the multiple wavelength multistage secondary diffracted facula to gain alignment mark position information. The invention has high alignment precision and stability.

A device (4) for transferring a pattern to an object (2). The invention relates especially to production of micro and nanostructures. The device comprises an alignment means (10) arranged in connection with a first contacting means (7) for controlling the motion of the first stamp (8) in a direction perpendicular to the pressing direction (A), and a second contacting means (11) having a second stamp (12) adapted to imprint a second pattern in the second surface (6) of the object (2), and a pressing means (9) further adapted to press the second stamp (12) into contact with the second surface (6) of the object (2) in the pressing direction (A). Hereby is obtained a device of a simple design, which has a high accuracy of the alignment of the stamps in relation to the object.

The invention relates to a method for acquiring an initial course attitude of a fiber optic gyro strapdown inertial navigation system. The method is characterized by: extracting gravitational acceleration information from an acceleration meter through filtering processing and compensation, projecting an earth gravitational vector to an inertial coordinate system, with rotational-angular velocity information of the earth included in a projecting component, taking the earth gravitational vector in the inertial coordinate system as reference information, and making use of the output of a gyro and the acceleration meter to estimate an initial attitude angle. On the basis of ensuring that an initial horizontal angle satisfies a precision requirement, the method of the invention substantially improves the precision of an initial course angle of the fiber optic gyro strapdown inertial navigation system.

The yield of a peeling process is improved. A first step of forming a peeling layer to a thickness of greater than or equal to 0.1 nm and less than 10 nm over a substrate; a second step of forming, on the peeling layer, a layer to be peeled including a first layer in contact with the peeling layer; a third step of separating parts of the peeling layer and parts of the first layer to form a peeling trigger; and a fourth step of separating the peeling layer and the layer to be peeled are performed. The use of the thin peeling layer can improve the yield of a peeling process regardless of the structure of the layer to be peeled.

Provided is a method for manufacturing a thermally-assisted magnetic recording head with “composite slider structure”. In the method, the waveguide is irradiated with a first light from opposed-to-medium surface side, and the passing first light is detected on back surface side to obtain an image of the light-receiving end surface, and a light-receiving center position is determined from the image. Further, the light source is irradiated with a second light from opposite side to joining surface, and the passing second light is detected on the joining surface side to obtain an image of the light-emitting end surface, and a light-emitting center position is determined from the image. Then, the slider and the light source unit are moved based on the determined positions of the light-receiving and light-emitting centers, aligned and bonded. As a result, alignment can be performed with high accuracy in a short process time under simplified process.

The invention discloses an initial alignment method of a speedometer-assisted strapdown inertial navigation system during running. The method comprises coarse alignment and fine alignment. The method disclosed by the invention can effectively solve the problem of initial alignment of a vehicle during running. High-precision alignment can be quickly realized by the strapdown inertial navigation system under the help of the speedometer without special movements or stop of the vehicle or external assistant information such as road signs.

There is provided a wiring board including: a terminal group including a plurality of terminals arrayed along a specified array axis; and a pair of alignment marks disposed on opposite sides of the terminal group in the direction of the array axis. The alignment marks each have a first portion extending so as to intersect at an angle to the array axis. The first portions of the alignment marks and the plurality of terminals extend from the terminal group to a common phantom center point that is apart from the terminal group in the direction intersecting the array axis.