Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Combination type mask plate and manufacturing method thereof

A production method and combined technology, applied in the direction of photoplate making process, ion implantation plating, coating, etc. on the pattern surface, to achieve the effect of reducing processing difficulty, uniform thickness, and easy reuse

Inactive Publication Date: 2015-04-22
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
View PDF2 Cites 14 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Due to the different thicknesses of the overlapping areas of the existing large-sized combined masks used for WOLED high-generation lines, in order to avoid fragments when the substrates are bonded, it is necessary to dig grooves on the mask frame, and there are shadows effect problem

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Combination type mask plate and manufacturing method thereof
  • Combination type mask plate and manufacturing method thereof
  • Combination type mask plate and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0045] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.

[0046] Please also see Figure 7 to Figure 12 , the present invention firstly provides a combined mask, comprising:

[0047] A mask frame 1, the mask frame 1 includes four sides, and the four sides surround an opening area;

[0048] Several first strips 2, the several first strips 2 are juxtaposed and parallel to the long side of the mask frame 1;

[0049] and several second boards 3 , the several second boards 3 are juxtaposed and parallel to the short sides of the mask frame 1 .

[0050] The two ends of the several first plates 2 are fixed on the short sides of the mask frame 1 by spot welding, and the two ends of the several second plates 3 are fixed on the long sides of the mask frame 1 by spot welding Above: the plurality of first plat...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a combination type mask plate and a manufacturing method thereof. The combination type mask plate comprises a mask frame (1), a plurality of first picking plates (2) and a plurality of second picking plates (3). The first picking plates (2) and the second picking plates (3) are overlapped and form a mesh-shaped structure with a plurality of film-forming holes (4). The thicknesses of the first picking plates (3) and the second picking plates (4) are equal. First grooves (21) which penetrate through the widths of the first picking plates (2) are formed in the portions, overlapped with the second picking plates (3), of the first picking plates (2). Second grooves (31) which penetrate through the widths of the second picking plates (3) are formed in the portions, overlapped with the first picking plates (2), of the second picking plates (3). The first picking plates (2) and the second picking plates (3) are embedded and overlapped through the first grooves (21) and the second grooves (31), and the upper surfaces and the lower surfaces of the first picking plates (2) and the second picking plates (3) are placed on the same plane respectively.

Description

technical field [0001] The invention relates to the field of manufacturing organic light emitting diode displays, in particular to a combined mask plate and a manufacturing method thereof. Background technique [0002] Organic light emitting diode display (Organic Light Emitting Diode, OLED) is a promising flat panel display technology, it has very excellent display performance, especially self-illumination, simple structure, ultra-thin, fast response, wide Viewing angle, low power consumption, and flexible display are known as "dream display". In addition, the investment in its production equipment is much smaller than that of TFT-LCD. It has been favored by major display manufacturers and has become the No. 1 display technology in the field of display technology. The main force of the three generations of display devices. At present, OLED is on the eve of mass production. With the further deepening of research and the continuous emergence of new technologies, OLED display...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/64G03F1/68G03F1/80
CPCG03F1/64G03F1/68G03F1/80C23C14/042H10K71/166H10K71/00
Inventor 吴聪原刘亚伟
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com